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Ion implanting apparatus
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Patent number 5,349,196
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Issue date Sep 20, 1994
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Hitachi, Ltd.
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Kensuke Amemiya
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H01 - BASIC ELECTRIC ELEMENTS
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-
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Microwave ion source
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Patent number 5,053,678
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Issue date Oct 1, 1991
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Hitachi, Ltd.
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Hidemi Koike
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H01 - BASIC ELECTRIC ELEMENTS
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Charged particle source
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Patent number 4,924,101
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Issue date May 8, 1990
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Hitachi, Ltd.
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Noriyuki Sakudo
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H01 - BASIC ELECTRIC ELEMENTS
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Ion source
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Patent number 4,658,143
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Issue date Apr 14, 1987
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Hitachi, Ltd.
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Katsumi Tokiguchi
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H01 - BASIC ELECTRIC ELEMENTS
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Ion implanter
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Patent number 4,633,138
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Issue date Dec 30, 1986
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Hitachi, Ltd.
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Katsumi Tokiguchi
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G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
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Plasma ion source
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Patent number 4,629,930
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Issue date Dec 16, 1986
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Hitachi, Ltd.
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Noriyuki Sakudo
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H01 - BASIC ELECTRIC ELEMENTS
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Microwave plasma source
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Patent number 4,433,228
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Issue date Feb 21, 1984
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Hitachi, Ltd.
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Shigeru Nishimatsu
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H01 - BASIC ELECTRIC ELEMENTS
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Microwave plasma ion source
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Patent number 4,393,333
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Issue date Jul 12, 1983
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Hitachi, Ltd.
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Noriyuki Sakudo
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H01 - BASIC ELECTRIC ELEMENTS
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Microwave plasma ion source
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Patent number 4,316,090
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Issue date Feb 16, 1982
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Hitachi, Ltd.
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Noriyuki Sakudo
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma etching apparatus
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Patent number 4,101,411
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Issue date Jul 18, 1978
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Hitachi, Ltd.
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Keizo Suzuki
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H01 - BASIC ELECTRIC ELEMENTS