Nikhil Dole

Person

Union City, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for etching an etch layer
- Patent number 12,020,944
- Issue date Jun 25, 2024
- Lam Research Corporation
- Nikhil Dole
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Three or more states for achieving high aspect ratio dielectric etch
- Patent number 10,861,708
- Issue date Dec 8, 2020
- Lam Research Corporation
- Takumi Yanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of achieving high selectivity for high aspect ratio dielectr...
- Patent number 10,847,377
- Issue date Nov 24, 2020
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of sidewall notching for high aspect ratio 3D NAND etch
- Patent number 10,741,407
- Issue date Aug 11, 2020
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of achieving high selectivity for high aspect ratio dielectr...
- Patent number 10,515,821
- Issue date Dec 24, 2019
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three or more states for achieving high aspect ratio dielectric etch
- Patent number 10,504,744
- Issue date Dec 10, 2019
- Lam Research Corporation
- Takumi Yanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique to deposit sidewall passivation for high aspect ratio cyl...
- Patent number 10,297,459
- Issue date May 21, 2019
- Lam Research Corporation
- Eric A. Hudson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Technique to tune sidewall passivation deposition conformality for...
- Patent number 10,170,324
- Issue date Jan 1, 2019
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique to deposit sidewall passivation for high aspect ratio cyl...
- Patent number 9,543,158
- Issue date Jan 10, 2017
- Lam Research Corporation
- Eric A. Hudson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ETCHING AN ETCH LAYER
- Publication number 20240297050
- Publication date Sep 5, 2024
- LAM RESEARCH CORPORATION
- Nikhil Dole
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multiple State Pulsing for High Aspect Ratio Etch
- Publication number 20240120205
- Publication date Apr 11, 2024
- LAM RESEARCH CORPORATION
- Aniruddha Joi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ETCHING A HIGH ASPECT RATIO STRUCTURE
- Publication number 20240120209
- Publication date Apr 11, 2024
- LAM RESEARCH CORPORATION
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMISTRY FOR HIGH ASPECT RATIO ETCH FOR 3D-NAND
- Publication number 20230260798
- Publication date Aug 17, 2023
- LAM RESEARCH CORPORATION
- Nikhil Dole
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...
- Publication number 20230005717
- Publication date Jan 5, 2023
- LAM RESEARCH CORPORATION
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STATE RF PULSING TO CONTROL MASK SHAPE AND BREAKING SELECTIVI...
- Publication number 20220285130
- Publication date Sep 8, 2022
- LAM RESEARCH CORPORATION
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING AN ETCH LAYER
- Publication number 20210335624
- Publication date Oct 28, 2021
- LAM RESEARCH CORPORATION
- Nikhil DOLE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REDUCTION OF SIDEWALL NOTCHING FOR HIGH ASPECT RATIO 3D NAND ETCH
- Publication number 20200126804
- Publication date Apr 23, 2020
- LAM RESEARCH CORPORATION
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ACHIEVING HIGH SELECTIVITY FOR HIGH ASPECT RATIO DIELECTR...
- Publication number 20200090945
- Publication date Mar 19, 2020
- LAM RESEARCH CORPORATION
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE OR MORE STATES FOR ACHIEVING HIGH ASPECT RATIO DIELECTRIC ETCH
- Publication number 20200090948
- Publication date Mar 19, 2020
- LAM RESEARCH CORPORATION
- Takumi Yanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ACHIEVING HIGH SELECTIVITY FOR HIGH ASPECT RATIO DIELECTR...
- Publication number 20190393047
- Publication date Dec 26, 2019
- LAM RESEARCH CORPORATION
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE TO TUNE SIDEWALL PASSIVATION DEPOSITION CONFORMALITY FOR...
- Publication number 20170178920
- Publication date Jun 22, 2017
- LAM RESEARCH CORPORATION
- Nikhil Dole
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUE TO DEPOSIT SIDEWALL PASSIVATION FOR HIGH ASPECT RATIO CYL...
- Publication number 20170076955
- Publication date Mar 16, 2017
- LAM RESEARCH CORPORATION
- Eric A. Hudson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUE TO DEPOSIT SIDEWALL PASSIVATION FOR HIGH ASPECT RATIO CYL...
- Publication number 20160163557
- Publication date Jun 9, 2016
- LAM RESEARCH CORPORATION
- Eric A. Hudson
- H01 - BASIC ELECTRIC ELEMENTS

Nikhil Dole

Person

Patents Grantslast 30 patents

Method for etching an etch layer

Three or more states for achieving high aspect ratio dielectric etch

Method of achieving high selectivity for high aspect ratio dielectr...

Reduction of sidewall notching for high aspect ratio 3D NAND etch

Method of achieving high selectivity for high aspect ratio dielectr...

Three or more states for achieving high aspect ratio dielectric etch

Technique to deposit sidewall passivation for high aspect ratio cyl...

Technique to tune sidewall passivation deposition conformality for...

Technique to deposit sidewall passivation for high aspect ratio cyl...

Patents Applicationslast 30 patents

METHOD FOR ETCHING AN ETCH LAYER

Multiple State Pulsing for High Aspect Ratio Etch

SYSTEMS AND METHODS FOR ETCHING A HIGH ASPECT RATIO STRUCTURE

CHEMISTRY FOR HIGH ASPECT RATIO ETCH FOR 3D-NAND

MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...

MULTI-STATE RF PULSING TO CONTROL MASK SHAPE AND BREAKING SELECTIVI...

METHOD FOR ETCHING AN ETCH LAYER

REDUCTION OF SIDEWALL NOTCHING FOR HIGH ASPECT RATIO 3D NAND ETCH

METHOD OF ACHIEVING HIGH SELECTIVITY FOR HIGH ASPECT RATIO DIELECTR...

THREE OR MORE STATES FOR ACHIEVING HIGH ASPECT RATIO DIELECTRIC ETCH

METHOD OF ACHIEVING HIGH SELECTIVITY FOR HIGH ASPECT RATIO DIELECTR...

TECHNIQUE TO TUNE SIDEWALL PASSIVATION DEPOSITION CONFORMALITY FOR...

TECHNIQUE TO DEPOSIT SIDEWALL PASSIVATION FOR HIGH ASPECT RATIO CYL...

TECHNIQUE TO DEPOSIT SIDEWALL PASSIVATION FOR HIGH ASPECT RATIO CYL...