Norihiro Natsume

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for formation of upper layer film, and method for forma...
- Patent number 8,895,229
- Issue date Nov 25, 2014
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming upper layer film for immersion exposure, up...
- Patent number 8,697,344
- Issue date Apr 15, 2014
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin for formation of upper antireflective film, composition for f...
- Patent number 8,497,062
- Issue date Jul 30, 2013
- JSR Corporation
- Norihiro Natsume
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming upper layer film for immersion exposure, up...
- Patent number 8,431,332
- Issue date Apr 30, 2013
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming antireflection film, laminate, and method f...
- Patent number 7,514,205
- Issue date Apr 7, 2009
- JSR Corporation
- Nakaatsu Yoshimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,623,907
- Issue date Sep 23, 2003
- JSR Corporation
- Jun Numata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
- Publication number 20130216961
- Publication date Aug 22, 2013
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
- Publication number 20100255416
- Publication date Oct 7, 2010
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMIN...
- Publication number 20100167024
- Publication date Jul 1, 2010
- JSR Corporation
- Norihiro Natsume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR F...
- Publication number 20100112475
- Publication date May 6, 2010
- JSR Corporation
- Norihiro Natsume
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMA...
- Publication number 20100021852
- Publication date Jan 28, 2010
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20060223001
- Publication date Oct 5, 2006
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming antireflection film, laminate, and method f...
- Publication number 20060223008
- Publication date Oct 5, 2006
- Nakaatsu Yoshimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20010023050
- Publication date Sep 20, 2001
- Jun Numata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Norihiro Natsume

Person

Patents Grantslast 30 patents

Composition for formation of upper layer film, and method for forma...

Composition for forming upper layer film for immersion exposure, up...

Resin for formation of upper antireflective film, composition for f...

Composition for forming upper layer film for immersion exposure, up...

Composition for forming antireflection film, laminate, and method f...

Radiation-sensitive resin composition

Patents Applicationslast 30 patents

COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...

COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...

NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMIN...

RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR F...

COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMA...

Radiation-sensitive resin composition

Composition for forming antireflection film, laminate, and method f...

Radiation-sensitive resin composition