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Nicholas C. Dalida
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Fremont, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Use of CL2 and/or HCL during silicon epitaxial film formation
Patent number
8,586,456
Issue date
Nov 19, 2013
Applied Materials, Inc.
Zhiyuan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Use of CL2 and/or HCL during silicon epitaxial film formation
Patent number
7,960,256
Issue date
Jun 14, 2011
Applied Materials, Inc.
Zhiyuan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods to fabricate MOSFET devices using a selective deposition pr...
Patent number
7,737,007
Issue date
Jun 15, 2010
Applied Materials, Inc.
Arkadii V. Samoilov
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Use of Cl2 and/or HCl during silicon epitaxial film formation
Patent number
7,732,305
Issue date
Jun 8, 2010
Applied Materials, Inc.
Zhiyuan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Use of Cl2 and/or HCl during silicon epitaxial film formation
Patent number
7,682,940
Issue date
Mar 23, 2010
Applied Materials, Inc.
Zhiyuan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods to fabricate MOSFET devices using a selective deposition pr...
Patent number
7,439,142
Issue date
Oct 21, 2008
Applied Materials, Inc.
Arkadii V. Samoilov
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods to fabricate MOSFET devices using selective deposition process
Patent number
7,132,338
Issue date
Nov 7, 2006
Applied Materials, Inc.
Arkadii V. Samoilov
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
USE OF CL2 AND/OR HCL DURING SILICON EPITAXIAL FILM FORMATION
Publication number
20110230036
Publication date
Sep 22, 2011
Applied Materials, Inc.
Zhiyuan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
USE OF CL2 AND/OR HCL DURING SILICON EPITAXIAL FILM FORMATION
Publication number
20100221902
Publication date
Sep 2, 2010
Applied Materials, Inc.
Zhiyuan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS TO FABRICATE MOSFET DEVICES USING A SELECTIVE DEPOSITION PR...
Publication number
20090011578
Publication date
Jan 8, 2009
ARKADII V. SAMOILOV
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS TO FABRICATE MOSFET DEVICES USING A SELECTIVE DEPOSITION PR...
Publication number
20070082451
Publication date
Apr 12, 2007
ARKADII V. SAMOILOV
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Use of Cl2 and/or HCl during silicon epitaxial film formation
Publication number
20060260538
Publication date
Nov 23, 2006
APPLIED MATERIALS, INC.
Zhiyuan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Use of CL2 and/or HCL during silicon epitaxial film formation
Publication number
20060115933
Publication date
Jun 1, 2006
APPLIED MATERIALS, INC.
Zhiyuan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Methods to fabricate MOSFET devices using selective deposition process
Publication number
20050079692
Publication date
Apr 14, 2005
APPLIED MATERIALS, INC.
Arkadii V. Samoilov
H01 - BASIC ELECTRIC ELEMENTS