Olaf Fiedler

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing chamber and process gas flow deflector for use...
- Patent number 12,018,369
- Issue date Jun 25, 2024
- Infineon Technologies AG
- Matthias Kuenle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method of depositing a layer at atmospheric pressure
- Patent number 11,479,854
- Issue date Oct 25, 2022
- Infineon Technologies AG
- Olaf Fiedler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with buffer region
- Patent number 10,692,970
- Issue date Jun 23, 2020
- Infineon Technologies Dresden GmbH & Co. KG
- Katarzyna Kowalik-Seidl
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Apparatus and Method of Forming a Semiconductor Layer
- Publication number 20220051891
- Publication date Feb 17, 2022
- INFINEON TECHNOLOGIES AG
- Olaf Fiedler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING CHAMBER AND PROCESS GAS FLOW DEFLECTOR FOR USE...
- Publication number 20220018023
- Publication date Jan 20, 2022
- Matthias Kuenle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Method of Depositing a Layer at Atmospheric Pressure
- Publication number 20200063257
- Publication date Feb 27, 2020
- Olaf Fiedler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Method of Forming a Semiconductor Layer
- Publication number 20190252185
- Publication date Aug 15, 2019
- Olaf Fiedler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device with Buffer Region
- Publication number 20190148484
- Publication date May 16, 2019
- Katarzyna Kowalik-Seidl
- H01 - BASIC ELECTRIC ELEMENTS