Nobuhito Toyama

Person

Tokyo-to, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Diffractive optical element
- Patent number 11,366,256
- Issue date Jun 21, 2022
- Dai Nippon Printing Co., Ltd.
- Nobuhito Toyama
- G02 - OPTICS
Information Patent Grant
Diffractive optical element
- Patent number 11,340,389
- Issue date May 24, 2022
- Dai Nippon Printing Co., Ltd.
- Nobuhito Toyama
- G02 - OPTICS
Information Patent Grant
Diffractive optical element and light irradiation device
- Patent number 10,768,347
- Issue date Sep 8, 2020
- Dai Nippon Printing Co., Ltd.
- Yuichi Miyazaki
- G02 - OPTICS
Information Patent Grant
Diffractive optical element and light irradiation apparatus
- Patent number 10,704,763
- Issue date Jul 7, 2020
- Dai Nippon Printing Co., Ltd.
- Yuichi Miyazaki
- G02 - OPTICS
Information Patent Grant
Diffractive optical element and light irradiation apparatus
- Patent number 10,591,133
- Issue date Mar 17, 2020
- Dai Nippon Printing Co., Ltd.
- Yuichi Miyazaki
- F21 - LIGHTING
Information Patent Grant
Diffractive optical device, and aligner comprising that device
- Patent number 8,259,290
- Issue date Sep 4, 2012
- Dai Nippon Printing Co., Ltd.
- Nobuhito Toyama
- G02 - OPTICS
Information Patent Grant
Gradated photomask and its fabrication process
- Patent number 8,124,301
- Issue date Feb 28, 2012
- Dai Nippon Printing Co., Ltd.
- Junji Fujikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask
- Patent number 7,968,255
- Issue date Jun 28, 2011
- Dai Nippon Printing Co., Ltd.
- Yasuhisa Kitahata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Designing method and device for phase shift mask
- Patent number 7,367,010
- Issue date Apr 29, 2008
- Dai Nippon Printing Co., Ltd.
- Kei Mesuda
- E21 - EARTH DRILLING MINING
Information Patent Grant
Antireflection structure
- Patent number 7,297,386
- Issue date Nov 20, 2007
- Dai Nippon Printing Co., Ltd.
- Toshiyuki Suzuki
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Designing method and device for phase shift mask
- Patent number 7,287,240
- Issue date Oct 23, 2007
- Dai Nippon Printing Co., Ltd.
- Nobuhito Toyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of evaluating the exposure property of data to wafer
- Patent number 7,117,140
- Issue date Oct 3, 2006
- Dainippon Printing Co., Ltd.
- Nobuhito Toyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Designing method and device for phase shift mask
- Patent number 7,067,221
- Issue date Jun 27, 2006
- Dai Nippon Printing Co., Ltd.
- Kei Mesuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
METHOD FOR CORRECTING DESIGN PATTERN OF SEMICONDUCTOR CIRCUIT, A PH...
- Patent number 6,821,683
- Issue date Nov 23, 2004
- Dainippon Printing Co., Ltd.
- Nobuhito Toyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Design circuit pattern for test of semiconductor circuit
- Patent number 6,694,500
- Issue date Feb 17, 2004
- Dainippon Printing Co., Ltd.
- Nobuhito Toyama
- G01 - MEASURING TESTING
Information Patent Grant
Method of forming minute focusing lens
- Patent number 6,656,664
- Issue date Dec 2, 2003
- Dai Nippon Printing Co., Ltd.
- Yoichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for making photomask pattern data and photomask
- Patent number 6,560,767
- Issue date May 6, 2003
- Dainippon Printing Co., Ltd.
- Nobuhito Toyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern data and method for writing a photomask...
- Patent number 6,523,163
- Issue date Feb 18, 2003
- Dainippon Printing Co., Ltd.
- Nobuhito Toyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DIFFRACTIVE OPTICAL ELEMENT
- Publication number 20200116908
- Publication date Apr 16, 2020
- DAI NIPPON PRINTING CO., LTD.
- Nobuhito TOYAMA
- G02 - OPTICS
Information Patent Application
DIFFRACTIVE OPTICAL ELEMENT
- Publication number 20200073030
- Publication date Mar 5, 2020
- DAI NIPPON PRINTING CO., LTD.
- Nobuhito TOYAMA
- G02 - OPTICS
Information Patent Application
DIFFRACTIVE OPTICAL ELEMENT AND LIGHT IRRADIATION APPARATUS
- Publication number 20190346108
- Publication date Nov 14, 2019
- DAI NIPPON PRINTING CO., LTD.
- Yuichi MIYAZAKI
- G02 - OPTICS
Information Patent Application
DIFFRACTIVE OPTICAL ELEMENT AND LIGHT IRRADIATION DEVICE
- Publication number 20190285781
- Publication date Sep 19, 2019
- DAI NIPPON PRINTING CO., LTD.
- Yuichi MIYAZAKI
- G02 - OPTICS
Information Patent Application
DIFFRACTIVE OPTICAL ELEMENT AND LIGHT IRRADIATION APPARATUS
- Publication number 20190178468
- Publication date Jun 13, 2019
- DAI NIPPON PRINTING CO., LTD.
- Yuichi MIYAZAKI
- F21 - LIGHTING
Information Patent Application
PHOTOMASK
- Publication number 20090311612
- Publication date Dec 17, 2009
- Yasuhisa Kitahata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRADATED PHOTOMASK AND ITS FABRICATION PROCESS
- Publication number 20090220867
- Publication date Sep 3, 2009
- DAI NIPPON PRINTING CO., LTD.
- Junji Fujikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFRACTIVE OPTICAL DEVICE, AND ALIGNER COMPRISING THAT DEVICE
- Publication number 20090168040
- Publication date Jul 2, 2009
- DAI NIPPON PRINTING CO., LTD.
- Nobuhito Toyama
- G02 - OPTICS
Information Patent Application
Designing method and device for phase shift mask
- Publication number 20060141365
- Publication date Jun 29, 2006
- Nobuhito Toyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Designing method and device for phase shift mask
- Publication number 20050262468
- Publication date Nov 24, 2005
- DAI NIPPON PRINTING CO. , LTD.
- Kei Mesuda
- E21 - EARTH DRILLING MINING
Information Patent Application
Antireflection structure
- Publication number 20050074579
- Publication date Apr 7, 2005
- Dai Nippon Printing Co., Ltd.
- Toshiyuki Suzuki
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Phase mask for forming diffraction grating, method of fabricating p...
- Publication number 20040131949
- Publication date Jul 8, 2004
- Dai Nippon Printing Co., Ltd.
- Masaaki Kurihara
- G02 - OPTICS
Information Patent Application
Designing method and device for phase shift mask
- Publication number 20040101766
- Publication date May 27, 2004
- DAI NIPPON PRINTING CO. , LTD.
- Kei Mesuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming minute focusing lens
- Publication number 20030059725
- Publication date Mar 27, 2003
- Yoichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of evaluating the exposure property of data to wafer
- Publication number 20020194576
- Publication date Dec 19, 2002
- Nobuhito Toyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for correcting design pattern of semiconductor circuit, a ph...
- Publication number 20020110742
- Publication date Aug 15, 2002
- Nobuhito Toyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design circuit pattern for test of semiconductor circuit
- Publication number 20020075028
- Publication date Jun 20, 2002
- Nobuhito Toyama
- G01 - MEASURING TESTING
Information Patent Application
Process for making photomask pattern data and photomask
- Publication number 20020028523
- Publication date Mar 7, 2002
- Nobuhito Toyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Nobuhito Toyama

Person

Patents Grantslast 30 patents

Diffractive optical element

Diffractive optical element

Diffractive optical element and light irradiation device

Diffractive optical element and light irradiation apparatus

Diffractive optical element and light irradiation apparatus

Diffractive optical device, and aligner comprising that device

Gradated photomask and its fabrication process

Photomask

Designing method and device for phase shift mask

Antireflection structure

Designing method and device for phase shift mask

Method of evaluating the exposure property of data to wafer

Designing method and device for phase shift mask

METHOD FOR CORRECTING DESIGN PATTERN OF SEMICONDUCTOR CIRCUIT, A PH...

Design circuit pattern for test of semiconductor circuit

Method of forming minute focusing lens

Process for making photomask pattern data and photomask

Method for forming pattern data and method for writing a photomask...

Patents Applicationslast 30 patents

DIFFRACTIVE OPTICAL ELEMENT

DIFFRACTIVE OPTICAL ELEMENT

DIFFRACTIVE OPTICAL ELEMENT AND LIGHT IRRADIATION APPARATUS

DIFFRACTIVE OPTICAL ELEMENT AND LIGHT IRRADIATION DEVICE

DIFFRACTIVE OPTICAL ELEMENT AND LIGHT IRRADIATION APPARATUS

PHOTOMASK

GRADATED PHOTOMASK AND ITS FABRICATION PROCESS

DIFFRACTIVE OPTICAL DEVICE, AND ALIGNER COMPRISING THAT DEVICE

Designing method and device for phase shift mask

Designing method and device for phase shift mask

Antireflection structure

Phase mask for forming diffraction grating, method of fabricating p...

Designing method and device for phase shift mask

Method of forming minute focusing lens

Method of evaluating the exposure property of data to wafer

Method for correcting design pattern of semiconductor circuit, a ph...

Design circuit pattern for test of semiconductor circuit

Process for making photomask pattern data and photomask