Nicholas Alan Ryza

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Austin, TX, US

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Patents Grantslast 30 patents

Information Patent Grant
Developing photoresist with supercritical fluid and developer
- Patent number 7,044,662
- Issue date May 16, 2006
- Tokyo Electron Limited
- Chantal J. Arena-Foster
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Process and apparatus for removing a contaminant from a substrate
- Patent number 6,953,654
- Issue date Oct 11, 2005
- Tokyo Electron Limited
- Nicholas A. Ryza
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Drying resist with a solvent bath and supercritical CO2
- Patent number 6,928,746
- Issue date Aug 16, 2005
- Tokyo Electron Limited
- Chantal J. Arena-Foster
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Developing photoresist with supercritical fluid and developer
- Patent number 6,924,086
- Issue date Aug 2, 2005
- Tokyo Electron Limited
- Chantal J. Arena-Foster
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND PROCESSING SYSTEM FOR RAPID HOTPLATE COOL DOWN
- Publication number 20080099463
- Publication date May 1, 2008
- TOKYO ELECTRON LIMITED
- Nicholas Alan Ryza
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Developing photoresist with supercritical fluid and developer
- Publication number 20050008980
- Publication date Jan 13, 2005
- Chantal J. Arena-Foster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Removal of contaminants using supercritical processing
- Publication number 20040072706
- Publication date Apr 15, 2004
- Chantal J. Arena-Foster
- B08 - CLEANING
Information Patent Application
Drying resist with a solvent bath and supercritical CO2
- Publication number 20040035021
- Publication date Feb 26, 2004
- Chantal J. Arena-Foster
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Process and apparatus for removing a contaminant from a substrate
- Publication number 20030175626
- Publication date Sep 18, 2003
- Nicholas A. Ryza
- B08 - CLEANING