Noriaki OKABE

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Wafer processing method
- Patent number 12,211,692
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Noriaki Okabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern enhancement using a gas cluster ion beam
- Patent number 11,694,872
- Issue date Jul 4, 2023
- TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern enhancement using a gas cluster ion beam
- Patent number 11,450,506
- Issue date Sep 20, 2022
- TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20230178378
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Noriaki OKABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Enhancement Using a Gas Cluster Ion Beam
- Publication number 20220277924
- Publication date Sep 1, 2022
- TEL Manufacturing and Engineering of America, Inc.
- Kazuya Dobashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Pattern Enhancement Using a Gas Cluster Ion Beam
- Publication number 20210335568
- Publication date Oct 28, 2021
- TOKYO ELECTRON LIMITED
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING METHOD
- Publication number 20210280419
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Noriaki OKABE
- H01 - BASIC ELECTRIC ELEMENTS