Olaf Conradi

Person

Westhausen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Microlithography projection objective
- Patent number 10,281,824
- Issue date May 7, 2019
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Method of operating a projection exposure tool for microlithography
- Patent number 10,241,423
- Issue date Mar 26, 2019
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system and method of use
- Patent number 9,823,579
- Issue date Nov 21, 2017
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting an illumination setting
- Patent number 9,690,203
- Issue date Jun 27, 2017
- Carl Zeiss SMT GmbH
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element for EUV lithography and method of manufa...
- Patent number 9,606,446
- Issue date Mar 28, 2017
- Carl Zeiss SMT GmbH
- Norbert Wabra
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for improving the imaging properties of a projection objecti...
- Patent number 9,581,813
- Issue date Feb 28, 2017
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating a projection exposure tool for microlithography
- Patent number 9,442,381
- Issue date Sep 13, 2016
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor microlithography projection exposure apparatus
- Patent number 9,366,977
- Issue date Jun 14, 2016
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Projection exposure system and projection exposure method
- Patent number 9,146,475
- Issue date Sep 29, 2015
- Carl Zeiss SMT GmbH
- Paul Gräupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithography projection objective
- Patent number 9,097,984
- Issue date Aug 4, 2015
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Method for improving the imaging properties of a projection objecti...
- Patent number 9,069,263
- Issue date Jun 30, 2015
- Carl Zeiss SMT GmbH
- Olaf Conradi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Optical system and method of use
- Patent number 8,947,633
- Issue date Feb 3, 2015
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus with correction opt...
- Patent number 8,773,638
- Issue date Jul 8, 2014
- Carl Zeiss SMT GmbH
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system and method of use
- Patent number 8,462,315
- Issue date Jun 11, 2013
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for correcting image changes
- Patent number 8,325,323
- Issue date Dec 4, 2012
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 7,990,622
- Issue date Aug 2, 2011
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G02 - OPTICS
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 7,830,611
- Issue date Nov 9, 2010
- Carl Zeiss SMT AG
- Olaf Conradi
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus and method for operating the same
- Patent number 7,808,615
- Issue date Oct 5, 2010
- Carl Zeiss SMT AG
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Method for improving the imaging properties of a projection objecti...
- Patent number 7,777,963
- Issue date Aug 17, 2010
- Carl Zeiss SMT AG
- Olaf Conradi
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20170192362
- Publication date Jul 6, 2017
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY
- Publication number 20160342097
- Publication date Nov 24, 2016
- Carl Zeiss SMT GMBH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Optical Element for EUV Lithography and Method of Manufa...
- Publication number 20150316851
- Publication date Nov 5, 2015
- Carl Zeiss SMT GMBH
- Norbert WABRA
- G02 - OPTICS
Information Patent Application
METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTI...
- Publication number 20150293352
- Publication date Oct 15, 2015
- Carl Zeiss SMT GMBH
- Olaf Conradi
- G02 - OPTICS
Information Patent Application
METHOD FOR ADJUSTING AN ILLUMINATION SETTING
- Publication number 20150153652
- Publication date Jun 4, 2015
- Carl Zeiss SMT GMBH
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND METHOD OF USE
- Publication number 20150125968
- Publication date May 7, 2015
- Carl Zeiss SMT GMBH
- Olaf Conradi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140333913
- Publication date Nov 13, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140293256
- Publication date Oct 2, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY
- Publication number 20130301024
- Publication date Nov 14, 2013
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND METHOD OF USE
- Publication number 20130250261
- Publication date Sep 26, 2013
- Carl Zeiss SMT GMBH
- Olaf Conradi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Projection Exposure System and Projection Exposure Method
- Publication number 20130182234
- Publication date Jul 18, 2013
- Carl Zeiss SMT GMBH
- Paul Graupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS
- Publication number 20120069310
- Publication date Mar 22, 2012
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20110019169
- Publication date Jan 27, 2011
- Carl Zeiss SMT AG
- Olaf Conradi
- G02 - OPTICS
Information Patent Application
METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTI...
- Publication number 20100290024
- Publication date Nov 18, 2010
- Carl Zeiss SMT AG
- Olaf Conradi
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20100231883
- Publication date Sep 16, 2010
- Carl Zeiss SMT AG
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND METHOD OF USE
- Publication number 20090231565
- Publication date Sep 17, 2009
- Carl Zeiss SMT AG
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR CORRECTING IMAGE CHANGES
- Publication number 20090153831
- Publication date Jun 18, 2009
- Carl Zeiss SMT AG
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Microlithography projection objective
- Publication number 20090115986
- Publication date May 7, 2009
- Carl Zeiss SMT AG
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
Method for Improving the Imaging Properties of a Projection Objecti...
- Publication number 20080310029
- Publication date Dec 18, 2008
- Carl Zeiss SMT AG
- Olaf Conradi
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20080239503
- Publication date Oct 2, 2008
- Carl Zeiss SMT AG
- Olaf Conradi
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME
- Publication number 20080002167
- Publication date Jan 3, 2008
- Carl Zeiss SMT AG
- Toralf Gruner
- G02 - OPTICS

Olaf Conradi

Person

Patents Grantslast 30 patents

Microlithography projection objective

Method of operating a projection exposure tool for microlithography

Optical system and method of use

Method for adjusting an illumination setting

Reflective optical element for EUV lithography and method of manufa...

Method for improving the imaging properties of a projection objecti...

Method of operating a projection exposure tool for microlithography

Semiconductor microlithography projection exposure apparatus

Projection exposure system and projection exposure method

Microlithography projection objective

Method for improving the imaging properties of a projection objecti...

Optical system and method of use

Microlithographic projection exposure apparatus with correction opt...

Optical system and method of use

Method and system for correcting image changes

Projection objective of a microlithographic projection exposure app...

Projection objective of a microlithographic projection exposure app...

Projection exposure apparatus and method for operating the same

Method for improving the imaging properties of a projection objecti...

Patents Applicationslast 30 patents

MICROLITHOGRAPHY PROJECTION OBJECTIVE

METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY

Reflective Optical Element for EUV Lithography and Method of Manufa...

METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTI...

METHOD FOR ADJUSTING AN ILLUMINATION SETTING

OPTICAL SYSTEM AND METHOD OF USE

MICROLITHOGRAPHY PROJECTION OBJECTIVE

MICROLITHOGRAPHY PROJECTION OBJECTIVE

METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY

OPTICAL SYSTEM AND METHOD OF USE

Projection Exposure System and Projection Exposure Method

SEMICONDUCTOR MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTI...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

OPTICAL SYSTEM AND METHOD OF USE

METHOD AND SYSTEM FOR CORRECTING IMAGE CHANGES

Microlithography projection objective

Method for Improving the Imaging Properties of a Projection Objecti...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME