Nobuhiro Ogata

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and cleaning method of mist guard
- Patent number 12,148,632
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Yusuke Hashimoto
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus
- Patent number 12,051,605
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nozzle, substrate processing apparatus, and substrate processing me...
- Patent number 12,007,692
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Hiroki Sakurai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate liquid processing apparatus and substrate liquid processi...
- Patent number 11,880,213
- Issue date Jan 23, 2024
- Tokyo Electron Limited
- Mikio Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,712,710
- Issue date Aug 1, 2023
- Tokyo Electron Limited
- Fumihiro Kamimura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,574,827
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Tadashi Iino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,158,525
- Issue date Oct 26, 2021
- Tokyo Electron Limited
- Yasuhiro Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,056,335
- Issue date Jul 6, 2021
- Tokyo Electron Limited
- Jiro Higashijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus, substrate processing method and rec...
- Patent number 11,024,518
- Issue date Jun 1, 2021
- Tokyo Electron Limited
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of cleaning substrate proces...
- Patent number 10,486,208
- Issue date Nov 26, 2019
- Tokyo Electron Limited
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and method of cleaning substrate pro...
- Patent number 10,475,671
- Issue date Nov 12, 2019
- Tokyo Electron Limited
- Jiro Higashijima
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Substrate processing apparatus
- Patent number 9,933,702
- Issue date Apr 3, 2018
- Tokyo Electron Limited
- Jiro Higashijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid processing apparatus with cleaning jig
- Patent number 9,721,813
- Issue date Aug 1, 2017
- Tokyo Electron Limited
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 9,484,230
- Issue date Nov 1, 2016
- Tokyo Electron Limited
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and cleaning method
- Patent number 9,387,520
- Issue date Jul 12, 2016
- Tokyo Electron Limited
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Grant
Substrate liquid processing apparatus for separating processing sol...
- Patent number 9,355,871
- Issue date May 31, 2016
- Tokyo Electron Limited
- Jiro Higashijima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Liquid processing apparatus, liquid processing method and storage m...
- Patent number 9,305,767
- Issue date Apr 5, 2016
- Tokyo Electron Limited
- Kenji Nishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus, liquid processing method, and computer...
- Patent number 9,108,231
- Issue date Aug 18, 2015
- Tokyo Electron Limited
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Grant
Liquid processing apparatus having switchable nozzles
- Patent number 9,108,228
- Issue date Aug 18, 2015
- Tokyo Electron Limited
- Takahisa Otsuka
- B08 - CLEANING
Information Patent Grant
Liquid processing apparatus, liquid processing method, and recordin...
- Patent number 9,073,103
- Issue date Jul 7, 2015
- Tokyo Electron Limited
- Satoshi Morita
- B08 - CLEANING
Information Patent Grant
Substrate liquid treatment apparatus with lift pin plate
- Patent number 9,048,269
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid cleaning apparatus with controlled liquid port eje...
- Patent number 9,022,045
- Issue date May 5, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus, method of controlling substr...
- Patent number 8,881,751
- Issue date Nov 11, 2014
- Tokyo Electron Limited
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 8,869,811
- Issue date Oct 28, 2014
- Tokyo Electron Limited
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Grant
Liquid processing apparatus, liquid processing method, and computer...
- Patent number 8,845,815
- Issue date Sep 30, 2014
- Tokyo Electron Limited
- Nobuhiro Ogata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Flow passage switching apparatus, processing apparatus, flow passag...
- Patent number 8,840,752
- Issue date Sep 23, 2014
- Tokyo Electron Limited
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating method
- Patent number 8,808,798
- Issue date Aug 19, 2014
- Tokyo Electron Limited
- Takahiro Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating film forming apparatus, use of coating film forming apparat...
- Patent number 8,758,855
- Issue date Jun 24, 2014
- Tokyo Electron Limited
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating method
- Patent number 8,551,563
- Issue date Oct 8, 2013
- Tokyo Electron Limited
- Takahiro Kitano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 8,539,906
- Issue date Sep 24, 2013
- Tokyo Electron Limited
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240157408
- Publication date May 16, 2024
- TOKYO ELECTRON LIMITED
- Daisuke GOTO
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE GRIPPING DEVICE
- Publication number 20240124984
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Yusuke HASHIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240021445
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Hiroki SAKURAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING ME...
- Publication number 20230185199
- Publication date Jun 15, 2023
- TOKYO ELECTRON LIMITED
- Hiroki SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD OF MIST GUARD
- Publication number 20230001458
- Publication date Jan 5, 2023
- TOKYO ELECTRON LIMITED
- Yusuke Hashimoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20220115249
- Publication date Apr 14, 2022
- TOKYO ELECTRON LIMITED
- Nobuhiro OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220112603
- Publication date Apr 14, 2022
- TOKYO ELECTRON LIMITED
- Hiroki SAKURAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20210365054
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Mikio NAKASHIMA
- G05 - CONTROLLING REGULATING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200357667
- Publication date Nov 12, 2020
- TOKYO ELECTRON LIMITED
- Tadashi IINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200152443
- Publication date May 14, 2020
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20200070196
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Fumihiro KAMIMURA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20200038897
- Publication date Feb 6, 2020
- TOKYO ELECTRON LIMITED
- Fumihiro KAMIMURA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20190067048
- Publication date Feb 28, 2019
- Tokyo Electron Limited
- Yasuhiro Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20180221925
- Publication date Aug 9, 2018
- TOKYO ELECTRON LIMITED
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND PROCESSING LIQUID SUPPLY METHOD
- Publication number 20180090306
- Publication date Mar 29, 2018
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF CLEANING SUBSTRATE PROCES...
- Publication number 20170361364
- Publication date Dec 21, 2017
- TOKYO ELECTRON LIMITED
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF CLEANING SUBSTRATE PRO...
- Publication number 20170200624
- Publication date Jul 13, 2017
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170059996
- Publication date Mar 2, 2017
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER...
- Publication number 20140360540
- Publication date Dec 11, 2014
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...
- Publication number 20140137893
- Publication date May 22, 2014
- TOKYO ELECTRON LIMITED
- Takahisa Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS AND CLEANING METHOD
- Publication number 20140026927
- Publication date Jan 30, 2014
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING APPARATUS, CLEANING JIG, AND CLEANING METHOD
- Publication number 20140014134
- Publication date Jan 16, 2014
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER...
- Publication number 20130228200
- Publication date Sep 5, 2013
- TOKYO ELECTRON LIMITED
- Takahisa Otsuka
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20130008872
- Publication date Jan 10, 2013
- TOKYO ELECTRON LIMITED
- Jiro Higashuima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COATING METHOD
- Publication number 20120301612
- Publication date Nov 29, 2012
- TOKYO ELECTRON LIMITED
- Takahiro Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER...
- Publication number 20120260946
- Publication date Oct 18, 2012
- Nobuhiro OGATA
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE M...
- Publication number 20120234356
- Publication date Sep 20, 2012
- TOKYO ELECTRON LIMITED
- Kenji Nishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid Processing Apparatus, Liquid Processing Method, and Recordin...
- Publication number 20120227768
- Publication date Sep 13, 2012
- TOKYO ELECTRON LIMITED
- Satoshi MORITA
- B08 - CLEANING
Information Patent Application
COATING APPARATUS AND METHOD
- Publication number 20120213925
- Publication date Aug 23, 2012
- TOKYO ELECTRON LIMITED
- Takahiro KITANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating Film Forming Apparatus, Use Of Coating Film Forming Apparat...
- Publication number 20120183693
- Publication date Jul 19, 2012
- TOKYO ELECTRON LIMITED
- Nobuhiro OGATA
- H01 - BASIC ELECTRIC ELEMENTS

Nobuhiro Ogata

Person

Patents Grantslast 30 patents

Substrate processing apparatus and cleaning method of mist guard

Substrate processing apparatus

Nozzle, substrate processing apparatus, and substrate processing me...

Substrate liquid processing apparatus and substrate liquid processi...

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus

Substrate processing apparatus, substrate processing method and rec...

Substrate processing apparatus, method of cleaning substrate proces...

Substrate processing apparatus and method of cleaning substrate pro...

Substrate processing apparatus

Liquid processing apparatus with cleaning jig

Substrate liquid processing apparatus

Liquid processing apparatus and cleaning method

Substrate liquid processing apparatus for separating processing sol...

Liquid processing apparatus, liquid processing method and storage m...

Liquid processing apparatus, liquid processing method, and computer...

Liquid processing apparatus having switchable nozzles

Liquid processing apparatus, liquid processing method, and recordin...

Substrate liquid treatment apparatus with lift pin plate

Substrate liquid cleaning apparatus with controlled liquid port eje...

Substrate liquid processing apparatus, method of controlling substr...

Liquid processing apparatus and liquid processing method

Liquid processing apparatus, liquid processing method, and computer...

Flow passage switching apparatus, processing apparatus, flow passag...

Coating method

Coating film forming apparatus, use of coating film forming apparat...

Coating method

Substrate liquid processing apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE GRIPPING DEVICE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING ME...

SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD OF MIST GUARD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

Substrate Processing Apparatus and Substrate Processing Method

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...

SUBSTRATE PROCESSING APPARATUS AND PROCESSING LIQUID SUPPLY METHOD

SUBSTRATE PROCESSING APPARATUS, METHOD OF CLEANING SUBSTRATE PROCES...

SUBSTRATE PROCESSING APPARATUS AND METHOD OF CLEANING SUBSTRATE PRO...

SUBSTRATE PROCESSING APPARATUS

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...

LIQUID PROCESSING APPARATUS AND CLEANING METHOD

LIQUID PROCESSING APPARATUS, CLEANING JIG, AND CLEANING METHOD

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER...

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

COATING METHOD

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER...

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE M...

Liquid Processing Apparatus, Liquid Processing Method, and Recordin...

COATING APPARATUS AND METHOD

Coating Film Forming Apparatus, Use Of Coating Film Forming Apparat...