Niklas Bondestam

Person

Helsinki, FI

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for fabrication of thin films
- Patent number 7,833,352
- Issue date Nov 16, 2010
- ASM International N.V
- Niklas Bondestam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Active reactant vapor pulse monitoring in a chemical reactor
- Patent number 7,374,941
- Issue date May 20, 2008
- ASM Iternational N.V.
- Niklas Bondestam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ALD reactor and method with controlled wall temperature
- Patent number 6,939,579
- Issue date Sep 6, 2005
- ASM International N.V
- Niklas Bondestam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of monitoring evaporation rate of source material in a conta...
- Patent number 6,779,378
- Issue date Aug 24, 2004
- ASM International N.V
- Niklas Bondestam
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for growing thin films
- Patent number 6,630,030
- Issue date Oct 7, 2003
- ASM Microchemistry Ltd.
- Tuomo Suntola
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for fabrication of thin films
- Patent number 6,579,374
- Issue date Jun 17, 2003
- ASM Microchemistry Oy
- Niklas Bondestam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for fabrication of thin films
- Patent number 6,562,140
- Issue date May 13, 2003
- ASM Microchemistry Oy
- Niklas Bondestam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Active pulse monitoring in a chemical reactor
- Publication number 20060281184
- Publication date Dec 14, 2006
- Niklas Bondestam
- C30 - CRYSTAL GROWTH
Information Patent Application
Method of monitoring evaporation rate of source material in a conta...
- Publication number 20040083787
- Publication date May 6, 2004
- Niklas Bondestam
- G01 - MEASURING TESTING
Information Patent Application
Apparatus for fabrication of thin films
- Publication number 20030150385
- Publication date Aug 14, 2003
- Niklas Bondestam
- C30 - CRYSTAL GROWTH
Information Patent Application
Active pulse monitoring in a chemical reactor
- Publication number 20030143747
- Publication date Jul 31, 2003
- Niklas Bondestam
- C30 - CRYSTAL GROWTH
Information Patent Application
ALD reactor and method with controlled wall temperature
- Publication number 20020157611
- Publication date Oct 31, 2002
- Niklas Bondestam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for fabrication of thin films
- Publication number 20010009140
- Publication date Jul 26, 2001
- Niklas Bondestam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Niklas Bondestam

Person

Patents Grantslast 30 patents

Apparatus for fabrication of thin films

Active reactant vapor pulse monitoring in a chemical reactor

ALD reactor and method with controlled wall temperature

Method of monitoring evaporation rate of source material in a conta...

Method and apparatus for growing thin films

Apparatus for fabrication of thin films

Apparatus for fabrication of thin films

Patents Applicationslast 30 patents

Active pulse monitoring in a chemical reactor

Method of monitoring evaporation rate of source material in a conta...

Apparatus for fabrication of thin films

Active pulse monitoring in a chemical reactor

ALD reactor and method with controlled wall temperature

Apparatus for fabrication of thin films