Norio Semba

Person

Kikuchi-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Treatment apparatus and treatment method
- Patent number 6,368,776
- Issue date Apr 9, 2002
- Tokyo Electron Limited
- Koji Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air feeder provided with by-pass bypassing cooling section, substra...
- Patent number 6,338,474
- Issue date Jan 15, 2002
- Tokyo Electron Limited
- Norio Semba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment apparatus, treatment method, and impurity removing apparatus
- Patent number 6,333,003
- Issue date Dec 25, 2001
- Tokyo Electron Limited
- Takayuki Katano
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Substrate processing apparatus
- Patent number 6,332,724
- Issue date Dec 25, 2001
- Tokyo Electron Limited
- Mitsuteru Yano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating a resist film, with pretesting for particle contamination
- Patent number 6,268,013
- Issue date Jul 31, 2001
- Tokyo Electron Limited
- Masami Akimoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Resist processing system having process solution deaeration mechanism
- Patent number 6,217,657
- Issue date Apr 17, 2001
- Tokyo Electron Limited
- Yukio Kiba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing system
- Patent number 6,133,981
- Issue date Oct 17, 2000
- Tokyo Electron Ltd
- Norio Semba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing apparatus and method using solution
- Patent number 6,063,439
- Issue date May 16, 2000
- Tokyo Electron Limited
- Norio Semba
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Resist processing apparatus
- Patent number 6,033,475
- Issue date Mar 7, 2000
- Tokyo Electron Limited
- Keizo Hasebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid supplying device
- Patent number 6,015,066
- Issue date Jan 18, 2000
- Tokyo Electron Limited
- Yoshio Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment system
- Patent number 5,944,894
- Issue date Aug 31, 1999
- Tokyo Electron Limited
- Junichi Kitano
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Method and apparatus for coating a film on an object being processed
- Patent number 5,938,847
- Issue date Aug 17, 1999
- Tokyo Electron Limited
- Masami Akimoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Resist processing method and resist processing system
- Patent number 5,866,307
- Issue date Feb 2, 1999
- Tokyo Electron Limited
- Yukio Kiba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for developing treatment
- Patent number 5,854,953
- Issue date Dec 29, 1998
- Tokyo Electron Limited
- Norio Semba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing system
- Patent number 5,826,129
- Issue date Oct 20, 1998
- Tokyo Electron Limited
- Keizo Hasebe
- H01 - BASIC ELECTRIC ELEMENTS

Norio Semba

Person

Patents Grantslast 30 patents

Treatment apparatus and treatment method

Air feeder provided with by-pass bypassing cooling section, substra...

Treatment apparatus, treatment method, and impurity removing apparatus

Substrate processing apparatus

Coating a resist film, with pretesting for particle contamination

Resist processing system having process solution deaeration mechanism

Processing system

Processing apparatus and method using solution

Resist processing apparatus

Liquid supplying device

Substrate treatment system

Method and apparatus for coating a film on an object being processed

Resist processing method and resist processing system

Method for developing treatment

Substrate processing system