Norikazu Yamada

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma generating method
- Patent number 10,615,005
- Issue date Apr 7, 2020
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,593,519
- Issue date Mar 17, 2020
- Tokyo Electron Limited
- Norikazu Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,388,544
- Issue date Aug 20, 2019
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for impedance matching of plasma processing apparatus
- Patent number 10,250,217
- Issue date Apr 2, 2019
- Tokyo Electron Limited
- Koichi Nagami
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma processing method
- Patent number 10,109,461
- Issue date Oct 23, 2018
- Tokyo Electron Limited
- Norikazu Yamada
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Connection control method
- Patent number 10,032,611
- Issue date Jul 24, 2018
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,875,881
- Issue date Jan 23, 2018
- Tokyo Electron Limited
- Kohichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,754,768
- Issue date Sep 5, 2017
- Tokyo Electron Limited
- Norikazu Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for impedance matching of plasma processing apparatus
- Patent number 9,736,921
- Issue date Aug 15, 2017
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,734,992
- Issue date Aug 15, 2017
- Tokyo Electron Limited
- Norikazu Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method usin...
- Patent number 9,564,287
- Issue date Feb 7, 2017
- Tokyo Electron Limited
- Takeshi Ohse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,355,822
- Issue date May 31, 2016
- Tokyo Electron Limited
- Norikazu Yamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate plasma processing apparatus and plasma processing method
- Patent number 8,821,684
- Issue date Sep 2, 2014
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method usin...
- Patent number 8,568,606
- Issue date Oct 29, 2013
- Tokyo Electron Limited
- Takeshi Ohse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etching method
- Patent number 8,288,286
- Issue date Oct 16, 2012
- Tokyo Electron Limited
- Etsuo Iijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etching method
- Patent number 7,476,624
- Issue date Jan 13, 2009
- Tokyo Electron Limited
- Etsuo Iijima
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA GENERATING METHOD
- Publication number 20190318915
- Publication date Oct 17, 2019
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPEDANCE MATCHING OF PLASMA PROCESSING APPARATUS
- Publication number 20180115299
- Publication date Apr 26, 2018
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180012736
- Publication date Jan 11, 2018
- TOKYO ELECTRON LIMITED
- Norikazu Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20170372873
- Publication date Dec 28, 2017
- TOKYO ELECTRON LIMITED
- Norikazu Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONNECTION CONTROL METHOD
- Publication number 20170110296
- Publication date Apr 20, 2017
- TOKYO ELECTRON LIMITED
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPEDANCE MATCHING OF PLASMA PROCESSING APPARATUS
- Publication number 20170099723
- Publication date Apr 6, 2017
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20150162223
- Publication date Jun 11, 2015
- Kabushiki Kaisha Toshiba
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150000841
- Publication date Jan 1, 2015
- TOKYO ELECTRON LIMITED
- Norikazu Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140361690
- Publication date Dec 11, 2014
- Norikazu Yamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20140305905
- Publication date Oct 16, 2014
- Norikazu Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140231389
- Publication date Aug 21, 2014
- TOKYO ELECTRON LIMITED
- Kohichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20140020832
- Publication date Jan 23, 2014
- TOKYO ELECTRON LIMITED
- Takeshi OHSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCHING METHOD
- Publication number 20130025789
- Publication date Jan 31, 2013
- TOKYO ELECTRON LIMITED
- Etsuo Iijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20120247677
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20100243607
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- Takeshi Ohse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20100072172
- Publication date Mar 25, 2010
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20090194508
- Publication date Aug 6, 2009
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCHING METHOD
- Publication number 20090098736
- Publication date Apr 16, 2009
- TOKYO ELECTRON LIMITED
- Etsuo Iijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry-etcching method
- Publication number 20040192056
- Publication date Sep 30, 2004
- Etsuo Iijima
- H01 - BASIC ELECTRIC ELEMENTS

Norikazu Yamada

Person

Patents Grantslast 30 patents

Plasma generating method

Plasma processing apparatus

Substrate processing apparatus and substrate processing method

Method for impedance matching of plasma processing apparatus

Plasma processing method

Connection control method

Plasma processing apparatus and plasma processing method

Plasma processing method and plasma processing apparatus

Method for impedance matching of plasma processing apparatus

Plasma processing apparatus

Substrate processing apparatus and substrate processing method usin...

Plasma processing apparatus

Substrate plasma processing apparatus and plasma processing method

Substrate processing apparatus and substrate processing method usin...

Dry-etching method

Dry-etching method

Patents Applicationslast 30 patents

PLASMA GENERATING METHOD

METHOD FOR IMPEDANCE MATCHING OF PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

CONNECTION CONTROL METHOD

METHOD FOR IMPEDANCE MATCHING OF PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

DRY-ETCHING METHOD

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

DRY-ETCHING METHOD

Dry-etcching method