Nobuyuki SAITO

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Hitachi-shi, lbaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, method of manufacturing pattern c...
- Patent number 11,487,201
- Issue date Nov 1, 2022
- HD MICROSYSTEMS, LTD.
- Etsuharu Tsuchiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, cured pattern production method,...
- Patent number 11,226,560
- Issue date Jan 18, 2022
- HD MICROSYSTEMS, LTD.
- Nobuyuki Saito
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
POLYIMIDE PRECURSOR, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOS...
- Publication number 20240092973
- Publication date Mar 21, 2024
- HD MICROSYSTEMS, LTD.
- Naoto NAGAMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive Resin Composition, Method Of Manufacturing Pattern C...
- Publication number 20220276555
- Publication date Sep 1, 2022
- HD MICROSYSTEMS, LTD.
- Shingo Tahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF MANUFACTURING PATTERN C...
- Publication number 20210116809
- Publication date Apr 22, 2021
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Etsuharu TSUCHIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED PATTERN PRODUCTION METHOD,...
- Publication number 20200041900
- Publication date Feb 6, 2020
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Nobuyuki SAITO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...