Niels Johannes Maria Bosch

Person

Venlo, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate positioning device and electron beam inspection tool
- Patent number 11,621,142
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Marcel Koenraad Marie Baggen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam apparatus
- Patent number 11,315,752
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Peter Paul Hempenius
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection apparatus stage positioning
- Patent number 11,302,512
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Marcel Koenraad Marie Baggen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam apparatus
- Patent number 10,867,770
- Issue date Dec 15, 2020
- ASML Netherlands B.V.
- Peter Paul Hempenius
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,649,347
- Issue date May 12, 2020
- ASML Netherlands B.V.
- Michael Johannes Christiaan Ronde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,494,869
- Issue date Nov 15, 2016
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,891,063
- Issue date Nov 18, 2014
- ASML Netherlands B.V.
- Marcus Joseph Elisabeth Godfried Breukers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PLATFORM FOR CHARGED PARTICLE APPARATUS AND COMPONENTS WITHIN A CHA...
- Publication number 20240312756
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Jasper Hendrik GRASMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD
- Publication number 20240288389
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- B08 - CLEANING
Information Patent Application
DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS
- Publication number 20240071713
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Niels Johannes Maria BOSCH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE ANTI-FRETTING MECHANISM FOR ROLLER BEARING LIFETIME IMPROVEMENT
- Publication number 20220084781
- Publication date Mar 17, 2022
- ASML NETHERLANDS B.V.
- Mark Henricus Wilhelmus VAN GERVEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM APPARATUS
- Publication number 20210151282
- Publication date May 20, 2021
- Peter Paul HEMPENIUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POSITIONING DEVICE AND ELECTRON BEAM INSPECTION TOOL
- Publication number 20200373118
- Publication date Nov 26, 2020
- ASML NETHERLANDS B.V.
- Marcel Koenraad Marie BAGGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM INSPECTION TOOL AND METHOD FOR POSITIONING AN OBJECT...
- Publication number 20200303158
- Publication date Sep 24, 2020
- ASML NETHERLANDS B.V.
- Niels Johannes Maria Bosch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM INSPECTION APPARATUS STAGE POSITIONING
- Publication number 20200203118
- Publication date Jun 25, 2020
- ASML NETHERLANDS B.V.
- Marcel Koenraad Marie BAGGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM APPARATUS
- Publication number 20190341224
- Publication date Nov 7, 2019
- ASML Netherlands B.V.
- Peter Paul HEMPENIUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190129317
- Publication date May 2, 2019
- ASML NETHERLANDS B.V.
- Michael RONDE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140340666
- Publication date Nov 20, 2014
- ASML NETHERLANDS B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Niels Johannes Maria Bosch

Person

Patents Grantslast 30 patents

Substrate positioning device and electron beam inspection tool

E-beam apparatus

Electron beam inspection apparatus stage positioning

E-beam apparatus

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

PLATFORM FOR CHARGED PARTICLE APPARATUS AND COMPONENTS WITHIN A CHA...

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD

DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS

STAGE ANTI-FRETTING MECHANISM FOR ROLLER BEARING LIFETIME IMPROVEMENT

E-BEAM APPARATUS

SUBSTRATE POSITIONING DEVICE AND ELECTRON BEAM INSPECTION TOOL

ELECTRON BEAM INSPECTION TOOL AND METHOD FOR POSITIONING AN OBJECT...

ELECTRON BEAM INSPECTION APPARATUS STAGE POSITIONING

E-BEAM APPARATUS

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD