Nobuo Bessho

Person

Chuo-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition having permitivity being radiation-sensitively changeab...
- Patent number 7,205,085
- Issue date Apr 17, 2007
- JSR Corporation
- Isao Nishimura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Composition and method for temporarily fixing solid
- Patent number 7,186,448
- Issue date Mar 6, 2007
- JSR Corporation
- Yasuaki Yokoyama
- B24 - GRINDING POLISHING
Information Patent Grant
Radiation-sensitive composition changing in refractive index and ut...
- Patent number 7,125,647
- Issue date Oct 24, 2006
- JSR Corporation
- Isao Nishimura
- G02 - OPTICS
Information Patent Grant
Radiation-sensitive composition changing in refractive index and me...
- Patent number 7,108,954
- Issue date Sep 19, 2006
- JSR Corporation
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition capable of having refractive index...
- Patent number 7,071,255
- Issue date Jul 4, 2006
- JSR Corporation
- Isao Nishimura
- G02 - OPTICS
Information Patent Grant
Process of forming a pattern on a substrate
- Patent number 6,890,663
- Issue date May 10, 2005
- JSR Corporation
- Hideaki Masuko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Composition having refractive index sensitively changeable by radia...
- Patent number 6,828,078
- Issue date Dec 7, 2004
- JSR Corporation
- Isao Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive refractive index changing composition and refra...
- Patent number 6,787,289
- Issue date Sep 7, 2004
- JSR Corporation
- Kenji Yamada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process of forming a pattern on a substrate
- Patent number 6,572,963
- Issue date Jun 3, 2003
- JSR Corporation
- Hideaki Masuko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Process of forming a pattern on a substrate
- Patent number 6,337,028
- Issue date Jan 8, 2002
- JSR Corporation
- Hideaki Masuko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electrode formation process
- Patent number 6,299,785
- Issue date Oct 9, 2001
- JSR Corporation
- Tsutomu Shimokawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Pigment-dispersed color-filter composition comprising an alkali-sol...
- Patent number RE37033
- Issue date Jan 30, 2001
- JSR Corporation
- Yusuke Tajima
- 430 - Radiation imagery chemistry: process, composition, or product thereof
Information Patent Grant
Radiation sensitive composition for color filters
- Patent number 5,866,298
- Issue date Feb 2, 1999
- Japan Synthetic Rubber Co., Ltd.
- Satoshi Iwamoto
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Pigment-dispersed radiation-sensitive composition for color filters
- Patent number 5,847,015
- Issue date Dec 8, 1998
- JSR Corporation
- Yusuke Tajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition containing a fluorescent substance...
- Patent number 5,792,589
- Issue date Aug 11, 1998
- Japan Synthetic Rubber Co., Ltd.
- Tadahiko Udagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid crystal aligning agent and liquid crystal display device
- Patent number 5,756,649
- Issue date May 26, 1998
- Japan Synthetic Rubber Co., Ltd.
- Shigeaki Mizushima
- G02 - OPTICS
Information Patent Grant
Liquid crystal aligning agent and liquid crystal display device
- Patent number 5,612,450
- Issue date Mar 18, 1997
- Japan Synthetic Rubber Co., Ltd.
- Shigeaki Mizushima
- G02 - OPTICS
Information Patent Grant
Epoxy group-containing copolymer and radiation sensitive resin comp...
- Patent number 5,530,036
- Issue date Jun 25, 1996
- Japan Synthetic Rubber Co., Ltd.
- Kimiyasu Sano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for domain-dividing liquid crystal alignment film and liquid...
- Patent number 5,478,682
- Issue date Dec 26, 1995
- Japan Synthetic Rubber Co., Ltd.
- Michinori Nishikawa
- G02 - OPTICS
Information Patent Grant
Radiation sensitive quinone diazide and resin composition for micro...
- Patent number 5,432,039
- Issue date Jul 11, 1995
- Japan Synthetic Rubber Co., Ltd.
- Tsutomu Shimokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Epoxy group-containing resin compositions
- Patent number 5,399,604
- Issue date Mar 21, 1995
- Japan Synthetic Rubber Co., Ltd.
- Kimiyasu Sano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pigment-dispersed color-filter composition comprising an alkali-sol...
- Patent number 5,368,976
- Issue date Nov 29, 1994
- Japan Synthetic Rubber Co., Ltd.
- Yusuke Tajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a liquid mobility
- Patent number 4,729,659
- Issue date Mar 8, 1988
- Japan Synthetic Rubber Co., Ltd.
- Nobuo Bessho
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Photocuring resin composition, medical device using same and method...
- Publication number 20070082965
- Publication date Apr 12, 2007
- JSR Corporation
- Kyouyu Yasuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition and method for temporarily fixing solids
- Publication number 20060275939
- Publication date Dec 7, 2006
- JSR Corporation
- Yasuaki Yokoyama
- B24 - GRINDING POLISHING
Information Patent Application
Composition and method for temporarily fixing solid
- Publication number 20040185187
- Publication date Sep 23, 2004
- Yasuaki Yokoyama
- B24 - GRINDING POLISHING
Information Patent Application
Radiation-sensitive composition changing in refractive index and me...
- Publication number 20040013972
- Publication date Jan 22, 2004
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition having permitivity being radiation-sensitively changeab...
- Publication number 20040005506
- Publication date Jan 8, 2004
- Isao Nishimura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Radiation-sensitive composition changing in refractive index and ut...
- Publication number 20030171468
- Publication date Sep 11, 2003
- Isao Nishimura
- G02 - OPTICS
Information Patent Application
Radiation sensitive refractive index changing composition and refra...
- Publication number 20030139486
- Publication date Jul 24, 2003
- JSR Corporation
- Kenji Yamada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition having refractive index sensitively changeable by radia...
- Publication number 20030064303
- Publication date Apr 3, 2003
- Isao Nishimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Process of forming a pattern on a substrate
- Publication number 20030049412
- Publication date Mar 13, 2003
- JSR Corporation
- Hideaki Masuko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process of forming a pattern on a substrate
- Publication number 20020034611
- Publication date Mar 21, 2002
- JSR CORPORATION, A JAPANESE CORPORATION
- Hideaki Masuko
- H01 - BASIC ELECTRIC ELEMENTS

Nobuo Bessho

Person

Patents Grantslast 30 patents

Composition having permitivity being radiation-sensitively changeab...

Composition and method for temporarily fixing solid

Radiation-sensitive composition changing in refractive index and ut...

Radiation-sensitive composition changing in refractive index and me...

Radiation-sensitive composition capable of having refractive index...

Process of forming a pattern on a substrate

Composition having refractive index sensitively changeable by radia...

Radiation sensitive refractive index changing composition and refra...

Process of forming a pattern on a substrate

Process of forming a pattern on a substrate

Electrode formation process

Pigment-dispersed color-filter composition comprising an alkali-sol...

Radiation sensitive composition for color filters

Pigment-dispersed radiation-sensitive composition for color filters

Radiation sensitive composition containing a fluorescent substance...

Liquid crystal aligning agent and liquid crystal display device

Liquid crystal aligning agent and liquid crystal display device

Epoxy group-containing copolymer and radiation sensitive resin comp...

Method for domain-dividing liquid crystal alignment film and liquid...

Radiation sensitive quinone diazide and resin composition for micro...

Epoxy group-containing resin compositions

Pigment-dispersed color-filter composition comprising an alkali-sol...

Method and apparatus for measuring a liquid mobility

Patents Applicationslast 30 patents

Photocuring resin composition, medical device using same and method...

Composition and method for temporarily fixing solids

Composition and method for temporarily fixing solid

Radiation-sensitive composition changing in refractive index and me...

Composition having permitivity being radiation-sensitively changeab...

Radiation-sensitive composition changing in refractive index and ut...

Radiation sensitive refractive index changing composition and refra...

Composition having refractive index sensitively changeable by radia...

Process of forming a pattern on a substrate

Process of forming a pattern on a substrate