Nobuyuki Sata

Person

Kumamoto-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Temperature setting method of heat processing plate, temperature se...
- Patent number 8,874,254
- Issue date Oct 28, 2014
- Tokyo Electron Limited
- Shuji Iwanaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature setting method of heat processing plate, temperature se...
- Patent number 8,014,895
- Issue date Sep 6, 2011
- Tokyo Electron Limited
- Shuji Iwanaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measuring device using oscillating frequency signals
- Patent number 7,977,609
- Issue date Jul 12, 2011
- Tokyo Electron Limited
- Nobuyuki Sata
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Heat treatment apparatus
- Patent number RE40052
- Issue date Feb 12, 2008
- Tokyo Electron Limited
- Eiichi Shirakawa
- 219 - Electric heating
Information Patent Grant
Liquid processing apparatus processing a substrate surface with a p...
- Patent number 7,316,515
- Issue date Jan 8, 2008
- Tokyo Electron Limited
- Shouichi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment apparatus and heat treatment method
- Patent number 7,241,633
- Issue date Jul 10, 2007
- Tokyo Electron Limited
- Nobuyuki Sata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,049,553
- Issue date May 23, 2006
- Tokyo Electron Limited
- Kenichi Shigetomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment apparatus
- Patent number 6,450,803
- Issue date Sep 17, 2002
- Tokyo Electron Limited
- Eiichi Shirakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment apparatus and substrate processing system
- Patent number 6,380,518
- Issue date Apr 30, 2002
- Tokyo Electron Limited
- Eiichi Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat treatment apparatus and substrate processing system
- Patent number 6,291,800
- Issue date Sep 18, 2001
- Tokyo Electron Limited
- Eiichi Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat treatment apparatus
- Patent number 6,229,116
- Issue date May 8, 2001
- Tokyo Electron Limited
- Eiichi Shirakawa
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Heat treatment apparatus
- Patent number 6,222,161
- Issue date Apr 24, 2001
- Tokyo Electron Limited
- Eiichi Shirakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treating apparatus
- Patent number 6,191,394
- Issue date Feb 20, 2001
- Tokyo Electron Ltd.
- Eiichi Shirakawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TEMPERATURE SETTING METHOD OF HEAT PROCESSING PLATE, TEMPERATURE SE...
- Publication number 20110270465
- Publication date Nov 3, 2011
- TOKYO ELECTRON LIMITED
- Shuji Iwanaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE SETTING METHOD OF HEAT PROCESSING PLATE, TEMPERATURE SE...
- Publication number 20090254226
- Publication date Oct 8, 2009
- TOKYO ELECTRON LIMITED
- Shuji Iwanaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid processing apparatus processing a substrate surface with a p...
- Publication number 20060029388
- Publication date Feb 9, 2006
- TOKYO ELECTRON LIMITED
- Shouichi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment apparatus and heat treatment method
- Publication number 20040266222
- Publication date Dec 30, 2004
- TOKYO ELECTRON LIMITED
- Nobuyuki Sata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20040250762
- Publication date Dec 16, 2004
- TOKYO ELECTRON LIMITED
- Kenichi Shigetomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment apparatus and substrate processing system
- Publication number 20020000432
- Publication date Jan 3, 2002
- Eiichi Shirakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment apparatus
- Publication number 20010011653
- Publication date Aug 9, 2001
- Eiichi Shirakawa
- H01 - BASIC ELECTRIC ELEMENTS

Nobuyuki Sata

Person

Patents Grantslast 30 patents

Temperature setting method of heat processing plate, temperature se...

Temperature setting method of heat processing plate, temperature se...

Temperature measuring device using oscillating frequency signals

Heat treatment apparatus

Liquid processing apparatus processing a substrate surface with a p...

Heat treatment apparatus and heat treatment method

Substrate processing apparatus and substrate processing method

Heat treatment apparatus

Heat treatment apparatus and substrate processing system

Heat treatment apparatus and substrate processing system

Heat treatment apparatus

Heat treatment apparatus

Heat treating apparatus

Patents Applicationslast 30 patents

TEMPERATURE SETTING METHOD OF HEAT PROCESSING PLATE, TEMPERATURE SE...

TEMPERATURE SETTING METHOD OF HEAT PROCESSING PLATE, TEMPERATURE SE...

Liquid processing apparatus processing a substrate surface with a p...

Heat treatment apparatus and heat treatment method

Substrate processing apparatus and substrate processing method

Heat treatment apparatus and substrate processing system

Heat treatment apparatus