Noel Sun

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Atomic layer deposition and etch in a single plasma chamber for fin...
- Patent number 10,515,815
- Issue date Dec 24, 2019
- Lam Research Corporation
- Xiang Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for performing in-situ deposition of sidewall i...
- Patent number 9,972,502
- Issue date May 15, 2018
- Lam Research Corporation
- Jae Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal plasma grid applications for semiconductor fabrication
- Patent number 9,633,846
- Issue date Apr 25, 2017
- Lam Research Corporation
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for in-situ chamber clean utilized in an etching processing...
- Patent number 9,533,332
- Issue date Jan 3, 2017
- Applied Materials, Inc.
- Noel Sun
- B08 - CLEANING
Information Patent Grant
Internal plasma grid applications for semiconductor fabrication in...
- Patent number 9,230,819
- Issue date Jan 5, 2016
- Lam Research Corporation
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device having a lanthanum-fa...
- Patent number 8,101,525
- Issue date Jan 24, 2012
- Applied Materials, Inc.
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ATOMIC LAYER DEPOSITION AND ETCH IN A SINGLE PLASMA CHAMBER FOR FIN...
- Publication number 20190157096
- Publication date May 23, 2019
- LAM RESEARCH CORPORATION
- Xiang Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL IMAGE TRANSFE...
- Publication number 20180247828
- Publication date Aug 30, 2018
- LAM RESEARCH CORPORATION
- Jae Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL I...
- Publication number 20170076957
- Publication date Mar 16, 2017
- LAM RESEARCH CORPORATION
- Jae Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION
- Publication number 20160086795
- Publication date Mar 24, 2016
- LAM RESEARCH CORPORATION
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION
- Publication number 20140302678
- Publication date Oct 9, 2014
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR IN-SITU CHAMBER CLEAN UTILIZED IN AN ETCHING PROCESSING...
- Publication number 20130087174
- Publication date Apr 11, 2013
- Applied Materials, Inc.
- Noel Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE HAVING A LANTHANUM-FA...
- Publication number 20100210112
- Publication date Aug 19, 2010
- Applied Materials, Inc.
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Atomic layer deposition and etch in a single plasma chamber for fin...

Systems and methods for performing in-situ deposition of sidewall i...

Internal plasma grid applications for semiconductor fabrication

Methods for in-situ chamber clean utilized in an etching processing...

Internal plasma grid applications for semiconductor fabrication in...

Method for fabricating a semiconductor device having a lanthanum-fa...

Patents Applicationslast 30 patents

ATOMIC LAYER DEPOSITION AND ETCH IN A SINGLE PLASMA CHAMBER FOR FIN...

SYSTEMS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL IMAGE TRANSFE...

SYSTEMS AND METHODS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL I...

INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION

INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION

METHODS FOR IN-SITU CHAMBER CLEAN UTILIZED IN AN ETCHING PROCESSING...

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE HAVING A LANTHANUM-FA...