Ode Hiroyuki

Person

Higashihiroshima, JP

People

Patents Grantslast 30 patents

Information Patent Grant
High work function, manufacturable top electrode
- Patent number 9,224,878
- Issue date Dec 29, 2015
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adsorption site blocking method for co-doping ALD films
- Patent number 9,178,010
- Issue date Nov 3, 2015
- Intermolecular, Inc.
- Sandra Malhotra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 9,129,850
- Issue date Sep 8, 2015
- PS4 Luxco S.A.R.L.
- Hiroyuki Ode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reproducible flash layer deposition
- Patent number 9,105,646
- Issue date Aug 11, 2015
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reproducible flash layer deposition
- Patent number 9,012,298
- Issue date Apr 21, 2015
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molybdenum oxide top electrode for DRAM capacitors
- Patent number 8,975,633
- Issue date Mar 10, 2015
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,912,628
- Issue date Dec 16, 2014
- PS4 Luxco S.A.R.L.
- Hiroyuki Ode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etch and clean chemistries for MoOx
- Patent number 8,906,812
- Issue date Dec 9, 2014
- Intermolecular, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Band gap improvement in DRAM capacitors
- Patent number 8,878,269
- Issue date Nov 4, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single-sided non-noble metal electrode hybrid MIM stack for DRAM de...
- Patent number 8,853,049
- Issue date Oct 7, 2014
- Intermolecular, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High work function, manufacturable top electrode
- Patent number 8,847,397
- Issue date Sep 30, 2014
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature ALD process of metal oxide for DRAM applications
- Patent number 8,835,273
- Issue date Sep 16, 2014
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating a DRAM capacitor
- Patent number 8,836,002
- Issue date Sep 16, 2014
- Intermolecular, Inc.
- Karthik Ramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature ALD process for metal oxide for DRAM applications
- Patent number 8,829,647
- Issue date Sep 9, 2014
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating a DRAM capacitor
- Patent number 8,828,836
- Issue date Sep 9, 2014
- Intermolecular, Inc.
- Karthik Ramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to improve leakage for ZrO2 based high K MIM capacitor
- Patent number 8,815,695
- Issue date Aug 26, 2014
- Intermolecular, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a DRAM capacitor
- Patent number 8,813,325
- Issue date Aug 26, 2014
- Intermolecular, Inc.
- Karthik Ramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing MIM capacitors to reduce leakage current
- Patent number 8,815,677
- Issue date Aug 26, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices with covering layer and filler
- Patent number 8,779,607
- Issue date Jul 15, 2014
- PS4 Luxco S.A.R.L.
- Hiroyuki Ode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Band gap improvement in DRAM capacitors
- Patent number 8,772,123
- Issue date Jul 8, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molybdenum oxide top electrode for DRAM capacitors
- Patent number 8,765,569
- Issue date Jul 1, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturable high-k DRAM MIM capacitor structure
- Patent number 8,765,570
- Issue date Jul 1, 2014
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,748,325
- Issue date Jun 10, 2014
- Mitsuhiro Horikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Interfacial layer for DRAM capacitor
- Patent number 8,722,504
- Issue date May 13, 2014
- Intermolecular, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturable high-k DRAM MIM capacitor structure
- Patent number 8,679,939
- Issue date Mar 25, 2014
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration of non-noble DRAM electrode
- Patent number 8,652,927
- Issue date Feb 18, 2014
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced non-noble electrode layers for DRAM capacitor cell
- Patent number 8,647,943
- Issue date Feb 11, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anneal to minimize leakage current in DRAM capacitor
- Patent number 8,647,960
- Issue date Feb 11, 2014
- Intermolecular, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,609,469
- Issue date Dec 17, 2013
- Elpida Memory, Inc.
- Hiroyuki Ode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced non-noble electrode layers for DRAM capacitor cell
- Patent number 8,581,318
- Issue date Nov 12, 2013
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20150072501
- Publication date Mar 12, 2015
- PS4 LUXCO S.A.R.L.
- Hiroyuki ODE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Reproducible Flash Layer Deposition
- Publication number 20140187018
- Publication date Jul 3, 2014
- Elpida Memory, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Work Function, Manufacturable Top Electrode
- Publication number 20140187016
- Publication date Jul 3, 2014
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Work Function, Manufacturable Top Electrode
- Publication number 20140183697
- Publication date Jul 3, 2014
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods to Improve Leakage for ZrO2 Based High K MIM Capacitor
- Publication number 20140187015
- Publication date Jul 3, 2014
- Elpida Memory, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Reproducible Flash Layer Deposition
- Publication number 20140183695
- Publication date Jul 3, 2014
- Elpida Memory, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods to Improve Leakage for ZrO2 Based High K MIM Capacitor
- Publication number 20140183696
- Publication date Jul 3, 2014
- INTERMOLECULAR INC.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20140087518
- Publication date Mar 27, 2014
- Elpida Memory, Inc.
- Hiroyuki ODE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Temperature ALD Process of Metal Oxide for DRAM Applications
- Publication number 20140080284
- Publication date Mar 20, 2014
- Elpida Memory, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Temperature ALD Process for Metal Oxide for DRAM Applications
- Publication number 20140077337
- Publication date Mar 20, 2014
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20140038424
- Publication date Feb 6, 2014
- Elpida Memory, Inc.
- Mitsuhiro HORIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURABLE HIGH-K DRAM MIM CAPACITOR STRUCTURE
- Publication number 20130330903
- Publication date Dec 12, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturable High-k dram mim capacitor structure
- Publication number 20130328168
- Publication date Dec 12, 2013
- INTERMOLECULAR INC.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED NON-NOBLE ELECTRODE LAYERS FOR DRAM CAPACITOR CELL
- Publication number 20130330902
- Publication date Dec 12, 2013
- Elpida Memory, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integration of Non-Noble DRAM Electrode
- Publication number 20130320495
- Publication date Dec 5, 2013
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPED ELECTRODES FOR DRAM APPLICATIONS
- Publication number 20130270673
- Publication date Oct 17, 2013
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR
- Publication number 20130217202
- Publication date Aug 22, 2013
- Elpida Memory, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Fabricating a DRAM Capacitor
- Publication number 20130161789
- Publication date Jun 27, 2013
- Intermolecular, Inc.
- Karthik Ramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Fabricating a DRAM Capacitor
- Publication number 20130154057
- Publication date Jun 20, 2013
- Elpida Memory, Inc.
- Karthik Ramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20130147013
- Publication date Jun 13, 2013
- Elpida Memory, Inc.
- Hiroyuki ODE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LEAKAGE REDUCTION IN DRAM MIM CAPACITORS
- Publication number 20130143379
- Publication date Jun 6, 2013
- Elpida Memory, Inc.
- Sandra Malholtra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Performance Dielectric Stack for DRAM Capacitor
- Publication number 20130140619
- Publication date Jun 6, 2013
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for ALD Deposition Rate Enhancement
- Publication number 20130140675
- Publication date Jun 6, 2013
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING AN ALD MATERIAL
- Publication number 20130143383
- Publication date Jun 6, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR
- Publication number 20130143384
- Publication date Jun 6, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Band Gap Improvement In DRAM Capacitors
- Publication number 20130127015
- Publication date May 23, 2013
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOP ELECTRODE TEMPLATING FOR DRAM CAPACITOR
- Publication number 20130122681
- Publication date May 16, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNEAL TO MINIMIZE LEAKAGE CURRENT IN DRAM CAPACITOR
- Publication number 20130122682
- Publication date May 16, 2013
- Elpida Memory, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Top Electrode Templating for DRAM Capacitor
- Publication number 20130119512
- Publication date May 16, 2013
- Elpida Memory, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A DRAM CAPACITOR HAVING INCREASED THERMAL AN...
- Publication number 20130119515
- Publication date May 16, 2013
- INTERMOLECULAR INC.
- Karthik Ramani
- H01 - BASIC ELECTRIC ELEMENTS

Ode Hiroyuki

Person

Patents Grantslast 30 patents

High work function, manufacturable top electrode

Adsorption site blocking method for co-doping ALD films

Semiconductor device manufacturing method

Methods for reproducible flash layer deposition

Methods for reproducible flash layer deposition

Molybdenum oxide top electrode for DRAM capacitors

Semiconductor device and method for manufacturing the same

Wet etch and clean chemistries for MoOx

Band gap improvement in DRAM capacitors

Single-sided non-noble metal electrode hybrid MIM stack for DRAM de...

High work function, manufacturable top electrode

High temperature ALD process of metal oxide for DRAM applications

Method for fabricating a DRAM capacitor

High temperature ALD process for metal oxide for DRAM applications

Method for fabricating a DRAM capacitor

Methods to improve leakage for ZrO2 based high K MIM capacitor

Method for fabricating a DRAM capacitor

Method of processing MIM capacitors to reduce leakage current

Devices with covering layer and filler

Band gap improvement in DRAM capacitors

Molybdenum oxide top electrode for DRAM capacitors

Manufacturable high-k DRAM MIM capacitor structure

Method of manufacturing semiconductor device

Interfacial layer for DRAM capacitor

Manufacturable high-k DRAM MIM capacitor structure

Integration of non-noble DRAM electrode

Enhanced non-noble electrode layers for DRAM capacitor cell

Anneal to minimize leakage current in DRAM capacitor

Method of manufacturing semiconductor device

Enhanced non-noble electrode layers for DRAM capacitor cell

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Methods for Reproducible Flash Layer Deposition

High Work Function, Manufacturable Top Electrode

High Work Function, Manufacturable Top Electrode

Methods to Improve Leakage for ZrO2 Based High K MIM Capacitor

Methods for Reproducible Flash Layer Deposition

Methods to Improve Leakage for ZrO2 Based High K MIM Capacitor

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

High Temperature ALD Process of Metal Oxide for DRAM Applications

High Temperature ALD Process for Metal Oxide for DRAM Applications

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

MANUFACTURABLE HIGH-K DRAM MIM CAPACITOR STRUCTURE

Manufacturable High-k dram mim capacitor structure

ENHANCED NON-NOBLE ELECTRODE LAYERS FOR DRAM CAPACITOR CELL

Integration of Non-Noble DRAM Electrode

DOPED ELECTRODES FOR DRAM APPLICATIONS

HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR

Method for Fabricating a DRAM Capacitor

Method for Fabricating a DRAM Capacitor

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

LEAKAGE REDUCTION IN DRAM MIM CAPACITORS

High Performance Dielectric Stack for DRAM Capacitor

Method for ALD Deposition Rate Enhancement

METHOD OF FORMING AN ALD MATERIAL

HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR

Band Gap Improvement In DRAM Capacitors

TOP ELECTRODE TEMPLATING FOR DRAM CAPACITOR

ANNEAL TO MINIMIZE LEAKAGE CURRENT IN DRAM CAPACITOR

Top Electrode Templating for DRAM Capacitor

METHOD FOR FABRICATING A DRAM CAPACITOR HAVING INCREASED THERMAL AN...