Nobuo Ishii

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radial antenna and plasma processing apparatus comprising the same
- Patent number 7,807,019
- Issue date Oct 5, 2010
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source and plasma processing apparatus
- Patent number 7,632,379
- Issue date Dec 15, 2009
- TOKYO ELECTRON LIMITED
- Toshio Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma processing by shaping an induced electric field
- Patent number RE40963
- Issue date Nov 10, 2009
- Tokyo Electron Limited
- Nobuo Ishii
- 427 - Coating processes
Information Patent Grant
Plasma device
- Patent number 7,481,904
- Issue date Jan 27, 2009
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for measuring temperature of substrate
- Patent number 7,416,330
- Issue date Aug 26, 2008
- Tokyo Electron Limited
- Masafumi Ito
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus
- Patent number 7,395,779
- Issue date Jul 8, 2008
- Tokyo Electron Limited
- Nobuo Ishii
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment apparatus and plasma generation method
- Patent number 7,305,934
- Issue date Dec 11, 2007
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma apparatus and production method thereof
- Patent number 7,302,910
- Issue date Dec 4, 2007
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radial antenna and plasma device using it
- Patent number 7,296,533
- Issue date Nov 20, 2007
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma device and plasma generating method
- Patent number 7,243,610
- Issue date Jul 17, 2007
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processor and plasma processing method
- Patent number 7,186,314
- Issue date Mar 6, 2007
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,071,442
- Issue date Jul 4, 2006
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slot array antenna and plasma processing apparatus
- Patent number 7,023,393
- Issue date Apr 4, 2006
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma device and plasma generating method
- Patent number 6,967,622
- Issue date Nov 22, 2005
- Tokyo Electron Limited
- Nobuo Ishii
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 6,953,908
- Issue date Oct 11, 2005
- Tokyo Electron Limited
- Nobuo Ishii
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for plasma processing
- Patent number 6,910,440
- Issue date Jun 28, 2005
- Tokyo Electron Ltd.
- Nobuo Ishii
Information Patent Grant
Plasma device and plasma generating method
- Patent number 6,911,617
- Issue date Jun 28, 2005
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,847,003
- Issue date Jan 25, 2005
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system
- Patent number 6,823,816
- Issue date Nov 30, 2004
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing system
- Patent number 6,796,268
- Issue date Sep 28, 2004
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,713,968
- Issue date Mar 30, 2004
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,695,948
- Issue date Feb 24, 2004
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus with annular waveguide
- Patent number 6,670,741
- Issue date Dec 30, 2003
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device
- Patent number 6,657,151
- Issue date Dec 2, 2003
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-assisted processing system and plasma-assisted processing me...
- Patent number 6,646,224
- Issue date Nov 11, 2003
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,622,650
- Issue date Sep 23, 2003
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,527,909
- Issue date Mar 4, 2003
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,528,752
- Issue date Mar 4, 2003
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma deposition apparatus and method with controller
- Patent number 6,501,082
- Issue date Dec 31, 2002
- Tokyo Electron Limited
- Toshio Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring negative ion density of plasma and plasma proce...
- Patent number 6,452,400
- Issue date Sep 17, 2002
- Tokyo Electron Limited
- Yoshinobu Kawai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR MEASURING THICKNESS OF A SUBSTRATE
- Publication number 20090051924
- Publication date Feb 26, 2009
- MASAFUMI ITO
- Masafumi Ito
- G01 - MEASURING TESTING
Information Patent Application
Matching device and plasma processing apparatus
- Publication number 20070119376
- Publication date May 31, 2007
- Tokyo Electron Limited and Nihon Koshuha Co., Ltd.
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20070113978
- Publication date May 24, 2007
- TOKYO ELECTRON LIMITED
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface treating method and surface-treating apparatus
- Publication number 20070034601
- Publication date Feb 15, 2007
- TOKYO ELECTRON LIMITED
- Toshio Goto
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma source and plasma processing apparatus
- Publication number 20070017636
- Publication date Jan 25, 2007
- Toshio Goto
- Toshio Goto
- B82 - NANO-TECHNOLOGY
Information Patent Application
Slot array antenna and plasma processing apparatus
- Publication number 20060158381
- Publication date Jul 20, 2006
- TOKYO ELECTRON LIMITED
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processor and plasma processing method
- Publication number 20060124244
- Publication date Jun 15, 2006
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and controlling method therefor
- Publication number 20060042546
- Publication date Mar 2, 2006
- TOKYO ELECTRON LIMITED
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing device and plasma generating method
- Publication number 20060005929
- Publication date Jan 12, 2006
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for measuring temperature of substrate
- Publication number 20050271116
- Publication date Dec 8, 2005
- MASAFUMI ITO
- Masafumi Ito
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for measuring temperature of substrate
- Publication number 20050259716
- Publication date Nov 24, 2005
- MASAFUMI ITO
- Masafumi Ito
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing apparatus
- Publication number 20050211382
- Publication date Sep 29, 2005
- Tokyo Electron Ltd.
- Nobuo Ishii
Information Patent Application
Plasma processing apparatus
- Publication number 20050173382
- Publication date Aug 11, 2005
- TOKYO ELECTRON LIMITED
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma device
- Publication number 20050162335
- Publication date Jul 28, 2005
- TOKYO ELECTRON LIMITED
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma device
- Publication number 20050103443
- Publication date May 19, 2005
- TOKYO ELECTRON LIMITED
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system
- Publication number 20050087304
- Publication date Apr 28, 2005
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processor
- Publication number 20050087296
- Publication date Apr 28, 2005
- TOKYO ELECTRON LIMITED
- Toshio Goto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma treatment apparatus and plasma generation method
- Publication number 20050082003
- Publication date Apr 21, 2005
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing device and plasma processing method
- Publication number 20050000445
- Publication date Jan 6, 2005
- TOKYO ELECTRON LIMITED
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Matching device and plasma processing apparatus
- Publication number 20040261717
- Publication date Dec 30, 2004
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electromagnetic field supply apparatus and plasma processing device
- Publication number 20040244693
- Publication date Dec 9, 2004
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Slot aray antenna and plasma processing apparatus
- Publication number 20040155829
- Publication date Aug 12, 2004
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040149741
- Publication date Aug 5, 2004
- TOKYO ELECTRON LIMITED
- Nobuo Ishii
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma apparatus and production method thereof
- Publication number 20040112292
- Publication date Jun 17, 2004
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processor and plasma processing method
- Publication number 20040112541
- Publication date Jun 17, 2004
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma device and plasma generating method
- Publication number 20040095074
- Publication date May 20, 2004
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system
- Publication number 20040069229
- Publication date Apr 15, 2004
- TOKYO ELECTRON LIMITED
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma device and plasma generating method
- Publication number 20040051464
- Publication date Mar 18, 2004
- Nobuo Ishii
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Radial antenna and plasma device using it
- Publication number 20040045674
- Publication date Mar 11, 2004
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radial antenna and plasma processing apparatus comprising the same
- Publication number 20040027302
- Publication date Feb 12, 2004
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS

Nobuo Ishii

Person

Patents Grantslast 30 patents

Radial antenna and plasma processing apparatus comprising the same

Plasma source and plasma processing apparatus

Method for plasma processing by shaping an induced electric field

Plasma device

Method and apparatus for measuring temperature of substrate

Plasma processing apparatus

Plasma treatment apparatus and plasma generation method

Plasma apparatus and production method thereof

Radial antenna and plasma device using it

Plasma device and plasma generating method

Plasma processor and plasma processing method

Plasma processing apparatus

Slot array antenna and plasma processing apparatus

Plasma device and plasma generating method

Plasma processing apparatus

Apparatus for plasma processing

Plasma device and plasma generating method

Plasma processing apparatus

Plasma processing system

Microwave plasma processing system

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus with annular waveguide

Plasma processing device

Plasma-assisted processing system and plasma-assisted processing me...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma deposition apparatus and method with controller

Method of measuring negative ion density of plasma and plasma proce...

Patents Applicationslast 30 patents

APPARATUS FOR MEASURING THICKNESS OF A SUBSTRATE

Matching device and plasma processing apparatus

Plasma processing apparatus and method

Surface treating method and surface-treating apparatus

Plasma source and plasma processing apparatus

Slot array antenna and plasma processing apparatus

Plasma processor and plasma processing method

Plasma processing apparatus and controlling method therefor

Plasma processing device and plasma generating method

Method and apparatus for measuring temperature of substrate

Method and apparatus for measuring temperature of substrate

Plasma processing apparatus

Plasma processing apparatus

Plasma device

Plasma device

Plasma processing system

Processor

Plasma treatment apparatus and plasma generation method

Plasma processing device and plasma processing method

Matching device and plasma processing apparatus

Electromagnetic field supply apparatus and plasma processing device

Slot aray antenna and plasma processing apparatus

Plasma processing apparatus

Plasma apparatus and production method thereof

Plasma processor and plasma processing method

Plasma device and plasma generating method

Plasma processing system

Plasma device and plasma generating method

Radial antenna and plasma device using it

Radial antenna and plasma processing apparatus comprising the same