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Nobuji Matsumura
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Tokyo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Radiation-sensitive resin composition
Patent number
8,921,027
Issue date
Dec 30, 2014
JSR Corporation
Ryuichi Serizawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Method for forming pattern
Patent number
8,808,974
Issue date
Aug 19, 2014
JSR Corporation
Yukio Nishimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive composition
Patent number
8,771,923
Issue date
Jul 8, 2014
JSR Corporation
Nobuji Matsumura
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Compound, polymer, and radiation-sensitive composition
Patent number
8,697,331
Issue date
Apr 15, 2014
JSR Corporation
Hirokazu Sakakibara
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Compound, fluorine-containing polymer, radiation-sensitive resin co...
Patent number
8,530,692
Issue date
Sep 10, 2013
JSR Corporation
Nobuji Matsumura
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation-sensitive resin composition, polymer, and compound
Patent number
8,507,575
Issue date
Aug 13, 2013
JSR Corporation
Nobuji Matsumura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Pattern forming method
Patent number
8,450,045
Issue date
May 28, 2013
JSR Corporation
Hikaru Sugita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive composition and process for producing low-molec...
Patent number
8,361,691
Issue date
Jan 29, 2013
JSR Corporation
Nobuji Matsumura
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Compound, polymer, and resin composition
Patent number
8,273,837
Issue date
Sep 25, 2012
JSR Corporation
Tomoki Nagai
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Method of forming pattern and composition for forming of organic th...
Patent number
8,173,348
Issue date
May 8, 2012
JSR Corporation
Daisuke Shimizu
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Method of forming pattern, composition for forming upper-layer film...
Patent number
8,119,324
Issue date
Feb 21, 2012
JSR Corporation
Hikaru Sugita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
METHOD FOR FORMING PATTERN
Publication number
20130164695
Publication date
Jun 27, 2013
JSR Corporation
Yukio NISHIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE COMPOSITION
Publication number
20130108962
Publication date
May 2, 2013
JSR Corporation
Nobuji Matsumura
C07 - ORGANIC CHEMISTRY
Information
Patent Application
PATTERN FORMING METHOD
Publication number
20120122036
Publication date
May 17, 2012
JSR Corporation
Hikaru Sugita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOUND, FLUORINE-CONTAINING POLYMER, RADIATION-SENSITIVE RESIN CO...
Publication number
20120100480
Publication date
Apr 26, 2012
JSR Corporation
Nobuji MATSUMURA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
Publication number
20120082936
Publication date
Apr 5, 2012
JSR Corporation
Ryuichi Serizawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND
Publication number
20120065291
Publication date
Mar 15, 2012
JSR Corporation
Nobuji Matsumura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRA...
Publication number
20110151378
Publication date
Jun 23, 2011
JSR Corporation
Nobuji MATSUMURA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION
Publication number
20110104611
Publication date
May 5, 2011
JSR Corporation
Hirokazu Sakakibara
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC TH...
Publication number
20100233635
Publication date
Sep 16, 2010
JSR Corporation
Daisuke Shimizu
C07 - ORGANIC CHEMISTRY
Information
Patent Application
POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RES...
Publication number
20100068650
Publication date
Mar 18, 2010
Yukio Nishimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION
Publication number
20090318652
Publication date
Dec 24, 2009
JSR Corporation
Tomoki Nagai
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM...
Publication number
20090311622
Publication date
Dec 17, 2009
JSR Corporation
Hikaru Sugita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLEC...
Publication number
20090280433
Publication date
Nov 12, 2009
JSR Corporation
Nobuji Matsumura
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Phenolic hydroxyl group-containing copolymer and radiation-sensitiv...
Publication number
20060188812
Publication date
Aug 24, 2006
Tomoki Nagai
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...