Norifumi KIMURA

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for using film formation apparatus
- Patent number 7,938,080
- Issue date May 10, 2011
- Tokyo Electron Limited
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical CVD apparatus for forming silicon-germanium film
- Patent number 7,648,895
- Issue date Jan 19, 2010
- Tokyo Electron Limited
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for using film formation apparatus
- Patent number 7,494,943
- Issue date Feb 24, 2009
- Tokyo Electron Limited
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 7,273,818
- Issue date Sep 25, 2007
- Tokyo Electron Limited
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SILICON OXIDE FILM FORMING METHOD AND SILICON OXIDE FILM FORMING AP...
- Publication number 20140295675
- Publication date Oct 2, 2014
- TOKYO ELECTRONIC LIMITED
- Toshiyuki IKEUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON FILM FORMATION METHOD AND SILICON FILM FORMATION APPARATUS
- Publication number 20110287629
- Publication date Nov 24, 2011
- TOKYO ELECTRON LIMITED
- Akinobu KAKIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL CVD APPPARATUS FOR FORMING SILICON-GERMANIUM FILM
- Publication number 20090104760
- Publication date Apr 23, 2009
- TOKYO ELECTON LIMITED
- Masaki KUROKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR USING FILM FORMATION APPARATUS
- Publication number 20090090300
- Publication date Apr 9, 2009
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for using film formation apparatus
- Publication number 20070093075
- Publication date Apr 26, 2007
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reduction in size of hemispherical grains of hemispherical grained...
- Publication number 20060021570
- Publication date Feb 2, 2006
- Kazuhide Hasebe
- C30 - CRYSTAL GROWTH
Information Patent Application
Vertical CVD apparatus for forming silicon-germanium film
- Publication number 20050181586
- Publication date Aug 18, 2005
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20050170617
- Publication date Aug 4, 2005
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Norifumi KIMURA

Person

Patents Grantslast 30 patents

Method for using film formation apparatus

Vertical CVD apparatus for forming silicon-germanium film

Method for using film formation apparatus

Film formation method and apparatus for semiconductor process

Patents Applicationslast 30 patents

SILICON OXIDE FILM FORMING METHOD AND SILICON OXIDE FILM FORMING AP...

SILICON FILM FORMATION METHOD AND SILICON FILM FORMATION APPARATUS

VERTICAL CVD APPPARATUS FOR FORMING SILICON-GERMANIUM FILM

METHOD FOR USING FILM FORMATION APPARATUS

Method for using film formation apparatus

Reduction in size of hemispherical grains of hemispherical grained...

Vertical CVD apparatus for forming silicon-germanium film

Film formation method and apparatus for semiconductor process