Nobuo Kawahashi

Person

Yokkaichi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Patent number 7,550,020
- Issue date Jun 23, 2009
- JSR Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning composition, method for cleaning semiconductor substrate,...
- Patent number 7,498,294
- Issue date Mar 3, 2009
- JSR Corporation
- Tomohisa Konno
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Chemical mechanical polishing pad
- Patent number 7,442,116
- Issue date Oct 28, 2008
- JSR Corporation
- Hiroyuki Miyauchi
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Patent number 7,378,349
- Issue date May 27, 2008
- JSR Corporation
- Tomohisa Konno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing pad for semiconductor wafer, polishing multilayered body...
- Patent number 7,323,415
- Issue date Jan 29, 2008
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Patent number 7,252,782
- Issue date Aug 7, 2007
- JSR Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing pad and chemical mechanical polishing...
- Patent number 7,183,213
- Issue date Feb 27, 2007
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Grant
Process for chemical mechanical polishing of semiconductor substrat...
- Patent number 7,183,211
- Issue date Feb 27, 2007
- JSR Corporation
- Tomohisa Konno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical/mechanical polishing method for STI
- Patent number 7,163,448
- Issue date Jan 16, 2007
- JSR Corporation
- Masayuki Hattori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of chemical mechanical polishing
- Patent number 7,153,369
- Issue date Dec 26, 2006
- JSR Corporation
- Masayuki Motonari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqueous dispersion for chemical/mechanical polishing
- Patent number 7,090,786
- Issue date Aug 15, 2006
- JSR Corporation
- Masayuki Hattori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aqueous dispersion for chemical mechanical polishing
- Patent number 7,087,530
- Issue date Aug 8, 2006
- JSR Corporation
- Masayuki Motonari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for polishing pad and polishing pad using the same
- Patent number 7,077,879
- Issue date Jul 18, 2006
- JSR Corporation
- Toshihiro Ogawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aqueous dispersion for chemical mechanical polishing, chemical mech...
- Patent number 7,005,382
- Issue date Feb 28, 2006
- JSR Corporation
- Kazuo Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing pad
- Patent number 6,992,123
- Issue date Jan 31, 2006
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad
- Patent number 6,976,910
- Issue date Dec 20, 2005
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Patent number 6,935,928
- Issue date Aug 30, 2005
- JSR Corporation
- Kazuhito Uchikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry for chemical mechanical polishing and method of manufacturin...
- Patent number 6,924,227
- Issue date Aug 2, 2005
- Kabushiki Kaisha Toshiba
- Gaku Minamihaba
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Window member for chemical mechanical polishing and polishing pad
- Patent number 6,832,949
- Issue date Dec 21, 2004
- JSR Corporation
- Tomohisa Konno
- B24 - GRINDING POLISHING
Information Patent Grant
Composition for polishing pad and polishing pad using the same
- Patent number 6,790,883
- Issue date Sep 14, 2004
- JSR Corporation
- Toshihiro Ogawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aqueous dispersion for chemical mechanical polishing
- Patent number 6,786,944
- Issue date Sep 7, 2004
- JSR Corporation
- Masayuki Hattori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for washing a polishing pad and method for washing a po...
- Patent number 6,740,629
- Issue date May 25, 2004
- JSR Corporation
- Michiaki Ando
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Aqueous dispersion for chemical mechanical polishing used for polis...
- Patent number 6,653,267
- Issue date Nov 25, 2003
- Kabushiki Kaisha Toshiba
- Hiroyuki Yano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
METHOD OF PRODUCTION OF COMPOSITED PARTICLE, COMPOSITED PARTICLE PR...
- Patent number 6,582,761
- Issue date Jun 24, 2003
- JSR Corporation
- Kazuo Nishimoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aqueous dispersion for chemical mechanical polishing and chemical m...
- Patent number 6,579,153
- Issue date Jun 17, 2003
- JSR Corporation
- Kazuhito Uchikura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Aqueous dispersion for chemical mechanical polishing
- Patent number 6,559,056
- Issue date May 6, 2003
- JSR Corporation
- Masayuki Hattori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqueous dispersion for chemical mechanical polishing
- Patent number 6,527,818
- Issue date Mar 4, 2003
- JSR Corporation
- Masayuki Hattori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Aqueous dispersion composition for chemical mechanical polishing fo...
- Patent number 6,447,695
- Issue date Sep 10, 2002
- JSR Corporation
- Masayuki Motonari
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aqueous dispersion for chemical mechanical polishing
- Patent number 6,383,240
- Issue date May 7, 2002
- JSR Corporation
- Kazuo Nishimoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Process for producing a polyorganosiloxane-based thermoplastic resin
- Patent number 5,773,532
- Issue date Jun 30, 1998
- Japan Synthetic Rubber Co., Ltd.
- Motoki Okaniwa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING AGENT KIT AND CHEMICAL MECHANICAL POL...
- Publication number 20080274620
- Publication date Nov 6, 2008
- JSR Corporation
- Hirotaka Shida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical polishing aqueous dispersion, chemical mechanic...
- Publication number 20060276041
- Publication date Dec 7, 2006
- JSR Corporation
- Kazuhito Uchikura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical polishing aqueous dispersion, chemical mechanic...
- Publication number 20060201914
- Publication date Sep 14, 2006
- JSR Corporation
- Kazuhito Uchikura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing pad for semiconductor wafer and laminated body for polish...
- Publication number 20060128271
- Publication date Jun 15, 2006
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Publication number 20060010781
- Publication date Jan 19, 2006
- JSR Corporation
- Norihiko Ikeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Cleaning composition for semiconductor components and process for m...
- Publication number 20050284844
- Publication date Dec 29, 2005
- JSR Corporation
- Masayuki Hattori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical mechanical polishing pad, manufacturing process thereof an...
- Publication number 20050245171
- Publication date Nov 3, 2005
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad, manufacturing process thereof an...
- Publication number 20050239380
- Publication date Oct 27, 2005
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Publication number 20050227451
- Publication date Oct 13, 2005
- JSR Corporation
- Tomohisa Konno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical polishing pad, production method thereof, and c...
- Publication number 20050222336
- Publication date Oct 6, 2005
- JSR Corporation
- Takahiro Okamoto
- B24 - GRINDING POLISHING
Information Patent Application
Cleaning composition, method for cleaning semiconductor substrate,...
- Publication number 20050176606
- Publication date Aug 11, 2005
- JSR Corporation
- Tomohisa Konno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Publication number 20050164510
- Publication date Jul 28, 2005
- JSR Corporation
- Norihiko Ikeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical polishing pad
- Publication number 20050113011
- Publication date May 26, 2005
- JSR Corporation
- Hiroyuki Miyauchi
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Publication number 20050037693
- Publication date Feb 17, 2005
- JSR Corporation
- Kazuhito Uchikura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical polishing pad and chemical mechanical polishing...
- Publication number 20050014376
- Publication date Jan 20, 2005
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Application
Aqueous dispersion for chemical/mechanical polishing
- Publication number 20050001199
- Publication date Jan 6, 2005
- JSR Corporation
- Masayuki Hattori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing pad
- Publication number 20050003749
- Publication date Jan 6, 2005
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Application
Method of machining semiconductor wafer-use polishing pad and semic...
- Publication number 20040266326
- Publication date Dec 30, 2004
- Hiroshi Shiho
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Composition for polishing pad and polishing pad using the same
- Publication number 20040244299
- Publication date Dec 9, 2004
- JSR Corporation
- Toshihiro Ogawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemical mechanical polishing agent kit and chemical mechanical pol...
- Publication number 20040237413
- Publication date Dec 2, 2004
- JSR Corporation
- Hirotaka Shida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical/mechanical polishing method for STI
- Publication number 20040235396
- Publication date Nov 25, 2004
- JSR Corporation
- Masayuki Hattori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polishing pad and method of polishing a semiconductor wafer
- Publication number 20040224611
- Publication date Nov 11, 2004
- JSR Corporation
- Hiromi Aoi
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad and chemical mechanical polishing method
- Publication number 20040224616
- Publication date Nov 11, 2004
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Application
Abrasive pad, method and metal mold for manufacturing the same, and...
- Publication number 20040203320
- Publication date Oct 14, 2004
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Application
Aqueous dispersion for chemical mechanical polishing and production...
- Publication number 20040162011
- Publication date Aug 19, 2004
- JSR Corporation
- Tomohisa Konno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Aqueous dispersion for chemical mechanical polishing
- Publication number 20040144755
- Publication date Jul 29, 2004
- JSR Corporation (50%)
- Masayuki Motonari
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Aqueous dispersion for chemical mechanical polishing, chemical mech...
- Publication number 20040132305
- Publication date Jul 8, 2004
- JSR Corporation
- Kazuo Nishimoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing pad
- Publication number 20040118051
- Publication date Jun 24, 2004
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Application
Composition for polishing pad and polishing pad therewith
- Publication number 20040063391
- Publication date Apr 1, 2004
- JSR Corporation
- Yukio Hosaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polishing pad and multi-layer polishing pad
- Publication number 20040014413
- Publication date Jan 22, 2004
- JSR Corporation
- Nobuo Kawahashi
- B24 - GRINDING POLISHING

Nobuo Kawahashi

Person

Patents Grantslast 30 patents

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Cleaning composition, method for cleaning semiconductor substrate,...

Chemical mechanical polishing pad

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Polishing pad for semiconductor wafer, polishing multilayered body...

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Chemical mechanical polishing pad and chemical mechanical polishing...

Process for chemical mechanical polishing of semiconductor substrat...

Chemical/mechanical polishing method for STI

Method of chemical mechanical polishing

Aqueous dispersion for chemical/mechanical polishing

Aqueous dispersion for chemical mechanical polishing

Composition for polishing pad and polishing pad using the same

Aqueous dispersion for chemical mechanical polishing, chemical mech...

Polishing pad

Polishing pad

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Slurry for chemical mechanical polishing and method of manufacturin...

Window member for chemical mechanical polishing and polishing pad

Composition for polishing pad and polishing pad using the same

Aqueous dispersion for chemical mechanical polishing

Composition for washing a polishing pad and method for washing a po...

Aqueous dispersion for chemical mechanical polishing used for polis...

METHOD OF PRODUCTION OF COMPOSITED PARTICLE, COMPOSITED PARTICLE PR...

Aqueous dispersion for chemical mechanical polishing and chemical m...

Aqueous dispersion for chemical mechanical polishing

Aqueous dispersion for chemical mechanical polishing

Aqueous dispersion composition for chemical mechanical polishing fo...

Aqueous dispersion for chemical mechanical polishing

Process for producing a polyorganosiloxane-based thermoplastic resin

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING AGENT KIT AND CHEMICAL MECHANICAL POL...

Chemical mechanical polishing aqueous dispersion, chemical mechanic...

Chemical mechanical polishing aqueous dispersion, chemical mechanic...

Polishing pad for semiconductor wafer and laminated body for polish...

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Cleaning composition for semiconductor components and process for m...

Chemical mechanical polishing pad, manufacturing process thereof an...

Chemical mechanical polishing pad, manufacturing process thereof an...

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Chemical mechanical polishing pad, production method thereof, and c...

Cleaning composition, method for cleaning semiconductor substrate,...

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Chemical mechanical polishing pad

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Chemical mechanical polishing pad and chemical mechanical polishing...

Aqueous dispersion for chemical/mechanical polishing

Polishing pad

Method of machining semiconductor wafer-use polishing pad and semic...

Composition for polishing pad and polishing pad using the same

Chemical mechanical polishing agent kit and chemical mechanical pol...

Chemical/mechanical polishing method for STI

Polishing pad and method of polishing a semiconductor wafer

Polishing pad and chemical mechanical polishing method

Abrasive pad, method and metal mold for manufacturing the same, and...

Aqueous dispersion for chemical mechanical polishing and production...

Aqueous dispersion for chemical mechanical polishing

Aqueous dispersion for chemical mechanical polishing, chemical mech...

Polishing pad

Composition for polishing pad and polishing pad therewith

Polishing pad and multi-layer polishing pad