Nicolaus J. Hofmeester

Person

Danvers, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for adjusting beam dimension for high-gradient lo...
- Patent number 8,298,432
- Issue date Oct 30, 2012
- TEL Epion Inc.
- Ruairidh MacCrimmon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for multi-pass correction of substrate defects
- Patent number 8,293,126
- Issue date Oct 23, 2012
- TEL Epion Inc.
- Ruairidh MacCrimmon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for increasing throughput during location specifi...
- Patent number 7,917,241
- Issue date Mar 29, 2011
- TEL Epion Inc.
- Nicolaus J. Hofmeester
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for assigning a beam intensity profile to a g...
- Patent number 7,564,024
- Issue date Jul 21, 2009
- TEL Epion Inc.
- Nicolaus J. Hofmeester
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR ADJUSTING BEAM DIMENSION FOR HIGH-GRADIENT LO...
- Publication number 20090084672
- Publication date Apr 2, 2009
- TOKYO ELECTRON LIMITED
- Ruairidh MacCRIMMON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR MULTI-PASS CORRECTION OF SUBSTRATE DEFECTS
- Publication number 20090084759
- Publication date Apr 2, 2009
- TEL Epion Inc.
- Ruairidh MacCRIMMON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INCREASING THROUGHPUT DURING LOCATION SPECIFI...
- Publication number 20090037015
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- Nicolaus J. Hofmeester
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR ASSIGNING A BEAM INTENSITY PROFILE TO A G...
- Publication number 20090001282
- Publication date Jan 1, 2009
- TOKYO ELECTRON LIMITED
- Nicolaus J. Hofmeester
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR SYSTEMATIC NON-UNIFORMITY CORRECTION USIN...
- Publication number 20080237491
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Steve Caliendo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND PROCESSING SYSTEMS FOR USING A GAS CLUSTER ION BEAM TO...
- Publication number 20080237492
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Steven Caliendo
- H01 - BASIC ELECTRIC ELEMENTS

Nicolaus J. Hofmeester

Person

Patents Grantslast 30 patents

Method and system for adjusting beam dimension for high-gradient lo...

Method and system for multi-pass correction of substrate defects

Method and system for increasing throughput during location specifi...

Methods and apparatus for assigning a beam intensity profile to a g...

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR ADJUSTING BEAM DIMENSION FOR HIGH-GRADIENT LO...

METHOD AND SYSTEM FOR MULTI-PASS CORRECTION OF SUBSTRATE DEFECTS

METHOD AND SYSTEM FOR INCREASING THROUGHPUT DURING LOCATION SPECIFI...

METHODS AND APPARATUS FOR ASSIGNING A BEAM INTENSITY PROFILE TO A G...

APPARATUS AND METHODS FOR SYSTEMATIC NON-UNIFORMITY CORRECTION USIN...

METHODS AND PROCESSING SYSTEMS FOR USING A GAS CLUSTER ION BEAM TO...