Olaf Rogalsky

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Imaging optical system for microlithography
- Patent number 10,754,132
- Issue date Aug 25, 2020
- Carl Zeiss SMT GmbH
- Olaf Rogalsky
- G02 - OPTICS
Information Patent Grant
Lithographic projection objective
- Patent number 10,042,265
- Issue date Aug 7, 2018
- Carl Zeiss SMT GmbH
- Olaf Rogalsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic projection objective
- Patent number 9,494,868
- Issue date Nov 15, 2016
- Carl Zeiss SMT GmbH
- Olaf Rogalsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens system of a microlithographic projection exposure i...
- Patent number 9,164,396
- Issue date Oct 20, 2015
- Carl Zeiss SMT GmbH
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic projection objective
- Patent number 8,605,253
- Issue date Dec 10, 2013
- Carl Zeiss SMT GmbH
- Olaf Rogalsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens system of a microlithographic projection exposure i...
- Patent number 8,319,944
- Issue date Nov 27, 2012
- Carl Zeiss SMT GmbH
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens system of a microlithographic projection exposure i...
- Patent number 7,782,440
- Issue date Aug 24, 2010
- Carl Zeiss SMT AG
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC PROJECTION OBJECTIVE
- Publication number 20190025709
- Publication date Jan 24, 2019
- Carl Zeiss SMT GMBH
- Olaf Rogalsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PROJECTION OBJECTIVE
- Publication number 20170031247
- Publication date Feb 2, 2017
- Carl Zeiss SMT GMBH
- Olaf Rogalsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PROJECTION OBJECTIVE
- Publication number 20140078482
- Publication date Mar 20, 2014
- Carl Zeiss SMT GMBH
- Olaf Rogalsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imaging Optical System for Microlithography
- Publication number 20130188246
- Publication date Jul 25, 2013
- Carl Zeiss SMT GMBH
- Olaf Rogalsky
- G02 - OPTICS
Information Patent Application
PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...
- Publication number 20130070224
- Publication date Mar 21, 2013
- Carl Zeiss SMT GMBH
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...
- Publication number 20100265478
- Publication date Oct 21, 2010
- Carl Zeiss SMT AG
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PROJECTION OBJECTIVE
- Publication number 20090153829
- Publication date Jun 18, 2009
- Carl Zeiss SMT AG
- Olaf Rogalsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection Lens System of a Microlithographic Projection Exposure I...
- Publication number 20080106711
- Publication date May 8, 2008
- Carl Zeiss SMT AG
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Olaf Rogalsky

Person

Patents Grantslast 30 patents

Imaging optical system for microlithography

Lithographic projection objective

Lithographic projection objective

Projection lens system of a microlithographic projection exposure i...

Lithographic projection objective

Projection lens system of a microlithographic projection exposure i...

Projection lens system of a microlithographic projection exposure i...

Patents Applicationslast 30 patents

LITHOGRAPHIC PROJECTION OBJECTIVE

LITHOGRAPHIC PROJECTION OBJECTIVE

LITHOGRAPHIC PROJECTION OBJECTIVE

Imaging Optical System for Microlithography

PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...

PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...

LITHOGRAPHIC PROJECTION OBJECTIVE

Projection Lens System of a Microlithographic Projection Exposure I...