Nitesh Pandey

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,366,811
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Micromirror arrays
- Patent number 12,259,546
- Issue date Mar 25, 2025
- ASML Netherlands B.V.
- Alexandre Halbach
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Metrology method and apparatus for of determining a complex-valued...
- Patent number 12,164,233
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Alexander Prasetya Konijnenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Detection apparatus for simultaneous acquisition of multiple divers...
- Patent number 12,086,973
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Teunis Willem Tukker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,007,700
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus
- Patent number 11,940,739
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for determining the position of a target stru...
- Patent number 11,927,891
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Metrology device and detection apparatus therefor
- Patent number 11,782,351
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and photonic crystal fiber
- Patent number 11,675,276
- Issue date Jun 13, 2023
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus
- Patent number 11,549,806
- Issue date Jan 10, 2023
- ASML Netherland B.V.
- Marinus Johannes Maria Van Dam
- G01 - MEASURING TESTING
Information Patent Grant
Scatterometer and method of scatterometry using acoustic radiation
- Patent number 11,536,654
- Issue date Dec 27, 2022
- ASML Netherlands B.V.
- Maxim Pisarenco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,454,887
- Issue date Sep 27, 2022
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 11,415,900
- Issue date Aug 16, 2022
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 11,385,553
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus
- Patent number 11,262,661
- Issue date Mar 1, 2022
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Metrology sensor, lithographic apparatus and method for manufacturi...
- Patent number 11,086,240
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjustment of a metrology apparatus or a measurement thereby based...
- Patent number 10,996,571
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Robert John Socha
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 10,996,570
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for measuring a parameter of interest using im...
- Patent number 10,983,445
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Topography measurement system
- Patent number 10,935,373
- Issue date Mar 2, 2021
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus, lithographic system, and method of measuring a...
- Patent number 10,908,514
- Issue date Feb 2, 2021
- ASML Netherlands B.V.
- Janneke Ravensbergen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus
- Patent number 10,895,452
- Issue date Jan 19, 2021
- ASML Netherlands B.V.
- Marinus Johannes Maria Van Dam
- G02 - OPTICS
Information Patent Grant
Metrology apparatus, lithographic system, and method of measuring a...
- Patent number 10,895,812
- Issue date Jan 19, 2021
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and device
- Patent number 10,866,526
- Issue date Dec 15, 2020
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G01 - MEASURING TESTING
Information Patent Grant
Scatterometer and method of scatterometry using acoustic radiation
- Patent number 10,845,304
- Issue date Nov 24, 2020
- ASML Netherlands B.V.
- Maxim Pisarenco
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 10,816,909
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a value of a parameter of interest, method of...
- Patent number 10,795,269
- Issue date Oct 6, 2020
- ASML Netherlands B.V.
- Zili Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a parameter of interest, device manufacturing m...
- Patent number 10,788,758
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Jin Lian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 10,775,704
- Issue date Sep 15, 2020
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a target, metrology apparatus, polarizer assembly
- Patent number 10,747,124
- Issue date Aug 18, 2020
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...
- Publication number 20240404036
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Teunis Willem TUKKER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
Metrology Apparatus
- Publication number 20240184218
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology System and Method for Determining a Characteristic of One...
- Publication number 20230062585
- Publication date Mar 2, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
MICROMIRROR ARRAYS
- Publication number 20220342199
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Alexandre HALBACH
- G02 - OPTICS
Information Patent Application
METROLOGY DEVICE AND DETECTION APPARATUS THEREFOR
- Publication number 20220334497
- Publication date Oct 20, 2022
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS FOR OF DETERMINING A COMPLEX-VALUED...
- Publication number 20220299888
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Alexander Prasetya KONIJNENBERG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MICROMIRROR ARRAYS
- Publication number 20220283428
- Publication date Sep 8, 2022
- ASML NETHERLANDS B.V.
- Luc Roger Simonne HASPESLAGH
- G02 - OPTICS
Information Patent Application
DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...
- Publication number 20220172347
- Publication date Jun 2, 2022
- ASML NETHERLANDS B.V.
- Teunis Willem TUKKER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY APPARATUS
- Publication number 20220121127
- Publication date Apr 21, 2022
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and Methods for Determining the Position of a Target Stru...
- Publication number 20210364936
- Publication date Nov 25, 2021
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM
- Publication number 20210255553
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G01 - MEASURING TESTING
Information Patent Application
Metrology Apparatus
- Publication number 20210123724
- Publication date Apr 29, 2021
- ASML NETHERLANDS B.V.
- Marinus Johannes Maria VAN DAM
- G02 - OPTICS
Information Patent Application
Scatterometer and Method of Scatterometry Using Acoustic Radiation
- Publication number 20210055215
- Publication date Feb 25, 2021
- ASML NETHERLANDS B.V.
- Maxim PISARENCO
- G01 - MEASURING TESTING
Information Patent Application
Metrology System and Method For Determining a Characteristic of one...
- Publication number 20210003924
- Publication date Jan 7, 2021
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADJUSTMENT OF A METROLOGY APPARATUS OR A MEASUREMENT THEREBY BASED...
- Publication number 20200249584
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Robert John SOCHA
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method, Patterning Device, Apparatus and Computer Program
- Publication number 20200110342
- Publication date Apr 9, 2020
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SENSOR, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURI...
- Publication number 20200089135
- Publication date Mar 19, 2020
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic of...
- Publication number 20200081340
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus
- Publication number 20200072599
- Publication date Mar 5, 2020
- ASML NETHERLANDS B.V.
- Marinus Johannes Maria VAN DAM
- G02 - OPTICS
Information Patent Application
Metrology Apparatus and Photonic Crystal Fiber
- Publication number 20200057387
- Publication date Feb 20, 2020
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM, AND METHOD OF MEASURING A...
- Publication number 20200004165
- Publication date Jan 2, 2020
- ASML NETHERLANDS B.V.
- Janneke RAVENSBERGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Topography Measurement System
- Publication number 20190383602
- Publication date Dec 19, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G01 - MEASURING TESTING
Information Patent Application
Metrology Apparatus
- Publication number 20190384184
- Publication date Dec 19, 2019
- ASML NETHERLANDS B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20190346771
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G02 - OPTICS
Information Patent Application
Method of Measuring a Target, Metrology Apparatus, Polarizer Assembly
- Publication number 20190294054
- Publication date Sep 26, 2019
- ASML NETHERLANDS B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...
- Publication number 20190285993
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...
- Publication number 20190250094
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus, Computer Program and Lithographic S...
- Publication number 20190146356
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method Of Determining A Value Of A Parameter Of Interest, Method Of...
- Publication number 20190129316
- Publication date May 2, 2019
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Nitesh Pandey

Person

Patents Grantslast 30 patents

Metrology system and method for determining a characteristic of one...

Micromirror arrays

Metrology method and apparatus for of determining a complex-valued...

Detection apparatus for simultaneous acquisition of multiple divers...

Metrology system and method for determining a characteristic of one...

Metrology apparatus

Apparatus and methods for determining the position of a target stru...

Metrology device and detection apparatus therefor

Metrology apparatus and photonic crystal fiber

Metrology apparatus

Scatterometer and method of scatterometry using acoustic radiation

Metrology apparatus and method for determining a characteristic of...

Metrology system and method for determining a characteristic of one...

Metrology method, patterning device, apparatus and computer program

Metrology apparatus

Metrology sensor, lithographic apparatus and method for manufacturi...

Adjustment of a metrology apparatus or a measurement thereby based...

Metrology method, patterning device, apparatus and computer program

Method and apparatus for measuring a parameter of interest using im...

Topography measurement system

Metrology apparatus, lithographic system, and method of measuring a...

Metrology apparatus

Metrology apparatus, lithographic system, and method of measuring a...

Metrology method and device

Scatterometer and method of scatterometry using acoustic radiation

Metrology system and method for determining a characteristic of one...

Method of determining a value of a parameter of interest, method of...

Method of measuring a parameter of interest, device manufacturing m...

Method of measuring a structure, inspection apparatus, lithographic...

Method of measuring a target, metrology apparatus, polarizer assembly

Patents Applicationslast 30 patents

DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

Metrology Apparatus

Metrology System and Method for Determining a Characteristic of One...

MICROMIRROR ARRAYS

METROLOGY DEVICE AND DETECTION APPARATUS THEREFOR

METROLOGY METHOD AND APPARATUS FOR OF DETERMINING A COMPLEX-VALUED...

MICROMIRROR ARRAYS

DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...

METROLOGY APPARATUS

Apparatus and Methods for Determining the Position of a Target Stru...

METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM

Metrology Apparatus

Scatterometer and Method of Scatterometry Using Acoustic Radiation

Metrology System and Method For Determining a Characteristic of one...

ADJUSTMENT OF A METROLOGY APPARATUS OR A MEASUREMENT THEREBY BASED...

Metrology Method, Patterning Device, Apparatus and Computer Program

METROLOGY SENSOR, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURI...

Metrology Apparatus and Method for Determining a Characteristic of...

Metrology Apparatus

Metrology Apparatus and Photonic Crystal Fiber

METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM, AND METHOD OF MEASURING A...

Topography Measurement System

Metrology Apparatus

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

Method of Measuring a Target, Metrology Apparatus, Polarizer Assembly

METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...

METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...

Metrology Method and Apparatus, Computer Program and Lithographic S...

Method Of Determining A Value Of A Parameter Of Interest, Method Of...