Norikazu Sasaki

Person

Kurokawa-gun, Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning method and processing apparatus
- Patent number 10,607,819
- Issue date Mar 31, 2020
- Tokyo Electron Limited
- Eiji Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply system, plasma processing apparatus, and operation metho...
- Patent number 10,472,717
- Issue date Nov 12, 2019
- Tokyo Electron Limited
- Atsushi Sawachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for preventing explosion of exhaust gas in decompression pro...
- Patent number 10,168,049
- Issue date Jan 1, 2019
- Tokyo Electron Limited
- Norihiko Amikura
- G01 - MEASURING TESTING
Information Patent Grant
Gas supply control method
- Patent number 9,904,299
- Issue date Feb 27, 2018
- Tokyo Electron Limited
- Kumiko Ono
- G05 - CONTROLLING REGULATING
Information Patent Grant
Apparatus for dividing and supplying gas and method for dividing an...
- Patent number 9,477,232
- Issue date Oct 25, 2016
- Fujikin Incorporated
- Eiji Takahashi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for controlling chiller and semiconductor process...
- Patent number 6,986,261
- Issue date Jan 17, 2006
- Tokyo Electron Limited
- Norikazu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180122620
- Publication date May 3, 2018
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS, AND OPERATION METHO...
- Publication number 20170159180
- Publication date Jun 8, 2017
- TOKYO ELECTRON LIMITED
- Atsushi Sawachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY CONTROL METHOD
- Publication number 20160299514
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Kumiko ONO
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD FOR PREVENTING EXPLOSION OF EXHAUST GAS IN DECOMPRESSION PRO...
- Publication number 20150330631
- Publication date Nov 19, 2015
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150206713
- Publication date Jul 23, 2015
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR DIVIDING AND SUPPLYING GAS AND METHOD FOR DIVIDING AN...
- Publication number 20150059859
- Publication date Mar 5, 2015
- Fujikin Incorporated
- Eiji Takahashi
- G05 - CONTROLLING REGULATING
Information Patent Application
CLEANING METHOD AND PROCESSING APPARATUS
- Publication number 20150000707
- Publication date Jan 1, 2015
- TOKYO ELECTRON LIMITED
- Eiji TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing system
- Publication number 20050064609
- Publication date Mar 24, 2005
- TOKYO ELECTRON LIMITED
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for controlling chiller and semiconductor process...
- Publication number 20040216475
- Publication date Nov 4, 2004
- Norikazu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Norikazu Sasaki

Person

Patents Grantslast 30 patents

Cleaning method and processing apparatus

Gas supply system, plasma processing apparatus, and operation metho...

Method for preventing explosion of exhaust gas in decompression pro...

Gas supply control method

Apparatus for dividing and supplying gas and method for dividing an...

Method and system for controlling chiller and semiconductor process...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

GAS SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS, AND OPERATION METHO...

GAS SUPPLY CONTROL METHOD

METHOD FOR PREVENTING EXPLOSION OF EXHAUST GAS IN DECOMPRESSION PRO...

PLASMA PROCESSING APPARATUS

APPARATUS FOR DIVIDING AND SUPPLYING GAS AND METHOD FOR DIVIDING AN...

CLEANING METHOD AND PROCESSING APPARATUS

Semiconductor processing system

Method and system for controlling chiller and semiconductor process...