Norihiko IKEDA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,009,180
- Issue date Jun 11, 2024
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,978,612
- Issue date May 7, 2024
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,424,105
- Issue date Aug 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,355,315
- Issue date Jun 7, 2022
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 11,152,192
- Issue date Oct 19, 2021
- HITACHI HIGH-TECH CORPORATION
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,094,512
- Issue date Aug 17, 2021
- HITACHI HIGH-TECH CORPORATION
- Kazuya Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method, and ECR heig...
- Patent number 11,081,320
- Issue date Aug 3, 2021
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,755,897
- Issue date Aug 25, 2020
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,699,884
- Issue date Jun 30, 2020
- HITACHI HIGH-TECH CORPORATION
- Kazuya Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Acid diffusion control agent, radiation-sensitive resin composition...
- Patent number 10,088,750
- Issue date Oct 2, 2018
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, compound, and production method thereof
- Patent number 9,720,322
- Issue date Aug 1, 2017
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid diffusion control agent, radiation-sensitive resin composition...
- Patent number 9,588,423
- Issue date Mar 7, 2017
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, compound, and production method thereof
- Patent number 9,477,149
- Issue date Oct 25, 2016
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, polymer and compound
- Patent number 9,459,532
- Issue date Oct 4, 2016
- JSR Corporation
- Norihiko Ikeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Sample processing apparatus, sample processing system, and method f...
- Patent number 9,390,941
- Issue date Jul 12, 2016
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and resist pattern-forming method
- Patent number 9,329,474
- Issue date May 3, 2016
- JSR Corporation
- Kazuki Kasahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, resist pattern-forming method, compound, a...
- Patent number 9,323,146
- Issue date Apr 26, 2016
- JSR Corporation
- Hayato Namai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer and positive-tone radiation-sensitive resin composition
- Patent number 8,182,977
- Issue date May 22, 2012
- JSR Corporation
- Norihiko Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical mechanical polishing aqueous dispersion, chemical mechanic...
- Patent number 8,157,877
- Issue date Apr 17, 2012
- JSR Corporation
- Norihiko Ikeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Patent number 7,550,020
- Issue date Jun 23, 2009
- JSR Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Patent number 7,252,782
- Issue date Aug 7, 2007
- JSR Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stopper for chemical mechanical planarization, method for manufactu...
- Patent number 7,189,651
- Issue date Mar 13, 2007
- JSR Corporation
- Mutsuhiko Yoshioka
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240331974
- Publication date Oct 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240014007
- Publication date Jan 11, 2024
- Hitachi High-Tech Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230352274
- Publication date Nov 2, 2023
- Hitachi High-Tech Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230058692
- Publication date Feb 23, 2023
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220359162
- Publication date Nov 10, 2022
- Hitachi High-Tech Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210043424
- Publication date Feb 11, 2021
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND ECR HEIG...
- Publication number 20200286715
- Publication date Sep 10, 2020
- Hitachi High-Technologies Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200279719
- Publication date Sep 3, 2020
- HITACHI HIGH-TECH CORPORATION
- Kazuya YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190237300
- Publication date Aug 1, 2019
- Hitachi High-Technologies Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20190115193
- Publication date Apr 18, 2019
- Hitachi High-Technologies Corporation
- Naoki YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190088452
- Publication date Mar 21, 2019
- Hitachi High-Technologies Corporation
- Kazuya YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180082821
- Publication date Mar 22, 2018
- Hitachi High-Technologies Corporation
- Norihiko IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION...
- Publication number 20170131632
- Publication date May 11, 2017
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF
- Publication number 20160370700
- Publication date Dec 22, 2016
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION...
- Publication number 20150079520
- Publication date Mar 19, 2015
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF
- Publication number 20150004545
- Publication date Jan 1, 2015
- JSR Corporation
- Hayato NAMAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, A...
- Publication number 20140363769
- Publication date Dec 11, 2014
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20140011365
- Publication date Jan 9, 2014
- Hitachi High-Technologies Corporation
- Naoki YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD
- Publication number 20130280657
- Publication date Oct 24, 2013
- Kazuki KASAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
- Publication number 20130216951
- Publication date Aug 22, 2013
- JSR Corporation
- Norihiko IKEDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SAMPLE PROCESSING DEVICE, SAMPLE PROCESSING SYSTEM, AND METHOD FOR...
- Publication number 20120228261
- Publication date Sep 13, 2012
- Seiichi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
- Publication number 20110223537
- Publication date Sep 15, 2011
- JSR Corporation
- Takuma Ebata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20100239981
- Publication date Sep 23, 2010
- JSR Corporation
- Norihiko IKEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, PRODUCTION ME...
- Publication number 20090325323
- Publication date Dec 31, 2009
- JSR Corporation
- Tomikazu Ueno
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, CHEMICAL MECHANIC...
- Publication number 20090165395
- Publication date Jul 2, 2009
- JSR CORPORATION
- Norihiko Ikeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
STOPPER FOR CHEMICAL MECHANICAL PLANARIZATION, METHOD FOR MANUFACTU...
- Publication number 20070151951
- Publication date Jul 5, 2007
- JSR Corporation
- Mutsuhiko Yoshioka
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Publication number 20060010781
- Publication date Jan 19, 2006
- JSR Corporation
- Norihiko Ikeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Publication number 20050164510
- Publication date Jul 28, 2005
- JSR Corporation
- Norihiko Ikeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Stopper for chemical mechanical planarization, method for manufactu...
- Publication number 20040110379
- Publication date Jun 10, 2004
- JSR Corporation
- Mutsuhiko Yoshioka
- B24 - GRINDING POLISHING

Norihiko IKEDA

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus, plasma processing method, and ECR heig...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Acid diffusion control agent, radiation-sensitive resin composition...

Photoresist composition, compound, and production method thereof

Acid diffusion control agent, radiation-sensitive resin composition...

Photoresist composition, compound, and production method thereof

Radiation-sensitive resin composition, polymer and compound

Sample processing apparatus, sample processing system, and method f...

Photoresist composition and resist pattern-forming method

Photoresist composition, resist pattern-forming method, compound, a...

Polymer and positive-tone radiation-sensitive resin composition

Chemical mechanical polishing aqueous dispersion, chemical mechanic...

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Stopper for chemical mechanical planarization, method for manufactu...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND ECR HEIG...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION...

PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF

ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION...

PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF

PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, A...

PLASMA PROCESSING APPARATUS AND METHOD

PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND

SAMPLE PROCESSING DEVICE, SAMPLE PROCESSING SYSTEM, AND METHOD FOR...

RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER

POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, PRODUCTION ME...

CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, CHEMICAL MECHANIC...

STOPPER FOR CHEMICAL MECHANICAL PLANARIZATION, METHOD FOR MANUFACTU...

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Stopper for chemical mechanical planarization, method for manufactu...