NORMAN TAM

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Thermal chamber with improved thermal uniformity
- Patent number 11,978,646
- Issue date May 7, 2024
- Applied Materials, Inc.
- Dongming Iu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods, systems, and apparatus for conducting a radical treatment...
- Patent number 11,901,195
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Pradeep Sampath Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Catalyst enhanced molybdenum deposition and gap fill
- Patent number 11,859,277
- Issue date Jan 2, 2024
- Applied Materials, Inc.
- Xi Cen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for radical and thermal processing of substrates
- Patent number 11,823,901
- Issue date Nov 21, 2023
- Applied Materials Inc.
- Xinming Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for radical and thermal processing of substrates
- Patent number 11,587,789
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Xinming Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-enhanced anneal chamber for wafer outgassing
- Patent number 11,348,769
- Issue date May 31, 2022
- Applied Materials, Inc.
- Lara Hawrylchak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal processing chamber with low temperature control
- Patent number 10,948,353
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Lara Hawrylchak
- G01 - MEASURING TESTING
Information Patent Grant
Plasma-enhanced anneal chamber for wafer outgassing
- Patent number 10,770,272
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Lara Hawrylchak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal cooling member with low temperature control
- Patent number 10,571,337
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Lara Hawrylchak
- G05 - CONTROLLING REGULATING
Information Patent Grant
Support ring with masked edge
- Patent number 10,373,859
- Issue date Aug 6, 2019
- Applied Materials, Inc.
- Mehran Behdjat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Support cylinder for thermal processing chamber
- Patent number 10,128,144
- Issue date Nov 13, 2018
- Applied Materials, Inc.
- Mehran Behdjat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Visual feedback for process control in RTP chambers
- Patent number 10,109,514
- Issue date Oct 23, 2018
- Applied Materials, Inc.
- Kim Vellore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support ring with masked edge
- Patent number 10,056,286
- Issue date Aug 21, 2018
- Applied Materials, Inc.
- Mehran Behdjat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Support ring with masked edge
- Patent number 9,842,759
- Issue date Dec 12, 2017
- Applied Materials, Inc.
- Mehran Behdjat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Visual feedback for process control in RTP chambers
- Patent number 9,735,034
- Issue date Aug 15, 2017
- Applied Materials, Inc.
- Kim Vellore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support cylinder for thermal processing chamber
- Patent number 9,659,809
- Issue date May 23, 2017
- Applied Materials, Inc.
- Mehran Behdjat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for improved control of heating and cooling of...
- Patent number 9,552,989
- Issue date Jan 24, 2017
- Applied Materials, Inc.
- Blake R. Koelmel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for reducing the effect of contamination on a rapid therm...
- Patent number 9,514,969
- Issue date Dec 6, 2016
- Applied Materials, Inc.
- Aaron Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support cylinder for thermal processing chamber
- Patent number 9,385,004
- Issue date Jul 5, 2016
- Applied Materials, Inc.
- Mehran Behdjat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support ring with masked edge
- Patent number 9,330,955
- Issue date May 3, 2016
- Applied Materials, Inc.
- Mehran Behdjat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving oxide growth rate of selective oxidation processes
- Patent number 9,117,661
- Issue date Aug 25, 2015
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal reactor with improved gas flow distribution
- Patent number 8,888,916
- Issue date Nov 18, 2014
- Applied Materials, Inc.
- Ming-Kuei (Michael) Tseng
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Thermal reactor with improved gas flow distribution
- Patent number 8,608,853
- Issue date Dec 17, 2013
- Applied Materials, Inc.
- Ming-Kuei (Michael) Tseng
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Apparatus and method for improved control of heating and cooling of...
- Patent number 8,548,311
- Issue date Oct 1, 2013
- Applied Materials, Inc.
- Blake R. Koelmel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving oxide growth rate of selective oxidation processes
- Patent number 8,546,271
- Issue date Oct 1, 2013
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for oxidation of a semiconductor device
- Patent number 8,207,044
- Issue date Jun 26, 2012
- Applied Materials, Inc.
- Rajesh Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal reactor with improved gas flow distribution
- Patent number 8,056,500
- Issue date Nov 15, 2011
- Applied Materials, Inc.
- Ming-Kuei (Michael) Tseng
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Method of improving oxide growth rate of selective oxidation processes
- Patent number 7,951,728
- Issue date May 31, 2011
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for oxidation of a semiconductor device
- Patent number 7,947,561
- Issue date May 24, 2011
- Applied Materials, Inc.
- Rajesh Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lamp array for thermal processing exhibiting improved radial unifor...
- Patent number 7,509,035
- Issue date Mar 24, 2009
- Applied Materials, Inc.
- Joseph M. Ranish
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...
- Publication number 20240290585
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A RADICAL TREATMENT...
- Publication number 20240178004
- Publication date May 30, 2024
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES
- Publication number 20240087889
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT METHODS FOR SILICON NANOSHEET SURFACES
- Publication number 20240055265
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A RADICAL TREATMENT...
- Publication number 20230128128
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Catalyst Enhanced Molybdenum Deposition And Gap Fill
- Publication number 20220372617
- Publication date Nov 24, 2022
- Applied Materials, Inc.
- Xi Cen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED OXIDATION WITH HYDROGEN RADICAL PRETREATMENT
- Publication number 20220298620
- Publication date Sep 22, 2022
- Applied Materias, Inc.
- Matthew Spuller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS, METHODS, AND SYSTEMS OF USING HYDROGEN RADICALS FOR THER...
- Publication number 20220251708
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- Xinming ZHANG
- B08 - CLEANING
Information Patent Application
Treatment methods for titanium nitride films
- Publication number 20220108914
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES
- Publication number 20210280428
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES
- Publication number 20210280418
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING
- Publication number 20200402780
- Publication date Dec 24, 2020
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESSING CHAMBER WITH LOW TEMPERATURE CONTROL
- Publication number 20200149968
- Publication date May 14, 2020
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
THERMAL PROCESSING CHAMBER WITH LOW TEMPERATURE CONTROL
- Publication number 20180340832
- Publication date Nov 29, 2018
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- G01 - MEASURING TESTING
Information Patent Application
THERMAL CHAMBER WITH IMPROVED THERMAL UNIFORMITY
- Publication number 20180337075
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Dongming IU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPPORT RING WITH MASKED EDGE
- Publication number 20180315639
- Publication date Nov 1, 2018
- Applied Materials, Inc.
- Mehran BEHDJAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPPORT RING WITH MASKED EDGE
- Publication number 20180102274
- Publication date Apr 12, 2018
- Applied Materials, Inc.
- Mehran BEHDJAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VISUAL FEEDBACK FOR PROCESS CONTROL IN RTP CHAMBERS
- Publication number 20170345693
- Publication date Nov 30, 2017
- Applied Materials, Inc.
- Kim VELLORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING
- Publication number 20170294292
- Publication date Oct 12, 2017
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT CYLINDER FOR THERMAL PROCESSING CYLINDER
- Publication number 20170263493
- Publication date Sep 14, 2017
- Applied Materials, Inc.
- Mehran BEHDJAT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR DECREASING SUBSTRATE TEMPERATURE NON-UNIFORMITY
- Publication number 20160358789
- Publication date Dec 8, 2016
- Applied Materials, Inc.
- Aaron MILLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT CYLINDER FOR THERMAL PROCESSING CHAMBER
- Publication number 20160300752
- Publication date Oct 13, 2016
- Applied Materials, Inc.
- Mehran BEHDJAT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT RING WITH MASKED EDGE
- Publication number 20160247708
- Publication date Aug 25, 2016
- Applied Materials, Inc.
- Mehran BEHDJAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPPORT RING WITH MASKED EDGE
- Publication number 20150187630
- Publication date Jul 2, 2015
- Applied Materials, Inc.
- Mehran BEHDJAT
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
APPARATUS FOR REDUCING THE EFFECT OF CONTAMINATION ON A RAPID THERM...
- Publication number 20150155190
- Publication date Jun 4, 2015
- Applied Materials, Inc.
- Aaron MILLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE RTP CONTROL USING IR CAMERA
- Publication number 20150131698
- Publication date May 14, 2015
- Applied Materials, Inc.
- Kim VELLORE
- G01 - MEASURING TESTING
Information Patent Application
SUPPORT CYLINDER FOR THERMAL PROCESSING CHAMBER
- Publication number 20150050819
- Publication date Feb 19, 2015
- Applied Materials, Inc.
- Mehran BEHDJAT
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
VISUAL FEEDBACK FOR PROCESS CONTROL IN RTP CHAMBERS
- Publication number 20150041453
- Publication date Feb 12, 2015
- Applied Materials, Inc.
- Kim VELLORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION
- Publication number 20140079376
- Publication date Mar 20, 2014
- Applied Materials, Inc.
- Ming-Kuei (Michael) TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IMPROVING OXIDE GROWTH RATE OF SELECTIVE OXIDATION PROCESSES
- Publication number 20140057455
- Publication date Feb 27, 2014
- Applied Materials, Inc.
- Yoshitaka YOKOTA
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Thermal chamber with improved thermal uniformity

Methods, systems, and apparatus for conducting a radical treatment...

Catalyst enhanced molybdenum deposition and gap fill

System and method for radical and thermal processing of substrates

System and method for radical and thermal processing of substrates

Plasma-enhanced anneal chamber for wafer outgassing

Thermal processing chamber with low temperature control

Plasma-enhanced anneal chamber for wafer outgassing

Thermal cooling member with low temperature control

Support ring with masked edge

Support cylinder for thermal processing chamber

Visual feedback for process control in RTP chambers

Support ring with masked edge

Support ring with masked edge

Visual feedback for process control in RTP chambers

Support cylinder for thermal processing chamber

Apparatus and method for improved control of heating and cooling of...

Apparatus for reducing the effect of contamination on a rapid therm...

Support cylinder for thermal processing chamber

Support ring with masked edge

Method of improving oxide growth rate of selective oxidation processes

Thermal reactor with improved gas flow distribution

Thermal reactor with improved gas flow distribution

Apparatus and method for improved control of heating and cooling of...

Method of improving oxide growth rate of selective oxidation processes

Methods for oxidation of a semiconductor device

Thermal reactor with improved gas flow distribution

Method of improving oxide growth rate of selective oxidation processes

Methods for oxidation of a semiconductor device

Lamp array for thermal processing exhibiting improved radial unifor...

Patents Applicationslast 30 patents

HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...

METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A RADICAL TREATMENT...

SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES

TREATMENT METHODS FOR SILICON NANOSHEET SURFACES

METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A RADICAL TREATMENT...

Catalyst Enhanced Molybdenum Deposition And Gap Fill

ENHANCED OXIDATION WITH HYDROGEN RADICAL PRETREATMENT

APPARATUS, METHODS, AND SYSTEMS OF USING HYDROGEN RADICALS FOR THER...

Treatment methods for titanium nitride films

SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES

SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES

PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING

THERMAL PROCESSING CHAMBER WITH LOW TEMPERATURE CONTROL

THERMAL PROCESSING CHAMBER WITH LOW TEMPERATURE CONTROL

THERMAL CHAMBER WITH IMPROVED THERMAL UNIFORMITY

SUPPORT RING WITH MASKED EDGE

SUPPORT RING WITH MASKED EDGE

VISUAL FEEDBACK FOR PROCESS CONTROL IN RTP CHAMBERS

PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING

SUPPORT CYLINDER FOR THERMAL PROCESSING CYLINDER

APPARATUS FOR DECREASING SUBSTRATE TEMPERATURE NON-UNIFORMITY

SUPPORT CYLINDER FOR THERMAL PROCESSING CHAMBER

SUPPORT RING WITH MASKED EDGE

SUPPORT RING WITH MASKED EDGE

APPARATUS FOR REDUCING THE EFFECT OF CONTAMINATION ON A RAPID THERM...

LOW TEMPERATURE RTP CONTROL USING IR CAMERA

SUPPORT CYLINDER FOR THERMAL PROCESSING CHAMBER

VISUAL FEEDBACK FOR PROCESS CONTROL IN RTP CHAMBERS

THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION

METHOD OF IMPROVING OXIDE GROWTH RATE OF SELECTIVE OXIDATION PROCESSES