Noam Sapiens

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Variable aperture mask
- Patent number 11,268,901
- Issue date Mar 8, 2022
- KLA Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for measurement of thick films and high aspect...
- Patent number 11,119,050
- Issue date Sep 14, 2021
- KLA Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for measurement of thick films and high aspect...
- Patent number 10,690,602
- Issue date Jun 23, 2020
- KLA-Tencor Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable aperture mask
- Patent number 10,663,392
- Issue date May 26, 2020
- KLA Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology with small illumination spot size
- Patent number 10,648,796
- Issue date May 12, 2020
- KLA-Tencor Corporation
- Noam Sapiens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 10,612,916
- Issue date Apr 7, 2020
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for metrology beam stabilization
- Patent number 10,365,211
- Issue date Jul 30, 2019
- KLA-Tencor Corporation
- Barry Blasenheim
- G02 - OPTICS
Information Patent Grant
Method and system for spectroscopic beam profile metrology includin...
- Patent number 10,234,271
- Issue date Mar 19, 2019
- KLA-Tencor Corporation
- Jiyou Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus, techniques, and target designs for measuring semiconduct...
- Patent number 10,107,765
- Issue date Oct 23, 2018
- KLA-Tencor Corporation
- Noam Sapiens
- G01 - MEASURING TESTING
Information Patent Grant
Spectroscopic beam profile overlay metrology
- Patent number 10,101,676
- Issue date Oct 16, 2018
- KLA-Tencor Corporation
- Jiyou Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for spectroscopic beam profile metrology having...
- Patent number 10,072,921
- Issue date Sep 11, 2018
- KLA-Tencor Corporation
- Jiyou Fu
- G01 - MEASURING TESTING
Information Patent Grant
Compressive sensing for metrology
- Patent number 10,062,157
- Issue date Aug 28, 2018
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical metrology with small illumination spot size
- Patent number 9,915,524
- Issue date Mar 13, 2018
- KLA-Tencor Corporation
- Noam Sapiens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 9,816,810
- Issue date Nov 14, 2017
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus, techniques, and target designs for measuring semiconduct...
- Patent number 9,784,690
- Issue date Oct 10, 2017
- KLA-Tencor Corporation
- Noam Sapiens
- G01 - MEASURING TESTING
Information Patent Grant
Measurement systems having linked field and pupil signal detection
- Patent number 9,739,719
- Issue date Aug 22, 2017
- KLA-Tencor Corporation
- Jiyou Fu
- G01 - MEASURING TESTING
Information Patent Grant
Metrology target indentification, design and verification
- Patent number 9,546,946
- Issue date Jan 17, 2017
- KLA-Tencor Corporation
- Boris Golovanevsky
- G01 - MEASURING TESTING
Information Patent Grant
Compressive sensing for metrology
- Patent number 9,518,916
- Issue date Dec 13, 2016
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 9,490,182
- Issue date Nov 8, 2016
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Methods And Systems For Measurement Of Thick Films And High Aspect...
- Publication number 20200284733
- Publication date Sep 10, 2020
- KLA Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Aperture Mask
- Publication number 20200271569
- Publication date Aug 27, 2020
- KLA Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Application
Systems And Methods For Metrology Beam Stabilization
- Publication number 20190094130
- Publication date Mar 28, 2019
- KLA-Tencor Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Application
Variable Aperture Mask
- Publication number 20190049365
- Publication date Feb 14, 2019
- KLA-Tencor Corporation
- Barry Blasenheim
- G02 - OPTICS
Information Patent Application
Methods And Systems For Spectroscopic Beam Profile Metrology
- Publication number 20180347961
- Publication date Dec 6, 2018
- KLA-Tencor Corporation
- Jiyou Fu
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Measurement Of Thick Films And High Aspect...
- Publication number 20180238814
- Publication date Aug 23, 2018
- KLA-Tencor Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Metrology With Small Illumination Spot Size
- Publication number 20180180406
- Publication date Jun 28, 2018
- KLA-Tencor Corporation
- Noam Sapiens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measurement Of Multiple Patterning Parameters
- Publication number 20180051984
- Publication date Feb 22, 2018
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS, TECHNIQUES, AND TARGET DESIGNS FOR MEASURING SEMICONDUCT...
- Publication number 20170356853
- Publication date Dec 14, 2017
- KLA-Tencor Corporation
- Noam Sapiens
- G01 - MEASURING TESTING
Information Patent Application
Spectroscopic Beam Profile Overlay Metrology
- Publication number 20170082932
- Publication date Mar 23, 2017
- KLA-Tencor Corporation
- Jiyou Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPRESSIVE SENSING FOR METROLOGY
- Publication number 20170076440
- Publication date Mar 16, 2017
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Measurement Of Multiple Patterning Parameters
- Publication number 20170003123
- Publication date Jan 5, 2017
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Optical Metrology With Small Illumination Spot Size
- Publication number 20160334326
- Publication date Nov 17, 2016
- KLA-Tencor Corporation
- Noam Sapiens
- G01 - MEASURING TESTING
Information Patent Application
Spectroscopic Beam Profile Metrology
- Publication number 20160161245
- Publication date Jun 9, 2016
- KLA-Tencor Corporation
- Jiyou Fu
- G01 - MEASURING TESTING
Information Patent Application
Measurement Systems Having Linked Field And Pupil Signal Detection
- Publication number 20160123894
- Publication date May 5, 2016
- KLA-Tencor Corporation
- Jiyou Fu
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS, TECHNIQUES, AND TARGET DESIGNS FOR MEASURING SEMICONDUCT...
- Publication number 20150323471
- Publication date Nov 12, 2015
- KLA-Tencor Corporation
- Noam Sapiens
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY TARGET INDENTIFICATION, DESIGN AND VERIFICATION
- Publication number 20150233814
- Publication date Aug 20, 2015
- KLA-Tencor Corporation
- Boris Golovanevsky
- G01 - MEASURING TESTING
Information Patent Application
Measurement Of Multiple Patterning Parameters
- Publication number 20150176985
- Publication date Jun 25, 2015
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR SCATTEROMETRIC MEASUREMENT OF HUMAN TISSUE
- Publication number 20150157199
- Publication date Jun 11, 2015
- Noam Sapiens
- G02 - OPTICS

Noam Sapiens

Person

Patents Grantslast 30 patents

Variable aperture mask

Methods and systems for measurement of thick films and high aspect...

Methods and systems for measurement of thick films and high aspect...

Variable aperture mask

Optical metrology with small illumination spot size

Measurement of multiple patterning parameters

Systems and methods for metrology beam stabilization

Method and system for spectroscopic beam profile metrology includin...

Apparatus, techniques, and target designs for measuring semiconduct...

Spectroscopic beam profile overlay metrology

Methods and systems for spectroscopic beam profile metrology having...

Compressive sensing for metrology

Optical metrology with small illumination spot size

Measurement of multiple patterning parameters

Apparatus, techniques, and target designs for measuring semiconduct...

Measurement systems having linked field and pupil signal detection

Metrology target indentification, design and verification

Compressive sensing for metrology

Measurement of multiple patterning parameters

Patents Applicationslast 30 patents

Methods And Systems For Measurement Of Thick Films And High Aspect...

Variable Aperture Mask

Systems And Methods For Metrology Beam Stabilization

Variable Aperture Mask

Methods And Systems For Spectroscopic Beam Profile Metrology

Methods And Systems For Measurement Of Thick Films And High Aspect...

Optical Metrology With Small Illumination Spot Size

Measurement Of Multiple Patterning Parameters

APPARATUS, TECHNIQUES, AND TARGET DESIGNS FOR MEASURING SEMICONDUCT...

Spectroscopic Beam Profile Overlay Metrology

COMPRESSIVE SENSING FOR METROLOGY

Measurement Of Multiple Patterning Parameters

Optical Metrology With Small Illumination Spot Size

Spectroscopic Beam Profile Metrology

Measurement Systems Having Linked Field And Pupil Signal Detection

APPARATUS, TECHNIQUES, AND TARGET DESIGNS FOR MEASURING SEMICONDUCT...

METROLOGY TARGET INDENTIFICATION, DESIGN AND VERIFICATION

Measurement Of Multiple Patterning Parameters

METHOD AND APPARATUS FOR SCATTEROMETRIC MEASUREMENT OF HUMAN TISSUE