Noriaki Tochizawa

Person

Funabashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive composition comprising photosensitive saponified pol...
- Patent number 6,797,452
- Issue date Sep 28, 2004
- Toyo Gosei Kogyo Co., Ltd.
- Masahiro Takano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive compositions and pattern formation method
- Patent number 6,444,391
- Issue date Sep 3, 2002
- Toyo Gosei Kogyo Co., Ltd.
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compositions and pattern formation method
- Patent number 6,342,330
- Issue date Jan 29, 2002
- Toyo Gosei Kogyo Co., Ltd.
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compositions and pattern formation method
- Patent number 6,140,007
- Issue date Oct 31, 2000
- Toyo Gosei Kogyo Co., Ltd.
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin and composition thereof derived from saponifie...
- Patent number 6,140,018
- Issue date Oct 31, 2000
- Toyo Gosei Kogyo Co., Ltd.
- Noriaki Tochizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compounds, photosensitive resin compositions, and pa...
- Patent number 6,020,093
- Issue date Feb 1, 2000
- Toyo Gosei Kogyo, Ltd.
- Toru Shibuya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 5,866,296
- Issue date Feb 2, 1999
- Toyo Gosei Co., Ltd.
- Toru Shibuya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyvinyl alcohol base photosensitive resin, photosensitive composi...
- Patent number 5,807,657
- Issue date Sep 15, 1998
- Toyo Gosei Kogyo Co., Ltd.
- Hideo Kikuchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive compositions comprising photosensitive polyfunctiona...
- Patent number 5,589,315
- Issue date Dec 31, 1996
- Toyo Gosei Kogyo Co., Ltd.
- Hirotada Iida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive polyfunctional aromatic diazo compounds useful in ph...
- Patent number 5,430,130
- Issue date Jul 4, 1995
- Toyo Gosei Kogyo Co., Ltd.
- Hirotada Iida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive 4,4'-diazidostilbene derivative
- Patent number 5,041,570
- Issue date Aug 20, 1991
- Toyo Gosei Kogyo Co., Ltd.
- Noriaki Tochizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive poly(vinyl alcohol) derivative
- Patent number 5,021,505
- Issue date Jun 4, 1991
- Director-General of the Agency of Industrial Science and Technology
- Kunihiro Ichimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Photosensitive composition comprising photosensitive saponified pol...
- Publication number 20030022104
- Publication date Jan 30, 2003
- Masahiro Takano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photosensitive compositions and pattern formation method
- Publication number 20010012597
- Publication date Aug 9, 2001
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive compositions and pattern formation method
- Publication number 20010003633
- Publication date Jun 14, 2001
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Noriaki Tochizawa

Person

Patents Grantslast 30 patents

Photosensitive composition comprising photosensitive saponified pol...

Photosensitive compositions and pattern formation method

Photosensitive compositions and pattern formation method

Photosensitive compositions and pattern formation method

Photosensitive resin and composition thereof derived from saponifie...

Photosensitive compounds, photosensitive resin compositions, and pa...

Photosensitive resin composition

Polyvinyl alcohol base photosensitive resin, photosensitive composi...

Photosensitive compositions comprising photosensitive polyfunctiona...

Photosensitive polyfunctional aromatic diazo compounds useful in ph...

Photosensitive 4,4'-diazidostilbene derivative

Photosensitive poly(vinyl alcohol) derivative

Patents Applicationslast 30 patents

Photosensitive composition comprising photosensitive saponified pol...

Photosensitive compositions and pattern formation method

Photosensitive compositions and pattern formation method