Nobuaki NAKASHIMA

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing sputtering target and sputtering target
- Patent number 11,220,740
- Issue date Jan 11, 2022
- Kabushiki Kaisha Toshiba
- Tooru Komatsu
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Method of manufacturing sputtering target and sputtering target
- Patent number 11,198,933
- Issue date Dec 14, 2021
- Kabushiki Kaisha Toshiba
- Tooru Komatsu
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Method of manufacturing sputtering target and sputtering target
- Patent number 10,533,248
- Issue date Jan 14, 2020
- Kabushiki Kaisha Toshiba
- Tooru Komatsu
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Sputtering target, manufacturing method thereof, and manufacturing...
- Patent number RE47788
- Issue date Dec 31, 2019
- Kabushiki Kaisha Toshiba
- Nobuaki Nakashima
Information Patent Grant
Sputtering target, manufacturing method thereof, and manufacturing...
- Patent number 9,382,613
- Issue date Jul 5, 2016
- Kabushiki Kaisha Toshiba
- Nobuaki Nakashima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tantalum sputtering target and method for manufacturing the same, a...
- Patent number 8,747,633
- Issue date Jun 10, 2014
- Kabushiki Kaisha Toshiba
- Nobuaki Nakashima
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Getter material and evaporable getter device using the same, and el...
- Patent number 7,927,167
- Issue date Apr 19, 2011
- Kabushiki Kaisha Toshiba
- Hiromichi Horie
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
IC package and LSI package using a lead frame formed of a copper-zi...
- Patent number 5,341,025
- Issue date Aug 23, 1994
- Kabushiki Kaisha Toshiba
- Nobuaki Nakashima
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Lead frame with improved adhesiveness property against plastic and...
- Patent number 5,315,152
- Issue date May 24, 1994
- Kabushiki Kaisha Toshiba
- Takashi Kuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fe-Ni based alloy
- Patent number 5,264,050
- Issue date Nov 23, 1993
- Kabushiki Kaisha Toshiba
- Nobuaki Nakashima
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Lead frame formed of a copper-zirconium alloy
- Patent number 5,210,441
- Issue date May 11, 1993
- Kabushiki Kaisha Toshiba
- Nobuaki Nakashima
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Precision parts of non-magnetic stainless steels
- Patent number 5,098,652
- Issue date Mar 24, 1992
- Kabushiki Kaisha Toshiba
- Tsuyoshi Yasui
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SPUTTERING TARGET AND SPUTTERING TARGET
- Publication number 20200115790
- Publication date Apr 16, 2020
- Kabushiki Kaisha Toshiba
- Tooru KOMATSU
- B22 - CASTING POWDER METALLURGY
Information Patent Application
METHOD OF MANUFACTURING SPUTTERING TARGET AND SPUTTERING TARGET
- Publication number 20200115791
- Publication date Apr 16, 2020
- Kabushiki Kaisha Toshiba
- Tooru KOMATSU
- B22 - CASTING POWDER METALLURGY
Information Patent Application
METHOD OF MANUFACTURING SPUTTERING TARGET AND SPUTTERING TARGET
- Publication number 20170009336
- Publication date Jan 12, 2017
- Kabushiki Kaisha Toshiba
- Tooru KOMATSU
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SPUTTERING TARGET, MANUFACTURING METHOD THEREOF, AND MANUFACTURING...
- Publication number 20130001069
- Publication date Jan 3, 2013
- TOSHIBA MATERIALS CO., LTD.
- Nobuaki NAKASHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TANTALUM SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE SAME, A...
- Publication number 20120267236
- Publication date Oct 25, 2012
- TOSHIBA MATERIALS CO., LTD.
- Nobuaki NAKASHIMA
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
GETTER MATERIAL AND EVAPORABLE GETTER DEVICE USING THE SAME, AND EL...
- Publication number 20100275727
- Publication date Nov 4, 2010
- KABUSHIKI KAISHA TOSHIBA
- Hiromichi Horie
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Getter Material And Evaporable Getter Device Using The Same, And El...
- Publication number 20080012486
- Publication date Jan 17, 2008
- KABUSHIKI KAISHA TOSHIBA
- Hiromichi Horie
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Nobuaki NAKASHIMA

Person

Patents Grantslast 30 patents

Method of manufacturing sputtering target and sputtering target

Method of manufacturing sputtering target and sputtering target

Method of manufacturing sputtering target and sputtering target

Sputtering target, manufacturing method thereof, and manufacturing...

Sputtering target, manufacturing method thereof, and manufacturing...

Tantalum sputtering target and method for manufacturing the same, a...

Getter material and evaporable getter device using the same, and el...

IC package and LSI package using a lead frame formed of a copper-zi...

Lead frame with improved adhesiveness property against plastic and...

Fe-Ni based alloy

Lead frame formed of a copper-zirconium alloy

Precision parts of non-magnetic stainless steels

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING SPUTTERING TARGET AND SPUTTERING TARGET

METHOD OF MANUFACTURING SPUTTERING TARGET AND SPUTTERING TARGET

METHOD OF MANUFACTURING SPUTTERING TARGET AND SPUTTERING TARGET

SPUTTERING TARGET, MANUFACTURING METHOD THEREOF, AND MANUFACTURING...

TANTALUM SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE SAME, A...

GETTER MATERIAL AND EVAPORABLE GETTER DEVICE USING THE SAME, AND EL...

Getter Material And Evaporable Getter Device Using The Same, And El...