Nobuhito Fukui

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Toyonaka, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photoresist compositions
- Patent number 6,258,507
- Issue date Jul 10, 2001
- Sumitomo Chemical Company, Limited
- Koshiro Ochiai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo resist composition
- Patent number 6,153,349
- Issue date Nov 28, 2000
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 6,040,112
- Issue date Mar 21, 2000
- Sumitomo Chemical Company, Limited
- Yuko Yako
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 5,916,728
- Issue date Jun 29, 1999
- Sumitomo Chemical Company, Limited
- Nobuhito Fukui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 5,891,601
- Issue date Apr 6, 1999
- Sumitomo Chemical Company, Ltd.
- Nobuhito Fukui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 5,846,688
- Issue date Dec 8, 1998
- Sumitomo Chemical Company, Limited
- Nobuhito Fukui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY