Noriiki MASUDA

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Temperature control method
- Patent number 10,921,773
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Takari Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system, gas supply unit, method of substrate p...
- Patent number 9,466,506
- Issue date Oct 11, 2016
- Tokyo Electron Limited
- Noriiki Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply device, substrate processing apparatus and substrate pro...
- Patent number 8,679,255
- Issue date Mar 25, 2014
- Tokyo Electron Limited
- Noriiki Masuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply device, substrate processing apparatus and substrate pro...
- Patent number 8,430,962
- Issue date Apr 30, 2013
- Tokyo Electron Limited
- Noriiki Masuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20250006516
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Noriiki MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL METHOD
- Publication number 20240103482
- Publication date Mar 28, 2024
- TOKYO ELECTRON LIMITED
- Takari Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL METHOD
- Publication number 20210132575
- Publication date May 6, 2021
- TOKYO ELECTRON LIMITED
- Takari Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL METHOD
- Publication number 20160378092
- Publication date Dec 29, 2016
- TOKYO ELECTRON LIMITED
- Takari Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PRO...
- Publication number 20130237058
- Publication date Sep 12, 2013
- TOKYO ELECTRON LIMITED
- Noriiki MASUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, GAS SUPPLY UNIT, METHOD OF SUBSTRATE P...
- Publication number 20130149867
- Publication date Jun 13, 2013
- TOKYO ELECTRON LIMITED
- Noriiki MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PRO...
- Publication number 20090117746
- Publication date May 7, 2009
- TOKYO ELECTRON LIMITED
- Noriiki MASUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing system, gas supply unit, method of substrate p...
- Publication number 20080078746
- Publication date Apr 3, 2008
- Noriiki Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING AND PLASMA PROCESSING APPARATUS
- Publication number 20080066868
- Publication date Mar 20, 2008
- TOKYO ELECTRON LIMITED
- Noriiki MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching and apparatus for doing same
- Publication number 20030192857
- Publication date Oct 16, 2003
- TOKYO ELECTRON LIMITED
- Noriiki Masuda
- H01 - BASIC ELECTRIC ELEMENTS

Noriiki MASUDA

Person

Patents Grantslast 30 patents

Temperature control method

Substrate processing system, gas supply unit, method of substrate p...

Gas supply device, substrate processing apparatus and substrate pro...

Gas supply device, substrate processing apparatus and substrate pro...

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

TEMPERATURE CONTROL METHOD

TEMPERATURE CONTROL METHOD

TEMPERATURE CONTROL METHOD

GAS SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PRO...

SUBSTRATE PROCESSING SYSTEM, GAS SUPPLY UNIT, METHOD OF SUBSTRATE P...

GAS SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PRO...

Substrate processing system, gas supply unit, method of substrate p...

FOCUS RING AND PLASMA PROCESSING APPARATUS

Method of etching and apparatus for doing same