Noriyuki Hirayanagi

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of measuring the position of a mask surface along the height...
- Patent number 8,390,783
- Issue date Mar 5, 2013
- Nikon Corporation
- Noriyuki Hirayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination-sensor calibration methods, and exposure methods and a...
- Patent number 8,018,577
- Issue date Sep 13, 2011
- Nikon Corporation
- Hajime Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and exposure apparatus
- Patent number 7,862,961
- Issue date Jan 4, 2011
- Nikon Corporation
- Noriyuki Hirayanagi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Substrate conveyor apparatus, substrate conveyance method and expos...
- Patent number 7,483,123
- Issue date Jan 27, 2009
- Nikon Corporation
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring the position of a mask surface along the height...
- Patent number 7,433,017
- Issue date Oct 7, 2008
- Nikon Corporation
- Noriyuki Hirayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for mask/substrate alignment in charged-parti...
- Patent number 6,965,114
- Issue date Nov 15, 2005
- Nikon Corporation
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Divided reticles for charged-particle-beam microlithography apparat...
- Patent number 6,936,831
- Issue date Aug 30, 2005
- Nikon Corporation
- Tomoharu Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle chambers and reticle cassettes providing temperature contro...
- Patent number 6,909,490
- Issue date Jun 21, 2005
- Nikon Corporation
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment-mark detection methods and devices for charged-particle-b...
- Patent number 6,841,402
- Issue date Jan 11, 2005
- Nikon Corporation
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for detecting and correcting reticle deformat...
- Patent number 6,835,511
- Issue date Dec 28, 2004
- Nikon Corporation
- Noriyuki Hirayanagi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Alignment-mark patterns defined on a stencil reticle and detectable...
- Patent number 6,750,464
- Issue date Jun 15, 2004
- Nikon Corporation
- Jin Udagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam microlithography apparatus and methods includ...
- Patent number 6,657,207
- Issue date Dec 2, 2003
- Nikon Corporation
- Shintaro Kawata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fiducial mark bodies for charged-particle-beam (CPB) microlithograp...
- Patent number 6,632,722
- Issue date Oct 14, 2003
- Nikon Corporation
- Tomoharu Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and devices for calibrating a charged-particle-beam microli...
- Patent number 6,627,903
- Issue date Sep 30, 2003
- Nikon Corporation
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of exposure in charged-particle-beam microlithography based...
- Patent number 6,627,906
- Issue date Sep 30, 2003
- Nikon Corporation
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam mask-based exposure apparatus employing a var...
- Patent number 6,627,905
- Issue date Sep 30, 2003
- Nikon Corporation
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chucking device and methods for holding microlithogra...
- Patent number 6,522,519
- Issue date Feb 18, 2003
- Nikon Corporation
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment marks for charged-particle-beam microlithography, and ali...
- Patent number 6,521,900
- Issue date Feb 18, 2003
- Nikon Corporation
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam microlithography methods including chip-expos...
- Patent number 6,447,964
- Issue date Sep 10, 2002
- Nikon Corporation
- Teruaki Okino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electrostatic reticle chucks, charged-particle-beam microlithograph...
- Patent number 6,433,346
- Issue date Aug 13, 2002
- Nikon Corporation
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fiducial mark bodies for charged-particle-beam (CPB) microlithograp...
- Patent number 6,429,090
- Issue date Aug 6, 2002
- Nikon Corporation
- Tomoharu Fujiwara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Backscattered-electron detection systems and associated methods
- Patent number 6,399,945
- Issue date Jun 4, 2002
- Nikon Corporation
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection-microlithography apparatus, masks, and related methods i...
- Patent number 6,204,509
- Issue date Mar 20, 2001
- Nikon Corporation
- Takehisa Yahiro
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection-microlithography mask with separate mask substrates
- Patent number 6,180,289
- Issue date Jan 30, 2001
- Nikon Corporation
- Noriyuki Hirayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection-microlithography alignment method utilizing mask with se...
- Patent number 6,171,736
- Issue date Jan 9, 2001
- Nikon Corporation
- Noriyuki Hirayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for detecting or collecting secondary electrons, charged-...
- Patent number 5,981,947
- Issue date Nov 9, 1999
- Nikon Corporation
- Mamoru Nakasuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask holder for microlithography exposure
- Patent number 5,847,813
- Issue date Dec 8, 1998
- Nikon Corporation
- Noriyuki Hirayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE CONVEYOR APPARATUS, SUBSTRATE CONVEYANCE METHOD AND EXPOS...
- Publication number 20090219504
- Publication date Sep 3, 2009
- NIKON CORPORATION
- Noriyuki Hirayanagi
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF MEASURING THE POSITION OF A MASK SURFACE ALONG THE HEIGHT...
- Publication number 20090015810
- Publication date Jan 15, 2009
- NIKON CORPORATION
- Noriyuki Hirayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20080225261
- Publication date Sep 18, 2008
- Noriyuki Hirayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle holding member, reticle stage, exposure apparatus, projecti...
- Publication number 20080024751
- Publication date Jan 31, 2008
- NIKON CORPORATION
- Noriyuki Hirayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask and exposure apparatus
- Publication number 20070190433
- Publication date Aug 16, 2007
- Noriyuki Hirayanagi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination-sensor calibration methods, and exposure methods and a...
- Publication number 20060290916
- Publication date Dec 28, 2006
- NIKON CORPORATION
- Hajime Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Microlithography reticles including high-contrast reticle-identific...
- Publication number 20040126673
- Publication date Jul 1, 2004
- NIKON CORPORATION
- Jin Udagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and devices for detecting a distribution of charged-particl...
- Publication number 20030111618
- Publication date Jun 19, 2003
- NIKON CORPORATION
- Jin Udagawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Beam-calibration methods for charged-particle-beam microlithography...
- Publication number 20030089863
- Publication date May 15, 2003
- NIKON CORPORATION
- Noriyuki Hirayanagi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus and methods for mask/substrate alignment in charged-parti...
- Publication number 20030057381
- Publication date Mar 27, 2003
- Noriyuki Hirayanagi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Optically detectable alignment marks producing an enhanced signal-a...
- Publication number 20030010936
- Publication date Jan 16, 2003
- NIKON CORPORATION
- Jin Udagawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Methods and apparatus for detecting and correcting reticle deformat...
- Publication number 20020192598
- Publication date Dec 19, 2002
- NIKON CORPORATION
- Noriyuki Hirayanagi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Control of exposure in charged-particle-beam microlithography based...
- Publication number 20020153496
- Publication date Oct 24, 2002
- NIKON CORPORATION
- Noriyuki Hirayanagi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reticle chucks and methods for holding a lithographic reticle utili...
- Publication number 20020145714
- Publication date Oct 10, 2002
- NIKON CORPORATION
- Noriyuki Hirayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment-mark patterns defined on a stencil reticle and detectable...
- Publication number 20020079467
- Publication date Jun 27, 2002
- NIKON CORPORATION
- Jin Udagawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Fiducial mark bodies for charged-particle-beam (CPB) microlithograp...
- Publication number 20020081815
- Publication date Jun 27, 2002
- NIKON CORPORATION
- Tomoharu Fujiwara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle-beam microlithography apparatus and methods includ...
- Publication number 20010052579
- Publication date Dec 20, 2001
- Shintaro Kawata
- B82 - NANO-TECHNOLOGY
Information Patent Application
Divided reticles for charged-particle-beam microlithography apparat...
- Publication number 20010046631
- Publication date Nov 29, 2001
- NIKON CORPORATION
- Tomoharu Fujiwara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle-beam microlithography methods including chip-expos...
- Publication number 20010031407
- Publication date Oct 18, 2001
- Teruaki Okino
- B82 - NANO-TECHNOLOGY
Information Patent Application
Wafer chucks allowing controlled reduction of substrate heating and...
- Publication number 20010016302
- Publication date Aug 23, 2001
- NIKON CORPORATION
- Noriyuki Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS

Noriyuki Hirayanagi

Person

Patents Grantslast 30 patents

Method of measuring the position of a mask surface along the height...

Illumination-sensor calibration methods, and exposure methods and a...

Mask and exposure apparatus

Substrate conveyor apparatus, substrate conveyance method and expos...

Method of measuring the position of a mask surface along the height...

Apparatus and methods for mask/substrate alignment in charged-parti...

Divided reticles for charged-particle-beam microlithography apparat...

Reticle chambers and reticle cassettes providing temperature contro...

Alignment-mark detection methods and devices for charged-particle-b...

Methods and apparatus for detecting and correcting reticle deformat...

Alignment-mark patterns defined on a stencil reticle and detectable...

Charged-particle-beam microlithography apparatus and methods includ...

Fiducial mark bodies for charged-particle-beam (CPB) microlithograp...

Methods and devices for calibrating a charged-particle-beam microli...

Control of exposure in charged-particle-beam microlithography based...

Charged-particle-beam mask-based exposure apparatus employing a var...

Electrostatic chucking device and methods for holding microlithogra...

Alignment marks for charged-particle-beam microlithography, and ali...

Charged-particle-beam microlithography methods including chip-expos...

Electrostatic reticle chucks, charged-particle-beam microlithograph...

Fiducial mark bodies for charged-particle-beam (CPB) microlithograp...

Backscattered-electron detection systems and associated methods

Projection-microlithography apparatus, masks, and related methods i...

Projection-microlithography mask with separate mask substrates

Projection-microlithography alignment method utilizing mask with se...

Apparatus for detecting or collecting secondary electrons, charged-...

Mask holder for microlithography exposure

Patents Applicationslast 30 patents

SUBSTRATE CONVEYOR APPARATUS, SUBSTRATE CONVEYANCE METHOD AND EXPOS...

METHOD OF MEASURING THE POSITION OF A MASK SURFACE ALONG THE HEIGHT...

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Reticle holding member, reticle stage, exposure apparatus, projecti...

Mask and exposure apparatus

Illumination-sensor calibration methods, and exposure methods and a...

Microlithography reticles including high-contrast reticle-identific...

Methods and devices for detecting a distribution of charged-particl...

Beam-calibration methods for charged-particle-beam microlithography...

Apparatus and methods for mask/substrate alignment in charged-parti...

Optically detectable alignment marks producing an enhanced signal-a...

Methods and apparatus for detecting and correcting reticle deformat...

Control of exposure in charged-particle-beam microlithography based...

Reticle chucks and methods for holding a lithographic reticle utili...

Alignment-mark patterns defined on a stencil reticle and detectable...

Fiducial mark bodies for charged-particle-beam (CPB) microlithograp...

Charged-particle-beam microlithography apparatus and methods includ...

Divided reticles for charged-particle-beam microlithography apparat...

Charged-particle-beam microlithography methods including chip-expos...

Wafer chucks allowing controlled reduction of substrate heating and...