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Norio Uemura
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Yonago, JP
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last 30 patents
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Patent Grant
Method of producing a sputter target material
Patent number
8,409,498
Issue date
Apr 2, 2013
Hitachi Metals, Ltd.
Keisuke Inoue
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Patents Applications
last 30 patents
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Patent Application
METHOD OF PRODUCING A SPUTTER TARGET MATERIAL
Publication number
20090238712
Publication date
Sep 24, 2009
Hitachi Metals, Ltd.
Keisuke Inoue
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
Sputter target material and method of producing the same
Publication number
20050230244
Publication date
Oct 20, 2005
HITACHI METALS, LTD
Keisuke Inoue
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
Method of producing target material of Mo alloy
Publication number
20050191202
Publication date
Sep 1, 2005
HITACHI METALS, LTD
Katsunori Iwasaki
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...