Nils Dieckmann

Person

Huttlingen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination system or projection objective of a microlithographic...
- Patent number 9,274,435
- Issue date Mar 1, 2016
- Carl Zeiss SMT GmbH
- Nils Dieckmann
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,116,441
- Issue date Aug 25, 2015
- Carl Zeiss SMT GmbH
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 8,767,181
- Issue date Jul 1, 2014
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective with diaphragms
- Patent number 8,488,104
- Issue date Jul 16, 2013
- Carl Zeiss SMT GmbH
- Nils Dieckmann
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 8,169,594
- Issue date May 1, 2012
- Carl Zeiss SMT GmbH
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 8,081,293
- Issue date Dec 20, 2011
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 7,847,921
- Issue date Dec 7, 2010
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method for operating the same
- Patent number 7,808,615
- Issue date Oct 5, 2010
- Carl Zeiss SMT AG
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
System for reducing the coherence of laser radiation
- Patent number 7,593,095
- Issue date Sep 22, 2009
- Carl Zeiss SMT AG
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 7,408,616
- Issue date Aug 5, 2008
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV illumination system having a plurality of light sources for ill...
- Patent number 7,329,886
- Issue date Feb 12, 2008
- Carl Zeiss SMT AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of determining at least one parameter that is characteristic...
- Patent number 6,985,218
- Issue date Jan 10, 2006
- Carl Zeiss SMT AG
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the decontamination of microlithographic projection exp...
- Patent number 6,936,825
- Issue date Aug 30, 2005
- Carl Zeiss SMT AG
- Michael Gerhard
- B08 - CLEANING
Information Patent Grant
Projection exposure system
- Patent number 6,707,537
- Issue date Mar 16, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Nils Dieckmann
- G02 - OPTICS
Information Patent Grant
Projection exposure device
- Patent number 6,636,367
- Issue date Oct 21, 2003
- Carl-Zeiss-Stiftung
- Ulrich Drodofsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for compensating directional and positional fluctuations in...
- Patent number 6,512,780
- Issue date Jan 28, 2003
- Carl-Zeiss-Stiftung
- Nils Dieckmann
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20120188527
- Publication date Jul 26, 2012
- Carl Zeiss SMT GMBH
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE WITH DIAPHRAGMS
- Publication number 20110285979
- Publication date Nov 24, 2011
- Carl Zeiss SMT GMBH
- Nils Dieckmann
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...
- Publication number 20110069296
- Publication date Mar 24, 2011
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20090323043
- Publication date Dec 31, 2009
- Carl Zeiss SMT AG
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM OR PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC...
- Publication number 20090195766
- Publication date Aug 6, 2009
- Carl Zeiss SMT AG
- Nils Dieckmann
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...
- Publication number 20090040496
- Publication date Feb 12, 2009
- Carl Zeiss
- Toralf GRUNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20090027646
- Publication date Jan 29, 2009
- Carl Zeiss SMT AG
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME
- Publication number 20080002167
- Publication date Jan 3, 2008
- Carl Zeiss SMT AG
- Toralf Gruner
- G02 - OPTICS
Information Patent Application
System for reducing the coherence of laser radiation
- Publication number 20070206381
- Publication date Sep 6, 2007
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Microlithography exposure method and projection exposure apparatus...
- Publication number 20060290913
- Publication date Dec 28, 2006
- Carl Zeiss SMT AG
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System for setting and maintaining a gas atmosphere in an optical s...
- Publication number 20060061886
- Publication date Mar 23, 2006
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Microlithographic exposure method as well as a projection exposure...
- Publication number 20050146704
- Publication date Jul 7, 2005
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing an optical element from a quartz substrate
- Publication number 20050117203
- Publication date Jun 2, 2005
- Carl Zeiss SMT AG
- Nils Dieckmann
- G02 - OPTICS
Information Patent Application
Optical system with birefringent optical elements
- Publication number 20050094268
- Publication date May 5, 2005
- Carl Zeiss SMT AG
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
Illumination system with a plurality of light sources
- Publication number 20040256575
- Publication date Dec 23, 2004
- Carl Zeiss SMT AG
- Wolfgang Singer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of determining at least one parameter that is characteristic...
- Publication number 20040257559
- Publication date Dec 23, 2004
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing an optical element from a quartz substrate
- Publication number 20040021843
- Publication date Feb 5, 2004
- Carl Zeiss SMT AG
- Nils Dieckmann
- G02 - OPTICS
Information Patent Application
Projection exposure system
- Publication number 20030030780
- Publication date Feb 13, 2003
- Nils Dieckmann
- G02 - OPTICS
Information Patent Application
Projection exposure device
- Publication number 20020085286
- Publication date Jul 4, 2002
- Ulrich Drodofsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for the decontamination of microlithographic projection exp...
- Publication number 20010026402
- Publication date Oct 4, 2001
- Michael Gerhard
- B08 - CLEANING

Nils Dieckmann

Person

Patents Grantslast 30 patents

Illumination system or projection objective of a microlithographic...

Illumination system of a microlithographic projection exposure appa...

Microlithographic exposure method as well as a projection exposure...

Projection objective with diaphragms

Illumination system of a microlithographic projection exposure appa...

Illumination system of a microlithographic projection exposure appa...

Microlithographic exposure method as well as a projection exposure...

Projection exposure apparatus and method for operating the same

System for reducing the coherence of laser radiation

Microlithographic exposure method as well as a projection exposure...

EUV illumination system having a plurality of light sources for ill...

Method of determining at least one parameter that is characteristic...

Process for the decontamination of microlithographic projection exp...

Projection exposure system

Projection exposure device

System for compensating directional and positional fluctuations in...

Patents Applicationslast 30 patents

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

PROJECTION OBJECTIVE WITH DIAPHRAGMS

MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

ILLUMINATION SYSTEM OR PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC...

MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME

System for reducing the coherence of laser radiation

Microlithography exposure method and projection exposure apparatus...

System for setting and maintaining a gas atmosphere in an optical s...

Microlithographic exposure method as well as a projection exposure...

Method for producing an optical element from a quartz substrate

Optical system with birefringent optical elements

Illumination system with a plurality of light sources

Method of determining at least one parameter that is characteristic...

Method for producing an optical element from a quartz substrate

Projection exposure system

Projection exposure device

Process for the decontamination of microlithographic projection exp...