Noel Arellano

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Area-selective deposition of metal nitride to fabricate devices
- Patent number 11,882,770
- Issue date Jan 23, 2024
- International Business Machines Corporation
- Rudy J. Wojtecki
Information Patent Grant
EUV patterning of monolayers for selective atomic layer deposition
- Patent number 11,187,983
- Issue date Nov 30, 2021
- International Business Machines Corporation
- Rudy J. Wojtecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition with SAM for fully aligned via
- Patent number 11,171,054
- Issue date Nov 9, 2021
- International Business Machines Corporation
- Son Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of dielectrics on ultra-low k dielectrics
- Patent number 10,692,755
- Issue date Jun 23, 2020
- International Business Machines Corporation
- Hosadurga Shobha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Undercut control in isotropic wet etch processes
- Patent number 10,374,034
- Issue date Aug 6, 2019
- International Business Machines Corporation
- Chi-Chun Liu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Thin film self assembly of topcoat-free silicon-containing diblock...
- Patent number 9,982,097
- Issue date May 29, 2018
- International Business Machines Corporation
- Noel Arellano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block copolymers for directed self-assembly applications
- Patent number 9,879,152
- Issue date Jan 30, 2018
- International Business Machines Corporation
- Noel Arellano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
AREA SELECTIVE DEPOSITION OF HARDMASKS FOR VACUUM GAP FORMATION
- Publication number 20250140550
- Publication date May 1, 2025
- Noel Arellano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAP...
- Publication number 20240280899
- Publication date Aug 22, 2024
- International Business Machines Corporation
- Rudy J. Wojtecki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE DEPOSITION ENABLED BY VAPOR PHASE INHIBITOR
- Publication number 20230197418
- Publication date Jun 22, 2023
- International Business Machines Corporation
- Rudy J. Wojtecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION ON METALS USING POROUS LOW-K MATERIALS
- Publication number 20230154757
- Publication date May 18, 2023
- International Business Machines Corporation
- Krystelle Lionti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNESIUM OXIDE BASED HARDMASK FOR REACTIVE ION ETCHING
- Publication number 20230137983
- Publication date May 4, 2023
- International Business Machines Corporation
- Aakash Pushp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AREA-SELECTIVE DEPOSITION OF METAL NITRIDE TO FABRICATE DEVICES
- Publication number 20220190229
- Publication date Jun 16, 2022
- International Business Machines Corporation
- Rudy J. Wojtecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION WITH SAM FOR FULLY ALIGNED VIA
- Publication number 20210313228
- Publication date Oct 7, 2021
- International Business Machines Corporation
- Son Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF AREA-SELECTIVE ATOMIC LAYER DEPOSITION
- Publication number 20200354834
- Publication date Nov 12, 2020
- International Business Machines Corporation
- Ekmini A. De Silva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF DIELECTRICS ON ULTRA-LOW K DIELECTRICS
- Publication number 20200135544
- Publication date Apr 30, 2020
- International Business Machines Corporation
- Hosadurga Shobha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV PATTERNING OF MONOLAYERS FOR SELECTIVE ATOMIC LAYER DEPOSITION
- Publication number 20190391494
- Publication date Dec 26, 2019
- International Business Machines Corporation
- Rudy J. Wojtecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM SELF ASSEMBLY OF TOPCOAT-FREE SILICON-CONTAINING DIBLOCK...
- Publication number 20170233532
- Publication date Aug 17, 2017
- International Business Machines Corporation
- Noel Arellano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY APPLICATIONS
- Publication number 20170114246
- Publication date Apr 27, 2017
- International Business Machines Corporation
- Noel Arellano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Noel Arellano

Person

Patents Grantslast 30 patents

Area-selective deposition of metal nitride to fabricate devices

EUV patterning of monolayers for selective atomic layer deposition

Selective deposition with SAM for fully aligned via

Selective deposition of dielectrics on ultra-low k dielectrics

Undercut control in isotropic wet etch processes

Thin film self assembly of topcoat-free silicon-containing diblock...

Block copolymers for directed self-assembly applications

Patents Applicationslast 30 patents

AREA SELECTIVE DEPOSITION OF HARDMASKS FOR VACUUM GAP FORMATION

FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAP...

SELECTIVE DEPOSITION ENABLED BY VAPOR PHASE INHIBITOR

SELECTIVE DEPOSITION ON METALS USING POROUS LOW-K MATERIALS

MAGNESIUM OXIDE BASED HARDMASK FOR REACTIVE ION ETCHING

AREA-SELECTIVE DEPOSITION OF METAL NITRIDE TO FABRICATE DEVICES

SELECTIVE DEPOSITION WITH SAM FOR FULLY ALIGNED VIA

METHODS OF AREA-SELECTIVE ATOMIC LAYER DEPOSITION

SELECTIVE DEPOSITION OF DIELECTRICS ON ULTRA-LOW K DIELECTRICS

EUV PATTERNING OF MONOLAYERS FOR SELECTIVE ATOMIC LAYER DEPOSITION

THIN FILM SELF ASSEMBLY OF TOPCOAT-FREE SILICON-CONTAINING DIBLOCK...

BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY APPLICATIONS