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Noriyuki Kawai
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Tokyo, JP
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last 30 patents
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Patent Grant
Photomask material and method of processing thereof
Patent number
6,312,857
Issue date
Nov 6, 2001
Mitsubishi Paper Mills Ltd.
Kunihiro Nakagawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Photomask material, photomask and methods for the production thereof
Patent number
6,303,262
Issue date
Oct 16, 2001
Mitsubishi Paper Mills Ltd.
Kazuchiyo Takaoka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY