Neungho Shin

Person

San Ramon, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Arrangements for manipulating plasma confinement within a plasma pr...
- Patent number 10,217,610
- Issue date Feb 26, 2019
- Lam Research Corporation
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangements for manipulating plasma confinement within a plasma pr...
- Patent number 9,275,838
- Issue date Mar 1, 2016
- Lam Research Corporation
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing bevel protective film
- Patent number 8,501,283
- Issue date Aug 6, 2013
- Lam Research Corporation
- Neungho Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangements and methods for improving bevel etch repeatability amo...
- Patent number 7,977,123
- Issue date Jul 12, 2011
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a low-K dual damascene interconnect structure
- Patent number 7,435,685
- Issue date Oct 14, 2008
- Applied Materials, Inc.
- Gerardo A. Delgadino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etching of carbon-doped low-k dielectrics
- Patent number 7,256,134
- Issue date Aug 14, 2007
- Applied Materials, Inc.
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a low-K dual damascene interconnect structure
- Patent number 7,132,369
- Issue date Nov 7, 2006
- Applied Materials, Inc.
- Gerardo A. Delgadino
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Arrangements for Manipulating Plasma Confinement Within a Plasma Pr...
- Publication number 20160126070
- Publication date May 5, 2016
- LAM RESEARCH CORPORATION
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRANGEMENT FOR DEPOSITING BEVEL PROTECTIVE FILM
- Publication number 20130312913
- Publication date Nov 28, 2013
- Neungho Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING BEVEL PROTECTIVE FILM
- Publication number 20120094502
- Publication date Apr 19, 2012
- Neungho Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRANGEMENTS FOR IMPROVING BEVEL ETCH REPEATABILITY AMONG SUBSTRATES
- Publication number 20110259520
- Publication date Oct 27, 2011
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRANGEMENTS FOR MANIPULATING PLASMA CONFINEMENT WITHIN A PLASMA PR...
- Publication number 20110049101
- Publication date Mar 3, 2011
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRANGEMENTS AND METHODS FOR IMPROVING BEVEL ETCH REPEATABILITY AMO...
- Publication number 20100297788
- Publication date Nov 25, 2010
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A LOW-K DUAL DAMASCENE INTERCONNECT STRUCTURE
- Publication number 20080145998
- Publication date Jun 19, 2008
- Applied Materials, Inc.
- GERARDO A. DELGADINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective etching of carbon-doped low-k dielectrics
- Publication number 20050026430
- Publication date Feb 3, 2005
- APPLIED MATERIALS, INC.
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a low-K dual damascene interconnect structure
- Publication number 20040157453
- Publication date Aug 12, 2004
- APPLIED MATERIALS, INC.
- Gerardo A. Delgadino
- H01 - BASIC ELECTRIC ELEMENTS

Neungho Shin

Person

Patents Grantslast 30 patents

Arrangements for manipulating plasma confinement within a plasma pr...

Arrangements for manipulating plasma confinement within a plasma pr...

Methods for depositing bevel protective film

Arrangements and methods for improving bevel etch repeatability amo...

Method of forming a low-K dual damascene interconnect structure

Selective etching of carbon-doped low-k dielectrics

Method of forming a low-K dual damascene interconnect structure

Patents Applicationslast 30 patents

Arrangements for Manipulating Plasma Confinement Within a Plasma Pr...

ARRANGEMENT FOR DEPOSITING BEVEL PROTECTIVE FILM

METHODS FOR DEPOSITING BEVEL PROTECTIVE FILM

ARRANGEMENTS FOR IMPROVING BEVEL ETCH REPEATABILITY AMONG SUBSTRATES

ARRANGEMENTS FOR MANIPULATING PLASMA CONFINEMENT WITHIN A PLASMA PR...

ARRANGEMENTS AND METHODS FOR IMPROVING BEVEL ETCH REPEATABILITY AMO...

METHOD OF FORMING A LOW-K DUAL DAMASCENE INTERCONNECT STRUCTURE

Selective etching of carbon-doped low-k dielectrics

Method of forming a low-K dual damascene interconnect structure