Nirupam BANERJEE

Person

  • Eindhoven, NL

Patents Grantslast 30 patents

  • Information Patent Grant

    Image sensor for immersion lithography

    • Patent number 11,774,868
    • Issue date Oct 3, 2023
    • ASML Netherlands B.V.
    • Nirupam Banerjee
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Membrane for EUV lithography

    • Patent number 11,762,281
    • Issue date Sep 19, 2023
    • ASML Netherlands B.V.
    • Maxim Aleksandrovich Nasalevich
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Method of performance testing working parameters of a fluid handlin...

    • Patent number 11,143,969
    • Issue date Oct 12, 2021
    • ASML Netherlands B.V.
    • Giovanni Luca Gattobigio
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Membrane for EUV lithography

    • Patent number 10,908,496
    • Issue date Feb 2, 2021
    • ASML Netherlands B.V.
    • Maxim Aleksandrovich Nasalevich
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

  • Information Patent Application

    MEMBRANE FOR EUV LITHOGRAPHY

    • Publication number 20240004283
    • Publication date Jan 4, 2024
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich Nasalevich
    • G02 - OPTICS
  • Information Patent Application

    IMAGE SENSOR FOR IMMERSION LITHOGRAPHY

    • Publication number 20220163896
    • Publication date May 26, 2022
    • ASML NETHERLANDS B.V.
    • Nirupam BANERJEE
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    MEMBRANE FOR EUV LITHOGRAPHY

    • Publication number 20210109438
    • Publication date Apr 15, 2021
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich Nasalevich
    • G02 - OPTICS
  • Information Patent Application

    METHOD OF PERFORMANCE TESTING WORKING PARAMETERS OF A FLUID HANDLIN...

    • Publication number 20200150545
    • Publication date May 14, 2020
    • ASML NETHERLANDS B.V.
    • Giovanni Luca GATTOBIGIO
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    A MEMBRANE FOR EUV LITHOGRAPHY

    • Publication number 20190129299
    • Publication date May 2, 2019
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich NASALEVICH
    • G02 - OPTICS