Nobuyuki Sasaki

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for low resistivity and stress tungsten gap fill
- Patent number 12,094,773
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Xi Cen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for low resistivity and stress tungsten gap fill
- Patent number 11,798,845
- Issue date Oct 24, 2023
- Applied Materials, Inc.
- Xi Cen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon-containing layer for bit line resistance reduction
- Patent number 11,637,107
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing layer for bit line resistance reduction
- Patent number 11,626,410
- Issue date Apr 11, 2023
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for high reflectivity aluminum layers
- Patent number 11,421,318
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Jacqueline Wrench
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for smoothing dynamic random access memory bi...
- Patent number 10,903,112
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for forming low stress etch-resistant mask using implant...
- Patent number 10,811,257
- Issue date Oct 20, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cap layer for bit line resistance reduction
- Patent number 10,700,072
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of cobalt films with high deposition rate
- Patent number 10,559,578
- Issue date Feb 11, 2020
- Applied Materials, Inc.
- Jacqueline S. Wrench
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for forming low stress mask using implantation
- Patent number 10,515,802
- Issue date Dec 24, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS
- Publication number 20250006474
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Naomi YOSHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR PREPARING METAL SILICIDES
- Publication number 20230115130
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Tom Ho Wing YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED STRESS TUNING AND INTERFACIAL ADHESION FOR TUNGSTEN (W) GA...
- Publication number 20230023235
- Publication date Jan 26, 2023
- Xi CEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon-Containing Layer for Bit Line Resistance Reduction
- Publication number 20220406788
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon-Containing Layer for Bit Line Resistance Reduction
- Publication number 20220406790
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR LOW RESISTIVITY AND STRESS TUNGSTEN GAP FILL
- Publication number 20220336274
- Publication date Oct 20, 2022
- Applied Materials, Inc.
- Xi CEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR LOW RESISTIVITY AND STRESS TUNGSTEN GAP FILL
- Publication number 20220130724
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Xi CEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Apparatus for Integrated Cobalt Disilicide Formation
- Publication number 20210327717
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cap Layer For Bit Line Resistance Reduction
- Publication number 20200235104
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR SMOOTHING DYNAMIC RANDOM ACCESS MEMORY BI...
- Publication number 20200126844
- Publication date Apr 23, 2020
- Applied Materials, Inc.
- PRIYADARSHI PANDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cap Layer For Bit Line Resistance Reduction
- Publication number 20200126996
- Publication date Apr 23, 2020
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR HIGH REFLECTIVITY ALUMINUM LAYERS
- Publication number 20190338415
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- JACQUELINE WRENCH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES FOR FORMING LOW STRESS MASK USING IMPLANTATION
- Publication number 20190326116
- Publication date Oct 24, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR FORMING LOW STRESS ETCH-RESISTANT MASK USING IMPLANT...
- Publication number 20190304783
- Publication date Oct 3, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition Of Cobalt Films With High Deposition Rate
- Publication number 20180350826
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Jacqueline S. Wrench
- H01 - BASIC ELECTRIC ELEMENTS

Nobuyuki Sasaki

Person

Patents Grantslast 30 patents

Methods for low resistivity and stress tungsten gap fill

Methods and apparatus for low resistivity and stress tungsten gap fill

Silicon-containing layer for bit line resistance reduction

Silicon-containing layer for bit line resistance reduction

Methods and apparatus for high reflectivity aluminum layers

Methods and apparatus for smoothing dynamic random access memory bi...

Techniques for forming low stress etch-resistant mask using implant...

Cap layer for bit line resistance reduction

Deposition of cobalt films with high deposition rate

Techniques for forming low stress mask using implantation

Patents Applicationslast 30 patents

INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS

METHODS FOR PREPARING METAL SILICIDES

ENHANCED STRESS TUNING AND INTERFACIAL ADHESION FOR TUNGSTEN (W) GA...

Silicon-Containing Layer for Bit Line Resistance Reduction

Silicon-Containing Layer for Bit Line Resistance Reduction

METHODS FOR LOW RESISTIVITY AND STRESS TUNGSTEN GAP FILL

METHODS AND APPARATUS FOR LOW RESISTIVITY AND STRESS TUNGSTEN GAP FILL

Methods and Apparatus for Integrated Cobalt Disilicide Formation

Cap Layer For Bit Line Resistance Reduction

METHODS AND APPARATUS FOR SMOOTHING DYNAMIC RANDOM ACCESS MEMORY BI...

Cap Layer For Bit Line Resistance Reduction

METHODS AND APPARATUS FOR HIGH REFLECTIVITY ALUMINUM LAYERS

TECHNIQUES FOR FORMING LOW STRESS MASK USING IMPLANTATION

TECHNIQUES FOR FORMING LOW STRESS ETCH-RESISTANT MASK USING IMPLANT...

Deposition Of Cobalt Films With High Deposition Rate