-
Method for producing copolymer
-
Patent number 10,626,205
-
Issue date Apr 21, 2020
-
ZEON CORPORATION
-
Kakuei Ozawa
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
Resist composition
-
Patent number 6,309,795
-
Issue date Oct 30, 2001
-
Nippon Zeon Co., Ltd.
-
Nobunori Abe
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
Resist composition
-
Patent number 6,010,826
-
Issue date Jan 4, 2000
-
Nippon Zeon Co., Ltd.
-
Nobunori Abe
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
Resist composition
-
Patent number 5,773,190
-
Issue date Jun 30, 1998
-
Nippon Zeon Co., Ltd.
-
Masayuki Oie
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
Resist composition
-
Patent number 5,688,628
-
Issue date Nov 18, 1997
-
Nippon Zeon Co., Ltd.
-
Masayuki Oie
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY