Olaf Dittmann

Person

Bopfingen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical system for a microlithographic projection exposure apparatu...
- Patent number 9,946,161
- Issue date Apr 17, 2018
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of lithographically transferring a pattern on a light sensit...
- Patent number 9,581,910
- Issue date Feb 28, 2017
- Carl Zeiss SMT GmbH
- Frank Schlesener
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus
- Patent number 9,323,156
- Issue date Apr 26, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,170,499
- Issue date Oct 27, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 8,928,859
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Projection exposure system, method for manufacturing a micro-struct...
- Patent number 8,854,606
- Issue date Oct 7, 2014
- Carl Zeiss SMT GmbH
- Hans-Jürgen Mann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 8,325,426
- Issue date Dec 4, 2012
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 8,264,668
- Issue date Sep 11, 2012
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 7,982,969
- Issue date Jul 19, 2011
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection exposure system, method for manufacturing a micro-struct...
- Patent number 7,982,854
- Issue date Jul 19, 2011
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining intensity distribution in the image plane of...
- Patent number 7,961,297
- Issue date Jun 14, 2011
- Carl Zeiss SMS GmbH
- Joern Greif-Wuestenbecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method for operating the same
- Patent number 7,808,615
- Issue date Oct 5, 2010
- Carl Zeiss SMT AG
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Method for describing, evaluating and improving optical polarizatio...
- Patent number 7,728,975
- Issue date Jun 1, 2010
- Carl Zeiss SMT AG
- Michael Totzeck
- G01 - MEASURING TESTING
Information Patent Grant
Arrangement of optical elements in a microlithographic projection e...
- Patent number 7,474,469
- Issue date Jan 6, 2009
- Carl Zeiss SMT AG
- Michael Totzeck
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSIT...
- Publication number 20150301455
- Publication date Oct 22, 2015
- Carl Zeiss SMT GMBH
- Frank Schlesener
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20150153654
- Publication date Jun 4, 2015
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...
- Publication number 20130077077
- Publication date Mar 28, 2013
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20130050673
- Publication date Feb 28, 2013
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20120293786
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE SYSTEM, METHOD FOR MANUFACTURING A MICRO-STRUCT...
- Publication number 20110242517
- Publication date Oct 6, 2011
- Carl Zeiss SMT GMBH
- Hans-Jürgen Mann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20110235013
- Publication date Sep 29, 2011
- Carl Zeiss SMT GMBH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20100002217
- Publication date Jan 7, 2010
- Carl Zeiss SMT AG
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20090284831
- Publication date Nov 19, 2009
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Method for Determining Intensity Distribution in the Image Plane of...
- Publication number 20080212060
- Publication date Sep 4, 2008
- CARL ZEISS SMS GMBH
- Joern Greif-Wuestenbecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection Exposure System, Method For Manufacturing a Micro-Struct...
- Publication number 20080192225
- Publication date Aug 14, 2008
- Carl Zeiss SMT AG
- Hans-Jurgen Mann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical element, in particular for an objective or an illumination...
- Publication number 20070007491
- Publication date Jan 11, 2007
- Ralf Mueller
- G02 - OPTICS
Information Patent Application
Arrangement of optical elements in a microlithographic projection e...
- Publication number 20060066962
- Publication date Mar 30, 2006
- Carl Zeiss SMT AG
- Michael Totzeck
- G02 - OPTICS
Information Patent Application
Catadioptric reduction objective
- Publication number 20050190446
- Publication date Sep 1, 2005
- CARL ZEISS AMT AG
- Birgit Kuerz
- G02 - OPTICS
Information Patent Application
Optical system with birefringent optical elements
- Publication number 20050094268
- Publication date May 5, 2005
- Carl Zeiss SMT AG
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
Retardation element made from cubic crystal and an optical system t...
- Publication number 20040218271
- Publication date Nov 4, 2004
- Carl Zeiss SMT AG
- Juergen Hartmaier
- G02 - OPTICS

Olaf Dittmann

Person

Patents Grantslast 30 patents

Optical system for a microlithographic projection exposure apparatu...

Method of lithographically transferring a pattern on a light sensit...

Optical system of a microlithographic projection exposure apparatus

Illumination system of a microlithographic projection exposure appa...

Illumination system of a microlithographic projection exposure appa...

Projection exposure system, method for manufacturing a micro-struct...

Projection objective of a microlithographic projection exposure app...

Illumination system of a microlithographic projection exposure appa...

Projection objective of a microlithographic projection exposure app...

Projection exposure system, method for manufacturing a micro-struct...

Method for determining intensity distribution in the image plane of...

Projection exposure apparatus and method for operating the same

Method for describing, evaluating and improving optical polarizatio...

Arrangement of optical elements in a microlithographic projection e...

Patents Applicationslast 30 patents

METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSIT...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

PROJECTION EXPOSURE SYSTEM, METHOD FOR MANUFACTURING A MICRO-STRUCT...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

Method for Determining Intensity Distribution in the Image Plane of...

Projection Exposure System, Method For Manufacturing a Micro-Struct...

Optical element, in particular for an objective or an illumination...

Arrangement of optical elements in a microlithographic projection e...

Catadioptric reduction objective

Optical system with birefringent optical elements

Retardation element made from cubic crystal and an optical system t...