Norihiko Sugie

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for chemical-mechanical polishing and chemical-mechanic...
- Patent number 12,104,087
- Issue date Oct 1, 2024
- JSR Corporation
- Yuuya Yamada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Radiation-sensitive resin composition, polymer, and resist pattern-...
- Patent number 8,980,529
- Issue date Mar 17, 2015
- JSR Corporation
- Yasuhiko Matsuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for formation of upper layer film, and method for forma...
- Patent number 8,895,229
- Issue date Nov 25, 2014
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming upper layer film for immersion exposure, up...
- Patent number 8,697,344
- Issue date Apr 15, 2014
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Upper layer-forming composition and resist patterning method
- Patent number 8,501,389
- Issue date Aug 6, 2013
- JSR Corporation
- Kazunori Kusabiraki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin for formation of upper antireflective film, composition for f...
- Patent number 8,497,062
- Issue date Jul 30, 2013
- JSR Corporation
- Norihiro Natsume
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming upper layer film for immersion exposure, up...
- Patent number 8,431,332
- Issue date Apr 30, 2013
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION AND CHEMICAL MECHANICAL P...
- Publication number 20220389280
- Publication date Dec 8, 2022
- JSR Corporation
- Yuuya Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING AND CHEMICAL-MECHANIC...
- Publication number 20220389279
- Publication date Dec 8, 2022
- JSR Corporation
- Yuuya Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20140147794
- Publication date May 29, 2014
- JSR Corporation
- Norihiko SUGIE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
- Publication number 20130216961
- Publication date Aug 22, 2013
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-...
- Publication number 20130203000
- Publication date Aug 8, 2013
- JSR Corporation
- Yasuhiko MATSUDA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
UPPER LAYER FILM-FORMING COMPOSITION AND METHOD OF FORMING PHOTORES...
- Publication number 20120171613
- Publication date Jul 5, 2012
- JSR Corporation
- Norihiko SUGIE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD
- Publication number 20110262859
- Publication date Oct 27, 2011
- JSR Corporation
- Kazunori KUSABIRAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
- Publication number 20100255416
- Publication date Oct 7, 2010
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR F...
- Publication number 20100112475
- Publication date May 6, 2010
- JSR Corporation
- Norihiro Natsume
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMA...
- Publication number 20100021852
- Publication date Jan 28, 2010
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20060223001
- Publication date Oct 5, 2006
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Norihiko Sugie

Person

Patents Grantslast 30 patents

Composition for chemical-mechanical polishing and chemical-mechanic...

Radiation-sensitive resin composition, polymer, and resist pattern-...

Composition for formation of upper layer film, and method for forma...

Composition for forming upper layer film for immersion exposure, up...

Upper layer-forming composition and resist patterning method

Resin for formation of upper antireflective film, composition for f...

Composition for forming upper layer film for immersion exposure, up...

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING COMPOSITION AND CHEMICAL MECHANICAL P...

COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING AND CHEMICAL-MECHANIC...

METHOD OF FORMING PHOTORESIST PATTERN

COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-...

UPPER LAYER FILM-FORMING COMPOSITION AND METHOD OF FORMING PHOTORES...

UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD

COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...

RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR F...

COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMA...

Radiation-sensitive resin composition