Noel Smith

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Inductively coupled plasma ion source with tunable radio frequency...
- Patent number 10,128,076
- Issue date Nov 13, 2018
- OREGON PHYSICS, LLC
- Roderick W. Boswell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF system, magnetic filter, and high voltage isolation for an induc...
- Patent number 9,655,223
- Issue date May 16, 2017
- Oregon Physics, LLC
- Noel S. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source for a focused ion beam system
- Patent number 9,640,367
- Issue date May 2, 2017
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for attachment of an electrode into an inductively-coupled p...
- Patent number 9,530,625
- Issue date Dec 27, 2016
- FEI Company
- Sean Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 9,401,262
- Issue date Jul 26, 2016
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma source for charged particle beam system
- Patent number 9,196,451
- Issue date Nov 24, 2015
- FEI Company
- Shouyin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for attachment of an electrode into a plasma source
- Patent number 9,053,895
- Issue date Jun 9, 2015
- FEI Company
- Sean Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 9,029,812
- Issue date May 12, 2015
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for attachment of an electrode into an inductively coupled p...
- Patent number 8,928,210
- Issue date Jan 6, 2015
- FEI Comapny
- Sean Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle-beam processing using a cluster source
- Patent number 8,835,880
- Issue date Sep 16, 2014
- FEI Company
- Clive Chandler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced, inductively coupled plasma source for a focu...
- Patent number 8,829,468
- Issue date Sep 9, 2014
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 8,692,217
- Issue date Apr 8, 2014
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Localized plasma processing
- Patent number 8,530,006
- Issue date Sep 10, 2013
- FEI Company
- Clive D. Chandler
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
High voltage isolation and cooling for an inductively coupled plasm...
- Patent number 8,525,419
- Issue date Sep 3, 2013
- Oregon Physics, LLC
- Noel S. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 8,405,054
- Issue date Mar 26, 2013
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High resolution plasma etch
- Patent number 8,303,833
- Issue date Nov 6, 2012
- FEI Company
- Milos Toth
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Magnetically enhanced, inductively coupled plasma source for a focu...
- Patent number 8,168,957
- Issue date May 1, 2012
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized plasma processing
- Patent number 8,087,379
- Issue date Jan 3, 2012
- FEI Company
- Clive D. Chandler
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 8,076,650
- Issue date Dec 13, 2011
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically enhanced, inductively coupled plasma source for a focu...
- Patent number 7,670,455
- Issue date Mar 2, 2010
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced, inductively coupled plasma source for a focu...
- Patent number 7,241,361
- Issue date Jul 10, 2007
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INDUCTIVELY COUPLED PLASMA ION SOURCE WITH TUNABLE RADIO REQUENCY P...
- Publication number 20180330909
- Publication date Nov 15, 2018
- OREGON PHYSICS, LLC
- Roderick W. Boswell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ATTACHMENT OF AN ELECTRODE INTO AN INDUCTIVELY-COUPLED P...
- Publication number 20150357166
- Publication date Dec 10, 2015
- FEI Company
- Sean Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Source Plasma Focused Ion Beam System
- Publication number 20150318140
- Publication date Nov 5, 2015
- FEI Company
- Noel Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetically Enhanced, Inductively coupled Plasma Source For a Focu...
- Publication number 20150130348
- Publication date May 14, 2015
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged-Particle-Beam Processing Using a Cluster Source
- Publication number 20150079796
- Publication date Mar 19, 2015
- FEI Company
- Clive D. Chandler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20140312245
- Publication date Oct 23, 2014
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF SYSTEM, MAGNETIC FILTER, AND HIGH VOLTAGE ISOLATION FOR AN INDUC...
- Publication number 20140077699
- Publication date Mar 20, 2014
- OREGON PHYSICS, LLC
- Roderick W. Boswell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20130309421
- Publication date Nov 21, 2013
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Resolution Plasma Etch
- Publication number 20130192758
- Publication date Aug 1, 2013
- FEI Company
- Milos Toth
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
System for Attachment of an Electrode into an Inductively Coupled P...
- Publication number 20130134855
- Publication date May 30, 2013
- FEI Company
- Sean Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCU...
- Publication number 20120319000
- Publication date Dec 20, 2012
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Source for Charged Particle Beam System
- Publication number 20120280136
- Publication date Nov 8, 2012
- FEI Company
- Shouyin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Source Plasma Focused Ion Beam System
- Publication number 20120080407
- Publication date Apr 5, 2012
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multibeam System
- Publication number 20110163068
- Publication date Jul 7, 2011
- Mark Utlaut
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Localized Plasma Processing
- Publication number 20110117748
- Publication date May 19, 2011
- FEI Company
- Clive D. Chandler
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Magnetically Enhanced, Inductively Coupled Plasma Source for a Focu...
- Publication number 20100294648
- Publication date Nov 25, 2010
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE ISOLATION AND COOLING FOR AN INDUCTIVELY COUPLED PLASM...
- Publication number 20100126964
- Publication date May 27, 2010
- OREGON PHYSICS, LLC
- Noel S. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20090309018
- Publication date Dec 17, 2009
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH RESOLUTION PLASMA ETCH
- Publication number 20080314871
- Publication date Dec 25, 2008
- FEI Company
- Milos Toth
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Charged-particle-beam processing using a cluster source
- Publication number 20080142735
- Publication date Jun 19, 2008
- FEI Company
- Clive Chandler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetically enhanced, inductively coupled plasma source for a focu...
- Publication number 20080017319
- Publication date Jan 24, 2008
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Localized plasma processing
- Publication number 20060045987
- Publication date Mar 2, 2006
- FEI Company
- Clive D. Chandler
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Magnetically enhanced, inductively coupled plasma source for a focu...
- Publication number 20050183667
- Publication date Aug 25, 2005
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Inductively coupled plasma ion source with tunable radio frequency...

RF system, magnetic filter, and high voltage isolation for an induc...

Plasma source for a focused ion beam system

Method for attachment of an electrode into an inductively-coupled p...

Multi-source plasma focused ion beam system

Plasma source for charged particle beam system

System for attachment of an electrode into a plasma source

Multi-source plasma focused ion beam system

System for attachment of an electrode into an inductively coupled p...

Charged particle-beam processing using a cluster source

Magnetically enhanced, inductively coupled plasma source for a focu...

Multi-source plasma focused ion beam system

Localized plasma processing

High voltage isolation and cooling for an inductively coupled plasm...

Multi-source plasma focused ion beam system

High resolution plasma etch

Magnetically enhanced, inductively coupled plasma source for a focu...

Localized plasma processing

Multi-source plasma focused ion beam system

Magnetically enhanced, inductively coupled plasma source for a focu...

Magnetically enhanced, inductively coupled plasma source for a focu...

Patents Applicationslast 30 patents

INDUCTIVELY COUPLED PLASMA ION SOURCE WITH TUNABLE RADIO REQUENCY P...

METHOD FOR ATTACHMENT OF AN ELECTRODE INTO AN INDUCTIVELY-COUPLED P...

Multi-Source Plasma Focused Ion Beam System

Magnetically Enhanced, Inductively coupled Plasma Source For a Focu...

Charged-Particle-Beam Processing Using a Cluster Source

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

RF SYSTEM, MAGNETIC FILTER, AND HIGH VOLTAGE ISOLATION FOR AN INDUC...

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

High Resolution Plasma Etch

System for Attachment of an Electrode into an Inductively Coupled P...

MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCU...

Plasma Source for Charged Particle Beam System

Multi-Source Plasma Focused Ion Beam System

Multibeam System

Localized Plasma Processing

Magnetically Enhanced, Inductively Coupled Plasma Source for a Focu...

HIGH VOLTAGE ISOLATION AND COOLING FOR AN INDUCTIVELY COUPLED PLASM...

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

HIGH RESOLUTION PLASMA ETCH

Charged-particle-beam processing using a cluster source

Magnetically enhanced, inductively coupled plasma source for a focu...

Localized plasma processing

Magnetically enhanced, inductively coupled plasma source for a focu...