Norio Ishikawa

Person

Soka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Post-dry etching cleaning liquid composition and process for fabric...
- Patent number 8,513,140
- Issue date Aug 20, 2013
- Sony Corporation
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Positive resist processing liquid composition and liquid developer
- Patent number 8,323,880
- Issue date Dec 4, 2012
- Kanto Kagaku Kabushiki Kaisha
- Yutaka Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alkaline aqueous solution composition used for washing or etching s...
- Patent number 8,123,976
- Issue date Feb 28, 2012
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Manufacturing method for semiconductor device
- Patent number 7,943,516
- Issue date May 17, 2011
- Renesas Electronics Corporation
- Hidemitsu Aoki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Semiconductor substrate cleaning liquid and semiconductor substrate...
- Patent number 7,896,970
- Issue date Mar 1, 2011
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photoresist residue remover composition and semiconductor circuit e...
- Patent number 7,816,313
- Issue date Oct 19, 2010
- Kanto Kagaku Kabushiki Kaisha
- Hiroshi Kawamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for removing photoresist residue and polymer residue
- Patent number 7,563,754
- Issue date Jul 21, 2009
- Kanto Kagaku Kabushiki Kaisha
- Takuo Oowada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching liquid composition
- Patent number 7,507,350
- Issue date Mar 24, 2009
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for cleaning semiconductor substrate
- Patent number 7,503,982
- Issue date Mar 17, 2009
- Kanto Jangaku Kabushiki Kaisha
- Yumiko Abe
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning solution and manufacturing method for semiconductor device
- Patent number 7,368,064
- Issue date May 6, 2008
- NEC Electronics Corporation
- Hidemitsu Aoki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Washing liquid composition for semiconductor substrate
- Patent number 7,138,362
- Issue date Nov 21, 2006
- Kanto Kagaku Kabushiki Kaisha
- Yumiko Abe
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Post-CMP washing liquid composition
- Patent number 7,087,562
- Issue date Aug 8, 2006
- Kanto Kagaku Kabushiki Kaisha
- Yumiko Abe
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning solution for substrates of electronic materials
- Patent number 7,084,097
- Issue date Aug 1, 2006
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning solution and cleaning method for mask used in vacuum vapor...
- Patent number 7,073,518
- Issue date Jul 11, 2006
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Etching liquid composition
- Patent number 6,914,039
- Issue date Jul 5, 2005
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Chemical solution treatment apparatus for semiconductor substrate
- Patent number 6,877,518
- Issue date Apr 12, 2005
- NEC Electronics Corporation
- Kaori Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist residue removing liquid composition
- Patent number 6,864,044
- Issue date Mar 8, 2005
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist residue remover composition
- Patent number 6,787,293
- Issue date Sep 7, 2004
- Kanto Kagaku Kabushiki Kaisha
- Takuo Oowada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning solution for substrates of electronic materials
- Patent number 6,730,644
- Issue date May 4, 2004
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Remover for a ruthenium containing metal and use thereof
- Patent number 6,468,357
- Issue date Oct 22, 2002
- NEC Corporation
- Hidemitsu Aoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist stripping liquid composition
- Patent number 6,231,677
- Issue date May 15, 2001
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning solution for cleaning substrates to which a metallic wirin...
- Patent number 6,080,709
- Issue date Jun 27, 2000
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Aqueous ammonia composition
- Patent number 5,580,847
- Issue date Dec 3, 1996
- Nissan Chemical Industries, Ltd.
- Fumihiro Morikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive resist quaternary ammonium hydroxide containing developer...
- Patent number 4,914,006
- Issue date Apr 3, 1990
- Kabushiki Kaisha Toshiba
- Tiharu Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ETCHING SOLUTION COMPOSITION FOR TRANSPARENT CONDUCTIVE FILM
- Publication number 20120255929
- Publication date Oct 11, 2012
- Kanto Kagaku Kabushiki Kaisha
- Takao Yamaguchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20110014793
- Publication date Jan 20, 2011
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALKALINE AQUEOUS SOLUTION COMPOSITION FOR TREATING A SUBSTRATE
- Publication number 20100090158
- Publication date Apr 15, 2010
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE RESIST PROCESSING LIQUID COMPOSITION AND LIQUID DEVELOPER
- Publication number 20100086882
- Publication date Apr 8, 2010
- Kanto Kagaku Kabushiki Kaisha
- Yutaka Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING LIQUID COMPOSITION FOR A SEMICONDUCTOR SUBSTRATE
- Publication number 20090286708
- Publication date Nov 19, 2009
- Kanto Kagaku Kabushiki Kaisha
- Yutaka Murakami
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
ALKALINE AQUEOUS SOLUTION COMPOSITION USED FOR WASHING OR ETCHING S...
- Publication number 20090001315
- Publication date Jan 1, 2009
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Photoresist residue remover composition and semiconductor circuit e...
- Publication number 20080318424
- Publication date Dec 25, 2008
- Hiroshi Kawamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning solution and manufacturing method for semiconductor device
- Publication number 20080214002
- Publication date Sep 4, 2008
- NEC ELETRONICS CORPORATION
- Hidemitsu Aoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20080188085
- Publication date Aug 7, 2008
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor substrate cleaning liquid and semiconductor substrate...
- Publication number 20070295366
- Publication date Dec 27, 2007
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor substrate cleaning liquid and semiconductor substrate...
- Publication number 20060035797
- Publication date Feb 16, 2006
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20060019201
- Publication date Jan 26, 2006
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Composition for removing photoresist residue and polymer residue
- Publication number 20050288199
- Publication date Dec 29, 2005
- Kanto Kagaku Kabushiki Kaisha
- Takuo Oowada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning solution and cleaning method for mask used in vacuum vapor...
- Publication number 20050252523
- Publication date Nov 17, 2005
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Cleaning solution and manufacturing method for semiconductor device
- Publication number 20050236362
- Publication date Oct 27, 2005
- NEC ELECTRONICS CORPORATION
- Hidemitsu Aoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Etching liquid composition
- Publication number 20050209119
- Publication date Sep 22, 2005
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Photoresist residue remover composition and semiconductor circuit e...
- Publication number 20050209118
- Publication date Sep 22, 2005
- Hiroshi Kawamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning solution and cleaning method for mask used in vacuum vapor...
- Publication number 20050124524
- Publication date Jun 9, 2005
- Kanto Kagaku Kabushiki Kaisha
- Norio Ishikawa
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Method of manufacturing laminated structure, laminated structure, d...
- Publication number 20050007015
- Publication date Jan 13, 2005
- Seiichi Yokoyama
- G02 - OPTICS
Information Patent Application
Cleaning liquid composition for semiconductor substrate
- Publication number 20040204329
- Publication date Oct 14, 2004
- Yumiko Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning solution for substrates of electronic materials
- Publication number 20040167047
- Publication date Aug 26, 2004
- Norio Ishikawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Photoresist residue remover composition
- Publication number 20040002020
- Publication date Jan 1, 2004
- Takuo Oowada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Post-CMP washing liquid composition
- Publication number 20030216270
- Publication date Nov 20, 2003
- Yumiko Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Washing liquid composition for semiconductor substrate
- Publication number 20030171233
- Publication date Sep 11, 2003
- Yumiko Abe
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Chemical solution treatment apparatus for semiconductor substrate
- Publication number 20030168088
- Publication date Sep 11, 2003
- Kaori Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photoresist residue removing liquid composition
- Publication number 20030143495
- Publication date Jul 31, 2003
- Norio Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Etching liquid composition
- Publication number 20020055447
- Publication date May 9, 2002
- Norio Ishikawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Remover for a ruthenium containing metal and use thereof
- Publication number 20010023701
- Publication date Sep 27, 2001
- NEC Corporation
- Hidemitsu Aoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Norio Ishikawa

Person

Patents Grantslast 30 patents

Post-dry etching cleaning liquid composition and process for fabric...

Positive resist processing liquid composition and liquid developer

Alkaline aqueous solution composition used for washing or etching s...

Manufacturing method for semiconductor device

Semiconductor substrate cleaning liquid and semiconductor substrate...

Photoresist residue remover composition and semiconductor circuit e...

Composition for removing photoresist residue and polymer residue

Etching liquid composition

Method for cleaning semiconductor substrate

Cleaning solution and manufacturing method for semiconductor device

Washing liquid composition for semiconductor substrate

Post-CMP washing liquid composition

Cleaning solution for substrates of electronic materials

Cleaning solution and cleaning method for mask used in vacuum vapor...

Etching liquid composition

Chemical solution treatment apparatus for semiconductor substrate

Photoresist residue removing liquid composition

Photoresist residue remover composition

Cleaning solution for substrates of electronic materials

Remover for a ruthenium containing metal and use thereof

Photoresist stripping liquid composition

Cleaning solution for cleaning substrates to which a metallic wirin...

Aqueous ammonia composition

Positive resist quaternary ammonium hydroxide containing developer...

Patents Applicationslast 30 patents

ETCHING SOLUTION COMPOSITION FOR TRANSPARENT CONDUCTIVE FILM

Post-dry etching cleaning liquid composition and process for fabric...

ALKALINE AQUEOUS SOLUTION COMPOSITION FOR TREATING A SUBSTRATE

POSITIVE RESIST PROCESSING LIQUID COMPOSITION AND LIQUID DEVELOPER

CLEANING LIQUID COMPOSITION FOR A SEMICONDUCTOR SUBSTRATE

ALKALINE AQUEOUS SOLUTION COMPOSITION USED FOR WASHING OR ETCHING S...

Photoresist residue remover composition and semiconductor circuit e...

Cleaning solution and manufacturing method for semiconductor device

Post-dry etching cleaning liquid composition and process for fabric...

Semiconductor substrate cleaning liquid and semiconductor substrate...

Semiconductor substrate cleaning liquid and semiconductor substrate...

Post-dry etching cleaning liquid composition and process for fabric...

Composition for removing photoresist residue and polymer residue

Cleaning solution and cleaning method for mask used in vacuum vapor...

Cleaning solution and manufacturing method for semiconductor device

Etching liquid composition

Photoresist residue remover composition and semiconductor circuit e...

Cleaning solution and cleaning method for mask used in vacuum vapor...

Method of manufacturing laminated structure, laminated structure, d...

Cleaning liquid composition for semiconductor substrate

Cleaning solution for substrates of electronic materials

Photoresist residue remover composition

Post-CMP washing liquid composition

Washing liquid composition for semiconductor substrate

Chemical solution treatment apparatus for semiconductor substrate

Photoresist residue removing liquid composition

Etching liquid composition

Remover for a ruthenium containing metal and use thereof