Nobuyuki Negishi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma etching method
- Patent number 10,418,224
- Issue date Sep 17, 2019
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 9,960,014
- Issue date May 1, 2018
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 9,099,349
- Issue date Aug 4, 2015
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma sterilization apparatus
- Patent number 8,747,763
- Issue date Jun 10, 2014
- Hitachi, Ltd.
- Takumi Tandou
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Dry etching method of insulating film
- Patent number 7,585,776
- Issue date Sep 8, 2009
- Hitachi High-Technologies Corporation
- Nobuyuki Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method and apparatus
- Patent number 7,371,690
- Issue date May 13, 2008
- Hitachi High-Technologies Corporation
- Nobuyuki Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabrication semiconductor device
- Patent number 7,372,582
- Issue date May 13, 2008
- Hitachi, Ltd.
- Nobuyuki Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and manufacturing sy...
- Patent number 6,842,658
- Issue date Jan 11, 2005
- Hitachi, Ltd.
- Masaru Izawa
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process for fabricating semiconductor device
- Patent number 6,645,870
- Issue date Nov 11, 2003
- Hitachi, Ltd.
- Nobuyuki Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching device and dry etching method
- Patent number 6,573,190
- Issue date Jun 3, 2003
- Hitachi, Ltd.
- Masaru Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method for manufacturing a semiconduct...
- Patent number 6,551,445
- Issue date Apr 22, 2003
- Hitachi, Ltd.
- Ken'etsu Yokogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus and plasma treatment method
- Patent number 6,475,918
- Issue date Nov 5, 2002
- Hitachi, Ltd.
- Masaru Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical probe tester card with coaxial probes
- Patent number 5,525,911
- Issue date Jun 11, 1996
- Tokyo Electron Limited
- Hiroshi Marumo
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20180233329
- Publication date Aug 16, 2018
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20170084430
- Publication date Mar 23, 2017
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20140175534
- Publication date Jun 26, 2014
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA STERILIZER, PLASMA STERILIZATION SYSTEM, AND PLASMA STERILIZ...
- Publication number 20130202479
- Publication date Aug 8, 2013
- Takumi Tandou
- G01 - MEASURING TESTING
Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20130087285
- Publication date Apr 11, 2013
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Sterilization Apparatus
- Publication number 20120263628
- Publication date Oct 18, 2012
- Hitachi, Ltd
- Takumi TANDOU
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
PLASMA PROCESSING APPARATUS USING TRANSMISSION ELECTRODE
- Publication number 20110253313
- Publication date Oct 20, 2011
- Hitachi High-Technologies Corporation
- Keizo SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS USING TRANSMISSION ELECTRODE
- Publication number 20110030899
- Publication date Feb 10, 2011
- Keizo SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD FOR ETCHING AN OBJECT
- Publication number 20100297849
- Publication date Nov 25, 2010
- Masatoshi Miyake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20100025369
- Publication date Feb 4, 2010
- Hitachi High-Technologies Corporation
- Nobuyuki NEGISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCHING METHOD AND APPARATUS
- Publication number 20090181545
- Publication date Jul 16, 2009
- Nobuyuki Negishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY ETCHING METHOD OF INSULATING FILM
- Publication number 20080085605
- Publication date Apr 10, 2008
- Nobuyuki Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching treatment
- Publication number 20070181528
- Publication date Aug 9, 2007
- Kunihiko Koroyasu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabrication semiconductor device
- Publication number 20060141795
- Publication date Jun 29, 2006
- Hitachi, Ltd.
- Nobuyuki Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry-etching method and apparatus
- Publication number 20050284571
- Publication date Dec 29, 2005
- Nobuyuki Negishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dry etching method and apparatus
- Publication number 20050048787
- Publication date Mar 3, 2005
- Nobuyuki Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microreactor, its production method, and sample screening device
- Publication number 20040228774
- Publication date Nov 18, 2004
- Hitachi, Ltd.
- Taro Ogawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Dry etching method
- Publication number 20040058554
- Publication date Mar 25, 2004
- Masaru Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for fabricating semiconductor device
- Publication number 20030013313
- Publication date Jan 16, 2003
- Nobuyuki Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor device and manufacturing sy...
- Publication number 20020103563
- Publication date Aug 1, 2002
- Masaru Izawa
- G05 - CONTROLLING REGULATING
Information Patent Application
PLASMA PROCESSING SYSTEM AND METHOD
- Publication number 20020020494
- Publication date Feb 21, 2002
- KEN?apos;ETSU YOKOGAWA
- H01 - BASIC ELECTRIC ELEMENTS

Nobuyuki Negishi

Person

Patents Grantslast 30 patents

Plasma etching method

Plasma etching method

Semiconductor device manufacturing method

Plasma sterilization apparatus

Dry etching method of insulating film

Dry etching method and apparatus

Method for fabrication semiconductor device

Method of manufacturing a semiconductor device and manufacturing sy...

Process for fabricating semiconductor device

Dry etching device and dry etching method

Plasma processing system and method for manufacturing a semiconduct...

Plasma treatment apparatus and plasma treatment method

Vertical probe tester card with coaxial probes

Patents Applicationslast 30 patents

PLASMA ETCHING METHOD

PLASMA ETCHING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

PLASMA STERILIZER, PLASMA STERILIZATION SYSTEM, AND PLASMA STERILIZ...

PLASMA ETCHING APPARATUS

Plasma Sterilization Apparatus

PLASMA PROCESSING APPARATUS USING TRANSMISSION ELECTRODE

PLASMA PROCESSING APPARATUS USING TRANSMISSION ELECTRODE

PLASMA ETCHING METHOD FOR ETCHING AN OBJECT

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

DRY-ETCHING METHOD AND APPARATUS

DRY ETCHING METHOD OF INSULATING FILM

Method of etching treatment

Method for fabrication semiconductor device

Dry-etching method and apparatus

Dry etching method and apparatus

Microreactor, its production method, and sample screening device

Dry etching method

Process for fabricating semiconductor device

Method of manufacturing a semiconductor device and manufacturing sy...

PLASMA PROCESSING SYSTEM AND METHOD