Oktay Yildirim

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for adjusting a target feature in a model of a patterning pr...
- Patent number 11,619,884
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic patterning process and resists to use therein
- Patent number 11,415,886
- Issue date Aug 16, 2022
- ASML Netherlands B.V.
- Sander Frederik Wuister
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic patterning process and resists to use therein
- Patent number 10,416,555
- Issue date Sep 17, 2019
- ASML Netherlands B.V.
- Sander Frederik Wuister
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of providing patterned chemical epitaxy templates for self-...
- Patent number 9,235,125
- Issue date Jan 12, 2016
- ASML Netherlands B.V.
- Emiel Peeters
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...
- Publication number 20230244151
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...
- Publication number 20220050387
- Publication date Feb 17, 2022
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Patterning Process and Resists to Use Therein
- Publication number 20190339615
- Publication date Nov 7, 2019
- ASML NETHERLANDS B.V.
- Sander Frederik WUISTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Patterning Process and Resists to Use Therein
- Publication number 20180004085
- Publication date Jan 4, 2018
- ASML NETHERLANDS B.V.
- Sander Frederik WUISTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF PROVIDING PATTERNED CHEMICAL EPITAXY TEMPLATES FOR SELF-...
- Publication number 20150010869
- Publication date Jan 8, 2015
- ASML NETHERLANDS B.V.
- Emiel Peeters
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Apparatus for Inspection Of Articles, EUV Lithography R...
- Publication number 20120182538
- Publication date Jul 19, 2012
- ASML NETHERLANDS B.V.
- Roelof Koole
- G01 - MEASURING TESTING

Oktay Yildirim

Person

Patents Grantslast 30 patents

Method for adjusting a target feature in a model of a patterning pr...

Lithographic patterning process and resists to use therein

Lithographic patterning process and resists to use therein

Methods of providing patterned chemical epitaxy templates for self-...

Patents Applicationslast 30 patents

METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...

METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...

Lithographic Patterning Process and Resists to Use Therein

Lithographic Patterning Process and Resists to Use Therein

METHODS OF PROVIDING PATTERNED CHEMICAL EPITAXY TEMPLATES FOR SELF-...

Methods and Apparatus for Inspection Of Articles, EUV Lithography R...