Nobuo Tokutake

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
High-sensitivity positive-working photoresist composition
- Patent number 5,601,961
- Issue date Feb 11, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuhiko Nakayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method with selective silylation utilizing lithogra...
- Patent number 5,599,653
- Issue date Feb 4, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working naphtho quinone diazide sulfonic acid ester photor...
- Patent number 5,576,138
- Issue date Nov 19, 1996
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshito Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working quinonediazide photoresist composition containing...
- Patent number 5,501,936
- Issue date Mar 26, 1996
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroshi Hosoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic double-coated patterning plate with undercoat levellin...
- Patent number 5,498,514
- Issue date Mar 12, 1996
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working naphthoquinone diazide sulfonic acid ester photore...
- Patent number 5,478,692
- Issue date Dec 26, 1995
- Tokyo Ohka Kogyo Co., Ltd.
- Kousuke Doi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working naphthoquinone diazide photoresist composition con...
- Patent number 5,434,031
- Issue date Jul 18, 1995
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photosensitive resin composition containing 1,2-na...
- Patent number 5,401,605
- Issue date Mar 28, 1995
- Tokyo Ohka Kogyo Co., Ltd.
- Kousuke Doi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alkali-developable positive-working photosensitive resin composition
- Patent number 5,384,228
- Issue date Jan 24, 1995
- Tokyo Ohka Kogyo Co., Ltd.
- Kousuke Doi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working quinone diazide composition containing N,N',N"-sub...
- Patent number 5,332,647
- Issue date Jul 26, 1994
- Tokyo Ohka Kogyo Co., Ltd.
- Hayato Ohno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photosensitive composition with three difference 1...
- Patent number 4,985,333
- Issue date Jan 15, 1991
- Tokyo Ohka Kogyo Co., Ltd.
- Nobuo Tokutake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photosensitive quinone diazide composition with al...
- Patent number 4,882,260
- Issue date Nov 21, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Hidekatsu Kohara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Nobuo Tokutake

Person

Patents Grantslast 30 patents

High-sensitivity positive-working photoresist composition

Pattern forming method with selective silylation utilizing lithogra...

Positive-working naphtho quinone diazide sulfonic acid ester photor...

Positive-working quinonediazide photoresist composition containing...

Lithographic double-coated patterning plate with undercoat levellin...

Positive-working naphthoquinone diazide sulfonic acid ester photore...

Positive-working naphthoquinone diazide photoresist composition con...

Positive working photosensitive resin composition containing 1,2-na...

Alkali-developable positive-working photosensitive resin composition

Positive-working quinone diazide composition containing N,N',N"-sub...

Positive-working photosensitive composition with three difference 1...

Positive-working photosensitive quinone diazide composition with al...